| Patent | Date |
|---|
Ferroelectric Memory Cell
App 20220310638 - CHENG; Chung-Liang ; et al. | 2022-09-29 |
High-k Dielectric Materials With Dipole Layer
App 20220310457 - Chang; Huiching ; et al. | 2022-09-29 |
Dipoles In Semiconductor Devices
App 20220310846 - Chang; Hsiang-Pi ; et al. | 2022-09-29 |
Method For Forming Epitaxial Source/drain Features Using A Self-aligned Mask And Semiconductor Devices Fabricated Thereof
App 20220278002 - Huang; Yao-Sheng ; et al. | 2022-09-01 |
Contact Structures In Semiconductor Devices
App 20220254684 - LIM; Peng-Soon ; et al. | 2022-08-11 |
Gate Contact And Via Structures In Semiconductor Devices
App 20220254927 - Cheng; Chung-Liang ; et al. | 2022-08-11 |
Chemical Mechanical Polishing Slurry Composition And Method Of Polishing Metal Layer
App 20220195246 - Liao; Chun-Hung ; et al. | 2022-06-23 |
Tuning Threshold Voltage in Field-Effect Transistors
App 20220181467 - Tsau; Hsueh Wen ; et al. | 2022-06-09 |
Semiconductor Device Structure And Method For Forming The Same
App 20220157653 - LIAO; Chun-Hung ; et al. | 2022-05-19 |
Work Function Layers For Transistor Gate Electrodes
App 20220077296 - CHENG; Chung-Liang ; et al. | 2022-03-10 |
Chemical mechanical polishing slurry composition and method of polishing metal layer
Grant 11,267,987 - Liao , et al. March 8, 2 | 2022-03-08 |
Tuning threshold voltage in field-effect transistors
Grant 11,257,923 - Tsau , et al. February 22, 2 | 2022-02-22 |
Capping Layer For Gate Electrodes
App 20210384322 - LIN; Chin-Hsiang ; et al. | 2021-12-09 |
Work function layers for transistor gate electrodes
Grant 11,183,574 - Cheng , et al. November 23, 2 | 2021-11-23 |
Multi-threshold gate structure with doped gate dielectric layer
Grant 11,177,259 - Cheng , et al. November 16, 2 | 2021-11-16 |
Gate Stack Treatment For Ferroelectric Transistors
App 20210351278 - LIN; Cheng-Ming ; et al. | 2021-11-11 |
Capping layer for gate electrodes
Grant 11,164,956 - Lin , et al. November 2, 2 | 2021-11-02 |
Gate Structures For Semiconductor Devices
App 20210328018 - CHENG; Chung-Liang ; et al. | 2021-10-21 |
Ferroelectric Structure For Semiconductor Devices
App 20210328065 - LIN; Cheng-Ming ; et al. | 2021-10-21 |
Selective Internal Gate Structure For Ferroelectric Semiconductor Devices
App 20210328064 - LIN; Cheng-Ming ; et al. | 2021-10-21 |
Multi-threshold gate structure with doped gate dielectric layer
Grant 11,145,653 - Cheng , et al. October 12, 2 | 2021-10-12 |
Self-aligned metal compound layers for semiconductor devices
Grant 11,139,397 - Lin , et al. October 5, 2 | 2021-10-05 |
Semiconductor Device Structure
App 20210305376 - TSAU; Hsueh-Wen ; et al. | 2021-09-30 |
Fabrication of Field Effect Transistors With Ferroelectric Materials
App 20210296503 - Lin; Cheng-Ming ; et al. | 2021-09-23 |
Semiconductor Device Structure Having Gate Dielectric Layer
App 20210280432 - CHANG; I-Ming ; et al. | 2021-09-09 |
Semiconductor Structure
App 20210280468 - CHANG; I-MING ; et al. | 2021-09-09 |
Fin Isolation Structure For Finfet And Method Of Forming The Same
App 20210265222 - LEE; Chu-An ; et al. | 2021-08-26 |
Semiconductor Device With Isolation Structures
App 20210265220 - LEE; Pei-Wei ; et al. | 2021-08-26 |
Semiconductor Device With Multi-threshold Gate Structure
App 20210249517 - Cheng; Chung-Liang ; et al. | 2021-08-12 |
Semiconductor Device Including Interface Layer And Method Of Fabricating Thereof
App 20210249308 - CHENG; Chung-Liang ; et al. | 2021-08-12 |
Ferroelectric structure for semiconductor devices
Grant 11,069,807 - Lin , et al. July 20, 2 | 2021-07-20 |
Gate structures for semiconductor devices
Grant 11,049,937 - Cheng , et al. June 29, 2 | 2021-06-29 |
Semiconductor device structure and method for forming the same
Grant 11,038,029 - Tsau , et al. June 15, 2 | 2021-06-15 |
Materials and Methods for Chemical Mechanical Polishing of Ruthenium-Containing Materials
App 20210171800 - Lee; An-Hsuan ; et al. | 2021-06-10 |
Fabrication of field effect transistors with ferroelectric materials
Grant 11,031,490 - Lin , et al. June 8, 2 | 2021-06-08 |
Semiconductor structure and method of forming the same
Grant 11,031,291 - Chang , et al. June 8, 2 | 2021-06-08 |
Selective internal gate structure for ferroelectric semiconductor devices
Grant 11,018,256 - Lin , et al. May 25, 2 | 2021-05-25 |
