Chao; Li-Chih

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chao; Li-Chih.The latest application filed is for "dual damascene process".

Company Profile

0.13.2

Chao; Li-Chih - Tao-Yuan TW
Chao; Li-Chih - Yan-mei TW
Chao; Li-Chih - Yang-mei TW
Chao; Li-chih - Fang-mei TW

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Dual damascene process Grant 7,253,112 - Ho , et al. August 7, 2	2007-08-07
Dual damascene process App 20050014362 - Ho, Bang-Chien ; et al.	2005-01-20
Partial via hard mask open on low-k dual damascene etch with dual hard mask (DHM) approach Grant 6,797,630 - Wu , et al. September 28, 2	2004-09-28
Organic low K dielectric etch with NH3 chemistry Grant 6,743,732 - Lin , et al. June 1, 2	2004-06-01
Prevention of spiking in ultra low dielectric constant material Grant 6,727,183 - Ma , et al. April 27, 2	2004-04-27
Method of dual damascene patterning Grant 6,720,256 - Wu , et al. April 13, 2	2004-04-13
Method for improved plasma etching control App 20030155329 - Su, Yi-Nien ; et al.	2003-08-21
N2/H2 chemistry for dry development in top surface imaging technology Grant 6,551,938 - Wu , et al. April 22, 2	2003-04-22
Method of cleaning a copper/porous low-k dual damascene etch Grant 6,457,477 - Young , et al. October 1, 2	2002-10-01
Partial hard mask open process for hard mask dual damascene etch Grant 6,376,366 - Lin , et al. April 23, 2	2002-04-23
Fully dry post-via-etch cleaning method for a damascene process Grant 6,323,121 - Liu , et al. November 27, 2	2001-11-27
Dual damascene process for carbon-based low-K materials Grant 6,211,061 - Chen , et al. April 3, 2	2001-04-03
Double spacer technology for making self-aligned contacts (SAC) on semiconductor integrated circuits Grant 6,165,880 - Yaung , et al. December 26, 2	2000-12-26
Method for fabricating a T-shaped hard mask/conductor profile to improve self-aligned contact isolation Grant 6,140,218 - Liu , et al. October 31, 2	2000-10-31
Self-aligned contact structures using high selectivity etching Grant 5,872,063 - Chao , et al. February 16, 1	1999-02-16

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