| Patent | Date |
|---|
Adjusting Work Function Through Adjusting Deposition Temperature
App 20220310451 - Lee; Hsin-Yi ; et al. | 2022-09-29 |
Work function control in gate structures
Grant 11,444,198 - Lee , et al. September 13, 2 | 2022-09-13 |
Etching Back and Selective Deposition of Metal Gate
App 20220278224 - Lim; Peng-Soon ; et al. | 2022-09-01 |
In-situ formation of metal gate modulators
Grant 11,430,698 - Tsai , et al. August 30, 2 | 2022-08-30 |
Gate Structure Of Semiconductor Device And Method Of Forming Same
App 20220238688 - Lee; Hsin-Yi ; et al. | 2022-07-28 |
Transistor Gate Structures and Methods of Forming the Same
App 20220238687 - Lee; Hsin-Yi ; et al. | 2022-07-28 |
Semiconductor Device and Method
App 20220223594 - Lee; Hsin-Yi ; et al. | 2022-07-14 |
Etching back and selective deposition of metal gate
Grant 11,380,774 - Lim , et al. July 5, 2 | 2022-07-05 |
Adjusting work function through adjusting deposition temperature
Grant 11,362,002 - Lee , et al. June 14, 2 | 2022-06-14 |
Nanosheet Field-Effect Transistor Device and Method of Forming
App 20220140101 - Lee; Hsin-Yi ; et al. | 2022-05-05 |
Method for Patterning a Lanthanum Containing Layer
App 20220059412 - Lee; Kun-Yu ; et al. | 2022-02-24 |
Nanosheet field-effect transistor device and method of forming
Grant 11,227,931 - Lee , et al. January 18, 2 | 2022-01-18 |
Semiconductor device having gate dielectric and inhibitor film over gate dielectric
Grant 11,211,465 - Khaderbad , et al. December 28, 2 | 2021-12-28 |
Semiconductor Device and Method
App 20210399102 - Lee; Hsin-Yi ; et al. | 2021-12-23 |
Work Function Control In Gate Structures
App 20210376138 - LEE; Hsin-Yi ; et al. | 2021-12-02 |
In-Situ Formation of Metal Gate Modulators
App 20210366775 - Tsai; Hsin-Han ; et al. | 2021-11-25 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20210351085 - Lee; Da-Yuan ; et al. | 2021-11-11 |
Method for patterning a lanthanum containing layer
Grant 11,171,061 - Lee , et al. November 9, 2 | 2021-11-09 |
Semiconductor device
Grant 11,164,868 - Lee , et al. November 2, 2 | 2021-11-02 |
Semiconductor Device and Method
App 20210313419 - Lee; Hsin-Yi ; et al. | 2021-10-07 |
Methods for threshold voltage tuning and structure formed thereby
Grant 11,121,041 - Chen , et al. September 14, 2 | 2021-09-14 |
Adjusting Work Function Through Adjusting Deposition Temperature
App 20210233817 - Lee; Hsin-Yi ; et al. | 2021-07-29 |
Semiconductor device with profiled work-function metal gate electrode and method of making
Grant 11,075,124 - Lee , et al. July 27, 2 | 2021-07-27 |
Semiconductor Devices, Finfet Devices And Methods Of Forming The Same
App 20210217870 - Lee; Hsin-Yi ; et al. | 2021-07-15 |
Nanosheet Field-effect Transistor Device And Method Of Forming
App 20210202709 - Lee; Hsin-Yi ; et al. | 2021-07-01 |
Semiconductor Device and Method
App 20210134799 - Tsai; Cheng-Yen ; et al. | 2021-05-06 |
Semiconductor Device And Method Of Fabricating The Same
App 20210091076 - Lee; Hsin-Yi ; et al. | 2021-03-25 |
Semiconductor Device
App 20210091077 - Lee; Hsin-Yi ; et al. | 2021-03-25 |
Etching back and selective deposition of metal gate
Grant 10,879,370 - Lim , et al. December 29, 2 | 2020-12-29 |
Semiconductor device and method
Grant 10,868,013 - Tsai , et al. December 15, 2 | 2020-12-15 |
Method for patterning a lanthanum containing layer
Grant 10,867,869 - Lee , et al. December 15, 2 | 2020-12-15 |
