loadpatents
Patent applications and USPTO patent grants for Chang; Yu-Lan.The latest application filed is for "method of forming electrical connection structure".
Patent | Date |
---|---|
Semiconductor process Grant 7,892,935 - Chen , et al. February 22, 2 | 2011-02-22 |
Method of removing material layer and remnant metal Grant 7,884,028 - Chen , et al. February 8, 2 | 2011-02-08 |
Method for fabricating semiconductor MOS device Grant 7,785,972 - Chang , et al. August 31, 2 | 2010-08-31 |
Semiconductor device Grant 7,649,263 - Chang , et al. January 19, 2 | 2010-01-19 |
Fabricating method for a metal oxide semiconductor transistor Grant 7,595,234 - Tsao , et al. September 29, 2 | 2009-09-29 |
Fabrication method of semiconductor device Grant 7,595,264 - Chang , et al. September 29, 2 | 2009-09-29 |
Method of fabricating nickel silicide Grant 7,572,722 - Chen , et al. August 11, 2 | 2009-08-11 |
Method for forming metal silicide layer Grant 7,553,762 - Hung , et al. June 30, 2 | 2009-06-30 |
Method Of Forming Electrical Connection Structure App 20090061623 - Chang; Yu-Lan ;   et al. | 2009-03-05 |
Method Of Removing Material Layer And Remnant Metal App 20080254640 - Chen; Yi-Wei ;   et al. | 2008-10-16 |
Silicidation Process For Mos Transistor And Transistor Structure App 20080224232 - Hsieh; Chao-Ching ;   et al. | 2008-09-18 |
Method For Forming Metal Silicide Layer App 20080194100 - Hung; Tzung-Yu ;   et al. | 2008-08-14 |
Method For Cleaning Salicide App 20080171449 - Hsieh; Chao-Ching ;   et al. | 2008-07-17 |
Method of forming a silicide Grant 7,390,754 - Chang , et al. June 24, 2 | 2008-06-24 |
Semiconductor device having nickel silicide and method of fabricating nickel silicide Grant 7,385,294 - Chen , et al. June 10, 2 | 2008-06-10 |
Fabrication Method Of Semiconductor Device App 20080132063 - Chang; Yu-Lan ;   et al. | 2008-06-05 |
Semiconductor Process App 20080132023 - Chen; Yi-Wei ;   et al. | 2008-06-05 |
Semiconductor Device App 20080067684 - Chang; Yu-Lan ;   et al. | 2008-03-20 |
Fabrication method of semiconductor device Grant 7,344,978 - Chang , et al. March 18, 2 | 2008-03-18 |
Method For Fabricating Semiconductor Mos Device App 20080038887 - Chang; Yu-Lan ;   et al. | 2008-02-14 |
Method Of Stripping Remnant Metal App 20080020587 - Chang; Chun-Chieh ;   et al. | 2008-01-24 |
Method for fabricating metal silicide App 20080009134 - Hung; Tsung-Yu ;   et al. | 2008-01-10 |
Method Of Fabricating Nickel Silicide App 20070167009 - Chen; Yi-Wei ;   et al. | 2007-07-19 |
Method of fabricating metal silicide layer Grant 7,229,920 - Chen , et al. June 12, 2 | 2007-06-12 |
Metal oxide semiconductor transistor Grant 7,214,988 - Tsao , et al. May 8, 2 | 2007-05-08 |
Pre-treatment method for physical vapor deposition of metal layer and method of forming metal silicide layer App 20070087573 - Chiang; Yi-Yiing ;   et al. | 2007-04-19 |
Method For Forming Silicide Layer App 20070082494 - Chen; Yi-Wei ;   et al. | 2007-04-12 |
Metal Oxide Semiconductor Transistor App 20070063290 - Tsao; Po-Chao ;   et al. | 2007-03-22 |
Fabricating Method For A Metal Oxide Semiconductor Transistor App 20070066041 - Tsao; Po-Chao ;   et al. | 2007-03-22 |
Salicide process App 20070059878 - Chang; Yu-Lan ;   et al. | 2007-03-15 |
Semiconductor Device Having Nickel Silicide And Method Of Fabricating Nickel Silicide App 20070054481 - Chen; Yi-Wei ;   et al. | 2007-03-08 |
Method Of Forming A Nickel Platinum Silicide App 20070020925 - Hsieh; Chao-Ching ;   et al. | 2007-01-25 |
Semiconductor Device And Fabrication Method Thereof App 20060284263 - Chang; Yu-Lan ;   et al. | 2006-12-21 |
Method of fabricating metal silicide layer App 20060154474 - Chen; Yi-Wei ;   et al. | 2006-07-13 |
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