Method for forming semiconductor device structure having oxide layer
Grant 11,018,022 - Chang , et al. May 25, 2 | 2021-05-25 |
Chemical Mechanical Polishing Slurry Composition And Method Of Polishing Metal Layer
App 20210130650 - Liao; Chun-Hung ; et al. | 2021-05-06 |
Fin isolation structure for FinFET and method of forming the same
Grant 10,998,239 - Lee , et al. May 4, 2 | 2021-05-04 |
Gate Structures For Semiconductor Devices
App 20210118995 - CHENG; Chung-Liang ; et al. | 2021-04-22 |
Method for forming semiconductor device structure
Grant 10,985,265 - Cheng , et al. April 20, 2 | 2021-04-20 |
Gate structures having interfacial layers
Grant 10,985,022 - Cheng , et al. April 20, 2 | 2021-04-20 |
Gate stack treatment for ferroelectric transistors
Grant 10,978,567 - Lin , et al. April 13, 2 | 2021-04-13 |
Semiconductor device including interface layer and method of fabricating thereof
Grant 10,971,402 - Cheng , et al. April 6, 2 | 2021-04-06 |
Slurry Compositions For Chemical Mechanical Planarization
App 20210098266 - Lee; An-Hsuan ; et al. | 2021-04-01 |
Multi-threshold Gate Structure With Doped Gate Dielectric Layer
App 20210098457 - CHENG; Chung-Liang ; et al. | 2021-04-01 |
Wafer polishing with separated chemical reaction and mechanical polishing
Grant 10,964,549 - Lee , et al. March 30, 2 | 2021-03-30 |
Self-aligned Metal Compound Layers For Semiconductor Devices
App 20210083120 - LIN; Cheng-Ming ; et al. | 2021-03-18 |
Gate Stack Treatment For Ferroelectric Transistors
App 20210083068 - LIN; Cheng-Ming ; et al. | 2021-03-18 |
Selective Internal Gate Structure For Ferroelectric Semiconductor Devices
App 20210057581 - Lin; Cheng-Ming ; et al. | 2021-02-25 |
Method For Forming Semiconductor Device Structure
App 20210057550 - CHENG; Chung-Liang ; et al. | 2021-02-25 |
Capping Layer For Gate Electrodes
App 20210057543 - LIN; Chin-Hsiang ; et al. | 2021-02-25 |
Materials and methods for chemical mechanical polishing of ruthenium-containing materials
Grant 10,920,105 - Lee , et al. February 16, 2 | 2021-02-16 |
Ferroelectric Structure For Semiconductor Devices
App 20210020786 - LIN; Cheng-Ming ; et al. | 2021-01-21 |
Fabrication of Field Effect Transistors With Ferroelectric Materials
App 20200411662 - Lin; Cheng-Ming ; et al. | 2020-12-31 |
Semiconductor Device Including Interface Layer And Method Of Fabricating Thereof
App 20200395250 - CHENG; Chung-Liang ; et al. | 2020-12-17 |
Work Function Layers for Transistor Gate Electrodes
App 20200373400 - CHENG; Chung-Liang ; et al. | 2020-11-26 |
Fin Isolation Structure For Finfet And Method Of Forming The Same
App 20200365588 - LEE; Chu-An ; et al. | 2020-11-19 |
Slurry
App 20200357653 - LIAO; CHUN-HUNG ; et al. | 2020-11-12 |
Post Cmp Cleaning Apparatus And Post Cmp Cleaning Methods
App 20200294821 - WU; Chen-Hao ; et al. | 2020-09-17 |
Replacement channel etch for high quality interface
Grant 10,755,984 - Glass , et al. A | 2020-08-25 |
Slurry and manufacturing semiconductor using the slurry
Grant 10,727,076 - Liao , et al. | 2020-07-28 |
Fin isolation structure for FinFET and method of forming the same
Grant 10,714,395 - Lee , et al. | 2020-07-14 |
Wafer Polishing With Separated Chemical Reaction And Mechanical Polishing
App 20200176264 - LEE; Shen-Nan ; et al. | 2020-06-04 |
Semiconductor Structure And Method Of Forming The Same
App 20200168507 - CHANG; I-MING ; et al. | 2020-05-28 |
Semiconductor Device Structure And Method For Forming The Same
App 20200152746 - TSAU; Hsueh-Wen ; et al. | 2020-05-14 |
Slurry And Manufacturing Semiconductor Using The Slurry
App 20200135486 - LIAO; CHUN-HUNG ; et al. | 2020-04-30 |
Gate Structures Having Interfacial Layers
App 20200135475 - Cheng; Chung-Liang ; et al. | 2020-04-30 |
Tuning Threshold Voltage in Field-Effect Transistors
App 20200119164 - Tsau; Hsueh Wen ; et al. | 2020-04-16 |
Fin Isolation Structure For Finfet And Method Of Forming The Same
App 20200091007 - LEE; Chu-An ; et al. | 2020-03-19 |
Materials and Methods for Chemical Mechanical Polishing of Ruthenium-Containing Materials
App 20200032105 - Lee; An-Hsuan ; et al. | 2020-01-30 |
Method For Forming Semiconductor Device Structure Having Oxide Layer
App 20200020544 - CHANG; I-Ming ; et al. | 2020-01-16 |
Replacement Channel Etch For High Quality Interface
App 20180197789 - GLASS; GLENN A. ; et al. | 2018-07-12 |
| 