Chang; Shih Min
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chang; Shih Min.The latest application filed is for "wet etch chemistry for selective silicon etch".
- Chang; Shih Min - Hsinchu TW
- CHANG; Shih Min - Hsinchu City TW
- Chang; Shih-Min - Taipei City TW
| Patent | Date |
|---|---|
| Wet etch chemistry for selective silicon etch Grant 10,676,668 - Yang , et al. | 2020-06-09 |
| Wet Etch Chemistry For Selective Silicon Etch App 20190119570 - YANG; Neng-Jye ; et al. | 2019-04-25 |
| Wet etch chemistry for selective silicon etch Grant 10,179,878 - Yang , et al. Ja | 2019-01-15 |
| Wet Etch Chemistry For Selective Silicon Etch App 20180171226 - YANG; Neng-Jye ; et al. | 2018-06-21 |
| Method Of Applying A Protective Coating To Substrate Edges App 20150314322 - Chang; Shih-Min ; et al. | 2015-11-05 |
| Method Of Edge Coating A Batch Of Glass Articles App 20150060401 - Chang; Shih-Min ; et al. | 2015-03-05 |
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