Chang; Po-Chin
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chang; Po-Chin.The latest application filed is for "fine line patterning methods".
- Chang; Po-Chin - Taichung TW
- CHANG; Po-Chin - Taichung City TW
- Chang; Po-Chin - Taipei TW
- CHANG; Po-Chin - Taipei City TW
- Chang; Po-Chin - Hsin-Chu TW
| Patent | Date |
|---|---|
| Semiconductor structure and method for manufacturing the same Grant 11,373,902 - Sun , et al. June 28, 2 | 2022-06-28 |
| Fine Line Patterning Methods App 20220157605 - HUANG; Shih-Chun ; et al. | 2022-05-19 |
| Detecting device Grant 11,313,989 - Pan , et al. April 26, 2 | 2022-04-26 |
| Fine line patterning methods Grant 11,239,078 - Huang , et al. February 1, 2 | 2022-02-01 |
| Method Of Manufacturing Semiconductor Devices Using Directional Process App 20210375639 - YEH; Ya-Wen ; et al. | 2021-12-02 |
| Method OF FORMING METAL FEATURES App 20210272807 - Chang; Po-Chin ; et al. | 2021-09-02 |
| Reducing Pattern Loading in the Etch-Back of Metal Gate App 20210257478 - Chang; Po-Chin ; et al. | 2021-08-19 |
| Method of manufacturing semiconductor devices using directional process Grant 11,094,556 - Yeh , et al. August 17, 2 | 2021-08-17 |
| Directional patterning method Grant 11,043,381 - Chang , et al. June 22, 2 | 2021-06-22 |
| Detecting Device App 20210157023 - PAN; Min-Chun ; et al. | 2021-05-27 |
| Reducing pattern loading in the etch-back of metal gate Grant 10,998,421 - Chang , et al. May 4, 2 | 2021-05-04 |
| Semiconductor Device With Elongated Pattern App 20210013103 - CHANG; Po-Chin ; et al. | 2021-01-14 |
| Fine Line Patterning Methods App 20200335340 - HUANG; Shih-Chun ; et al. | 2020-10-22 |
| Elongated pattern and formation thereof Grant 10,790,195 - Chang , et al. September 29, 2 | 2020-09-29 |
| Semiconductor Structure And Method For Manufacturing The Same App 20200294851 - SUN; Hung-Chang ; et al. | 2020-09-17 |
| Directional Patterning Method App 20200243336 - Chang; Po-Chin ; et al. | 2020-07-30 |
| Fine line patterning methods Grant 10,707,081 - Huang , et al. | 2020-07-07 |
| Semiconductor structure and method for manufacturing the same Grant 10,692,760 - Sun , et al. | 2020-06-23 |
| Elongated Pattern And Formation Thereof App 20200043795 - CHANG; Po-Chin ; et al. | 2020-02-06 |
| Reducing Pattern Loading in the Etch-Back of Metal Gate App 20200020785 - Chang; Po-Chin ; et al. | 2020-01-16 |
| Method Of Manufacturing Semiconductor Devices Using Directional Process App 20200006085 - YEH; Ya-Wen ; et al. | 2020-01-02 |
| Semiconductor Structure And Method For Manufacturing The Same App 20190164820 - SUN; Hung-Chang ; et al. | 2019-05-30 |
| Fine Line Patterning Methods App 20190148147 - Huang; Shih-Chun ; et al. | 2019-05-16 |
| Method of cutting metal gate Grant 9,520,482 - Chang , et al. December 13, 2 | 2016-12-13 |
| QUATERNARY GALLIUM TELLURIUM ANTIMONY (M-GaTeSb) BASED PHASE CHANGE MEMORY DEVICES App 20120181499 - Chuang; Tung-Hua ; et al. | 2012-07-19 |
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