Method of semiconductor integrated circuit fabrication
Grant 10,861,751 - Yu , et al. December 8, 2 | 2020-12-08 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20200335404 - LEE; Da-Yuan ; et al. | 2020-10-22 |
Semiconductor device with profiled work-function metal gate electrode and method of making
Grant 10,699,966 - Lee , et al. | 2020-06-30 |
Semiconductor Device With Sidewall Passivation And Method Of Making
App 20200119153 - KHADERBAD; Mrunal A. ; et al. | 2020-04-16 |
Semiconductor Device and Method
App 20200119019 - Tsai; Cheng-Yen ; et al. | 2020-04-16 |
Methods for Threshold Voltage Tuning and Structure Formed Thereby
App 20200083114 - Chen; Zoe ; et al. | 2020-03-12 |
Method Of Semiconductor Integrated Circuit Fabrication
App 20200083112 - YU; De-Wei ; et al. | 2020-03-12 |
Method for Patterning a Lanthanum Containing Layer
App 20200083115 - Lee; Kun-Yu ; et al. | 2020-03-12 |
Etching Back and Selective Deposition of Metal Gate
App 20200083351 - Lim; Peng-Soon ; et al. | 2020-03-12 |
Method for Patterning a Lanthanum Containing Layer
App 20200006157 - Lee; Kun-Yu ; et al. | 2020-01-02 |
Semiconductor device and method
Grant 10,510,756 - Tsai , et al. Dec | 2019-12-17 |
Methods for threshold voltage tuning and structures formed thereby
Grant 10,510,621 - Chen , et al. Dec | 2019-12-17 |
Semiconductor device having gate body and inhibitor film between conductive prelayer over gate body and conductive layer over inhibitor film
Grant 10,510,854 - Khaderbad , et al. Dec | 2019-12-17 |
Method for patterning a lanthanum containing layer
Grant 10,504,795 - Lee , et al. Dec | 2019-12-10 |
Method of semiconductor integrated circuit fabrication
Grant 10,483,170 - Yu , et al. Nov | 2019-11-19 |
Methods For Threshold Voltage Tuning And Structures Formed Thereby
App 20190318967 - Chen; Zoe ; et al. | 2019-10-17 |
Method For Patterning A Lanthanum Containing Layer
App 20190304846 - LEE; Kun-Yu ; et al. | 2019-10-03 |
Semiconductor device and method
Grant 10,304,835 - Tsai , et al. | 2019-05-28 |
Pre-deposition treatment and atomic layer deposition (ALD) process and structures formed thereby
Grant 10,297,453 - Tsai , et al. | 2019-05-21 |
Semiconductor Device And Sidewall Passivation And Method Of Making
App 20180308944 - KHADERBAD; Mrunal A. ; et al. | 2018-10-25 |
Method Of Semiconductor Integrated Circuit Fabrication
App 20180308765 - YU; De-Wei ; et al. | 2018-10-25 |
System For Pre-deposition Treatment Of A Work-function Metal Layer
App 20180261459 - TSAI; Cheng-Yen ; et al. | 2018-09-13 |
Pre-Deposition Treatment and Atomic Layer Deposition (ALD) Process and Structures Formed Thereby
App 20180218912 - Tsai; Cheng-Yen ; et al. | 2018-08-02 |
Semiconductor device with sidewall passivation and method of making
Grant 10,014,382 - Khaderbad , et al. July 3, 2 | 2018-07-03 |
Method of semiconductor integrated circuit fabrication
Grant 10,008,418 - Yu , et al. June 26, 2 | 2018-06-26 |
Etching Back and Selective Deposition of Metal Gate
App 20180175165 - Lim; Peng-Soon ; et al. | 2018-06-21 |
Methods for pre-deposition treatment of a work-function metal layer
Grant 9,978,601 - Tsai , et al. May 22, 2 | 2018-05-22 |
Pre-deposition treatment and atomic layer deposition (ALD) process and structures formed thereby
Grant 9,947,540 - Tsai , et al. April 17, 2 | 2018-04-17 |
Method Of Semiconductor Integrated Circuit Fabrication
App 20180096898 - YU; De-Wei ; et al. | 2018-04-05 |
