| Patent | Date |
|---|
Method Of Forming A Single Metal That Performs N Work Function And P Work Function In A High-k/metal Gate Process
App 20220216205 - Lin; Yih-Ann ; et al. | 2022-07-07 |
Single metal that performs N work function and P work function in a high-K/metal gate
Grant 11,289,481 - Lin , et al. March 29, 2 | 2022-03-29 |
Method of Forming a Single Metal that Performs N Work Function and P Work Function in a High-K/Metal Gate Process
App 20180247937 - Lin; Yih-Ann ; et al. | 2018-08-30 |
Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process
Grant 9,960,160 - Lin , et al. May 1, 2 | 2018-05-01 |
FinFET and method of fabricating the same
Grant 9,634,104 - Chao , et al. April 25, 2 | 2017-04-25 |
Method of patterning a metal gate of semiconductor device
Grant 9,362,124 - Chen , et al. June 7, 2 | 2016-06-07 |
Finfet And Method Of Fabricating The Same
App 20150249138 - CHAO; Donald Y. ; et al. | 2015-09-03 |
Method Of Patterning A Metal Gate Of Semiconductor Device
App 20150206755 - Chen; Chien-Hao ; et al. | 2015-07-23 |
Finfet and method of fabricating the same
Grant 9,053,934 - Chao , et al. June 9, 2 | 2015-06-09 |
Method of patterning a metal gate of semiconductor device
Grant 8,993,452 - Yeh , et al. March 31, 2 | 2015-03-31 |
Finfet And Method Of Fabricating The Same
App 20140134831 - CHAO; Donald Y. ; et al. | 2014-05-15 |
Integrated Circuit Metal Gate Structure
App 20140091402 - Hou; Yong-Tian ; et al. | 2014-04-03 |
Integrated circuit metal gate structure and method of fabrication
Grant 8,679,962 - Hou , et al. March 25, 2 | 2014-03-25 |
FinFET and method of fabricating the same
Grant 8,659,032 - Chao , et al. February 25, 2 | 2014-02-25 |
Method of forming a single metal that performs N work function and P work function in a high-k/metal gate process
Grant 8,524,588 - Lin , et al. September 3, 2 | 2013-09-03 |
Finfet And Method Of Fabricating The Same
App 20130193446 - CHAO; Donald Y. ; et al. | 2013-08-01 |
Method of Patterning a Metal Gate of Semiconductor Device
App 20130130488 - Yeh; Matt ; et al. | 2013-05-23 |
Method of patterning a metal gate of semiconductor device
Grant 8,357,617 - Yeh , et al. January 22, 2 | 2013-01-22 |
Metal gates of PMOS devices having high work functions
Grant 8,159,035 - Chao , et al. April 17, 2 | 2012-04-17 |
Semiconductor device gate structure including a gettering layer
Grant 7,989,321 - Chen , et al. August 2, 2 | 2011-08-02 |
Semiconductor Device Gate Structure Including A Gettering Layer
App 20100048010 - Chen; Chien-Hao ; et al. | 2010-02-25 |
Method Of Patterning A Metal Gate Of Semiconductor Device
App 20100048011 - Yeh; Matt ; et al. | 2010-02-25 |
Integrated Circuit Metal Gate Structure And Method Of Fabrication
App 20100044806 - Hou; Yong-Tian ; et al. | 2010-02-25 |
Method Of Forming A Single Metal That Performs N Work Function And P Work Function In A High-k/metal Gate Process
App 20100038721 - Lin; Yih-Ann ; et al. | 2010-02-18 |
Metal Gates of PMOS Devices Having High Work Functions
App 20090014813 - Chao; Donald Y. ; et al. | 2009-01-15 |
Method of forming tensile stress films for NFET performance enhancement
App 20080138983 - Lien; Hao-Ming ; et al. | 2008-06-12 |
MOSFET Device With Localized Stressor
App 20080128765 - Chen; Chien-Hao ; et al. | 2008-06-05 |
Method of making MOSFET device with localized stressor
Grant 7,335,544 - Chen , et al. February 26, 2 | 2008-02-26 |
Method of forming a locally strained transistor
Grant 7,232,730 - Chen , et al. June 19, 2 | 2007-06-19 |
Novel semiconductor device with improved channel strain effect
App 20060267106 - Chao; Donald Y. ; et al. | 2006-11-30 |
Method of forming a locally strained transistor
App 20060246672 - Chen; Chien-Hao ; et al. | 2006-11-02 |
MOSFET device with localized stressor
App 20060125028 - Chen; Chien-Hao ; et al. | 2006-06-15 |
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