Semiconductor device and manufacturing method thereof
Grant 9,761,683 - Chou , et al. September 12, 2 | 2017-09-12 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20170178973 - Lee; Da-Yuan ; et al. | 2017-06-22 |
Atomic Layer Deposition Methods And Structures Thereof
App 20170110324 - TSAI; Cheng-Yen ; et al. | 2017-04-20 |
Semiconductor device with metal gate structure comprising work-function metal layer and work-fuction adjustment layer
Grant 9,590,065 - Lee , et al. March 7, 2 | 2017-03-07 |
Pre-deposition Treatment And Atomic Layer Deposition (ald) Process And Structures Formed Thereby
App 20170032972 - Tsai; Cheng-Yen ; et al. | 2017-02-02 |
Semiconductor Device And Manufacturing Method Thereof
App 20160336420 - CHOU; Chun-Yuan ; et al. | 2016-11-17 |
N metal for FinFET and methods of forming
Grant 9,293,334 - Kuo , et al. March 22, 2 | 2016-03-22 |
Semiconductor Device With Sidewall Passivation And Method Of Making
App 20150262827 - Khaderbad; Mrunai A. ; et al. | 2015-09-17 |
N Metal for FinFET and Methods of Forming
App 20150200100 - Kuo; Po-Chin ; et al. | 2015-07-16 |
N metal for FinFET
Grant 9,064,857 - Kuo , et al. June 23, 2 | 2015-06-23 |
Semiconductor Device With Profiled Work-function Metal Gate Electrode And Method Of Making
App 20150155365 - Lee; Da-Yuan ; et al. | 2015-06-04 |
Silicon layer for stopping dislocation propagation
Grant 8,846,461 - Lin , et al. September 30, 2 | 2014-09-30 |
N Metal for FinFET
App 20140167187 - Kuo; Po-Chin ; et al. | 2014-06-19 |
Silicon Layer for Stopping Dislocation Propagation
App 20130122674 - Lin; Hsien-Hsin ; et al. | 2013-05-16 |
Silicon layer for stopping dislocation propagation
Grant 8,344,447 - Lin , et al. January 1, 2 | 2013-01-01 |
Sealing layer of a field effect transistor
Grant 8,258,588 - Lin , et al. September 4, 2 | 2012-09-04 |
Sealing Layer Of A Field Effect Transistor
App 20110031562 - LIN; Yu Chao ; et al. | 2011-02-10 |
Triangular space element for semiconductor device
Grant 7,834,389 - Huang , et al. November 16, 2 | 2010-11-16 |
Triangular Space Element For Semiconductor Device
App 20080308899 - Huang; Yu-Lien ; et al. | 2008-12-18 |
Silicon layer for stopping dislocation propagation
App 20080246057 - Lin; Hsien-Hsin ; et al. | 2008-10-09 |
Method for fabricating semiconductor device
App 20080242108 - Chang; Weng ; et al. | 2008-10-02 |
Etch stop layer
Grant 7,375,040 - Lin , et al. May 20, 2 | 2008-05-20 |
Metal oxynitride gate
App 20070284677 - Chang; Weng ; et al. | 2007-12-13 |
Copper interconnects
Grant 7,253,524 - Wu , et al. August 7, 2 | 2007-08-07 |
Reliability improvement of SiOC etch with trimethylsilane gas passivation in Cu damascene interconnects
Grant 7,193,325 - Wu , et al. March 20, 2 | 2007-03-20 |
High performance strained channel MOSFETs by coupled stress effects
Grant 7,119,404 - Chang , et al. October 10, 2 | 2006-10-10 |
Silicon oxycarbide and silicon carbonitride based materials for MOS devices
Grant 7,115,974 - Wu , et al. October 3, 2 | 2006-10-03 |
System and method for contact module processing
App 20060157776 - Chang; Cheng-Hung ; et al. | 2006-07-20 |
Etch stop layer
App 20060110938 - Lin; Simon S.H. ; et al. | 2006-05-25 |
Method and apparatus for real-time control and monitor of deposition processes
App 20060049036 - Chang; Cheng-Hung ; et al. | 2006-03-09 |
Test region layout for shallow trench isolation
Grant 7,002,177 - Chang , et al. February 21, 2 | 2006-02-21 |
High performance strained channel mosfets by coupled stress effects
App 20050260806 - Chang, Cheng-Hung ; et al. | 2005-11-24 |
Reliability improvement of SiOC etch with trimethylsilane gas passivation in Cu damascene interconnects
App 20050245100 - Wu, Zhen-Cheng ; et al. | 2005-11-03 |
Silicon oxycarbide and silicon carbonitride based materials for MOS devices
App 20050236694 - Wu, Zhen-Cheng ; et al. | 2005-10-27 |
Methods for enhancing within-wafer CMP uniformity
Grant 6,929,533 - Chang August 16, 2 | 2005-08-16 |
Copper interconnects
App 20050110153 - Wu, Zhen-Cheng ; et al. | 2005-05-26 |
Test region layout for shallow trench isolation
App 20050095727 - Chang, Weng ; et al. | 2005-05-05 |
Methods for enhancing within-wafer CMP uniformity
App 20050079801 - Chang, Weng | 2005-04-14 |
Embedded fastener apparatus and method for preventing particle contamination
App 20050050708 - Huang, Yu-Lien ; et al. | 2005-03-10 |
Method of improving an etching profile in dual damascene etching
Grant 6,828,245 - Chang December 7, 2 | 2004-12-07 |
Method to reduce defect/slurry residue for copper CMP
Grant 6,767,274 - Chen , et al. July 27, 2 | 2004-07-27 |
Etch stop layer
App 20040124420 - Lin, Simon S.H. ; et al. | 2004-07-01 |
Multilayer interface in copper CMP for low K dielectric
Grant 6,753,249 - Chen , et al. June 22, 2 | 2004-06-22 |
Method to reduce defect/slurry residue for copper CMP
App 20040092210 - Chen, Chi-Chun ; et al. | 2004-05-13 |
Method of improving an etching profile in dual damascene etching
App 20030166345 - Chang, Weng | 2003-09-04 |
Dual damascene method employing composite low dielectric constant dielectric layer having intrinsic etch stop characteristics
App 20020173157 - Chang, Weng ; et al. | 2002-11-21 |
Methods for inhibiting microelectronic damascene processing induced low dielectric constant dielectric layer physical degradation
App 20020094674 - Bao, Tien-I ; et al. | 2002-07-18 |
Method of reducing dishing and erosion using a sacrificial layer
Grant 6,383,935 - Lin , et al. May 7, 2 | 2002-05-07 |
Method to eliminate dishing of copper interconnects by the use of a sacrificial oxide layer
Grant 6,372,632 - Yu , et al. April 16, 2 | 2002-04-16 |
Reducing CMP scratch, dishing and erosion by post CMP etch back method for low-k materials
Grant 6,350,694 - Chang , et al. February 26, 2 | 2002-02-26 |
Method to reduce via poison in low-k Cu dual damascene by UV-treatment
Grant 6,319,809 - Chang , et al. November 20, 2 | 2001-11-20 |
Method to improve metal line adhesion by trench corner shape modification
Grant 6,274,483 - Chang , et al. August 14, 2 | 2001-08-14 |
Method of protecting a low-K dielectric material
Grant 6,268,294 - Jang , et al. July 31, 2 | 2001-07-31 |
Method for forming low dielectric constant spin-on-polymer (SOP) dielectric layer
Grant 6,255,232 - Chang , et al. July 3, 2 | 2001-07-03 |
Method of optimizing device performance via use of copper damascene structures, and HSQ/FSG, hybrid low dielectric constant materials
Grant 6,187,663 - Yu , et al. February 13, 2 | 2001-02-13 |
Method for fabricating a hybrid low-dielectric-constant intermetal dielectric (IMD) layer with improved reliability for multilevel interconnections
Grant 6,159,842 - Chang , et al. December 12, 2 | 2000-12-12 |
Apparatus for making nanostructured ceramic powders and whiskers
Grant 5,514,350 - Kear , et al. May 7, 1 | 1996-05-07 |
| 