| Patent | Date |
|---|
Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition
Grant 11,430,661 - Kuratomi , et al. August 30, 2 | 2022-08-30 |
Method for forming a metal gapfill
Grant 11,355,391 - Cen , et al. June 7, 2 | 2022-06-07 |
Water assisted highly pure ruthenium thin film deposition
Grant 11,293,093 - Liu , et al. April 5, 2 | 2022-04-05 |
Apparatus and method for providing uniform flow of gas
Grant RE48,994 - Yudovsky , et al. March 29, 2 | 2022-03-29 |
Apparatuses And Methods Of Protecting Nickel And Nickel Containing Components With Thin Films
App 20210319983 - LEI; Pingyan ; et al. | 2021-10-14 |
Apparatus For Increasing Flux From An Ampoule
App 20210308703 - Choi; Kenric ; et al. | 2021-10-07 |
Apparatus for depositing metal films with plasma treatment
Grant 11,133,155 - Yao , et al. September 28, 2 | 2021-09-28 |
Methods and Apparatus for Cryogenic Gas Stream Assisted SAM-based Selective Deposition
App 20210283650 - Ke; Chang ; et al. | 2021-09-16 |
Support Assembly
App 20210225640 - Kao; Chien-Teh ; et al. | 2021-07-22 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
App 20210225655 - Fu; Xinyu ; et al. | 2021-07-22 |
Apparatus for increasing flux from an ampoule
Grant 11,059,061 - Choi , et al. July 13, 2 | 2021-07-13 |
Methods and apparatus for cryogenic gas stream assisted SAM-based selective deposition
Grant 11,033,930 - Ke , et al. June 15, 2 | 2021-06-15 |
Tuning work function of p-metal work function films through vapor deposition
Grant 11,018,009 - Jian , et al. May 25, 2 | 2021-05-25 |
Methods To Grow Low Resistivity Metal Containing Films
App 20210123136 - Kalutarage; Lakmal C. ; et al. | 2021-04-29 |
Methods for depositing fluorine/carbon-free conformal tungsten
Grant 10,985,023 - Fu , et al. April 20, 2 | 2021-04-20 |
Methods And Apparatus For Dual Channel Showerheads
App 20210032753 - RAVI; Jallepally ; et al. | 2021-02-04 |
Integration of ALD copper with high temperature PVD copper deposition for BEOL interconnect
Grant 10,892,186 - Sheu , et al. January 12, 2 | 2021-01-12 |
High temperature process chamber lid
Grant 10,879,090 - Durukan , et al. December 29, 2 | 2020-12-29 |
Methods of reducing or eliminating defects in tungsten film
Grant 10,879,081 - Jian , et al. December 29, 2 | 2020-12-29 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20200357616 - ALLEN; Adolph Miller ; et al. | 2020-11-12 |
Method For Forming A Metal Gapfill
App 20200303250 - CEN; Xi ; et al. | 2020-09-24 |
Hydrophobic And Icephobic Coating
App 20200299834 - BAJAJ; Rajeev ; et al. | 2020-09-24 |
Doped tantalum nitride for copper barrier applications
Grant 10,784,157 - Lakshmanan , et al. Sept | 2020-09-22 |
High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process
Grant 10,763,090 - Allen , et al. Sep | 2020-09-01 |
Apparatus and methods to remove residual precursor inside gas lines post-deposition
Grant 10,752,990 - Yao , et al. A | 2020-08-25 |
Alcohol assisted ALD film deposition
Grant 10,724,135 - Liu , et al. | 2020-07-28 |
Methods And Apparatus For Enhancing Selectivity Of Titanium And Titanium Silicides During Chemical Vapor Deposition
App 20200211852 - KURATOMI; TAKASHI ; et al. | 2020-07-02 |
Gas feedthrough assembly
Grant 10,640,870 - Yao , et al. | 2020-05-05 |
Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film
Grant 10,600,685 - Yao , et al. | 2020-03-24 |
Support assembly
Grant 10,593,539 - Kao , et al. | 2020-03-17 |
Deposition of cobalt films with high deposition rate
Grant 10,559,578 - Wrench , et al. Feb | 2020-02-11 |
Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD
Grant 10,553,425 - Kachian , et al. Fe | 2020-02-04 |
Apparatus For Depositing Metal Films With Plasma Treatment
App 20200020509 - YAO; DAPING ; et al. | 2020-01-16 |
Methods for depositing semiconductor films
Grant 10,535,527 - Xu , et al. Ja | 2020-01-14 |
Support Assembly
App 20200006054 - KAO; Chien-Teh ; et al. | 2020-01-02 |
In-Situ Pre-Clean For Selectivity Improvement For Selective Deposition
App 20190385838 - Wu; Kai ; et al. | 2019-12-19 |
Alcohol Assisted ALD Film Deposition
App 20190368034 - Liu; Feng Q. ; et al. | 2019-12-05 |
Methods of depositing metal films using metal oxyhalide precursors
Grant 10,483,116 - Fu , et al. Nov | 2019-11-19 |
Tuning Work Function Of P-metal Work Function Films Through Vapor Deposition
App 20190326120 - JIAN; Guoqiang ; et al. | 2019-10-24 |
Apparatus for depositing metal films with plasma treatment
Grant 10,453,657 - Yao , et al. Oc | 2019-10-22 |
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 10,400,335 - Ge , et al. Sep | 2019-09-03 |
In-situ pre-clean for selectivity improvement for selective deposition
Grant 10,395,916 - Wu , et al. A | 2019-08-27 |
CVD silicon monolayer formation method and gate oxide ALD formation on semiconductor materials
Grant 10,373,824 - Kummel , et al. | 2019-08-06 |
Methods And Apparatus For Cryogenic Gas Stream Assisted SAM-Based Selective Deposition
App 20190210061 - Ke; Chang ; et al. | 2019-07-11 |
Apparatus and method for providing uniform flow of gas
Grant RE47,440 - Yudovsky , et al. | 2019-06-18 |
Methods Of Reducing Or Eliminating Defects In Tungsten Film
App 20190157102 - JIAN; GUOQIANG ; et al. | 2019-05-23 |
Methods for pre-cleaning conductive materials on a substrate
Grant 10,283,345 - Xie , et al. | 2019-05-07 |
Integration Of ALD Copper With High Temperature PVD Copper Deposition For BEOL Interconnect
App 20190115254 - Sheu; Ben-Li ; et al. | 2019-04-18 |
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
App 20190088489 - Fu; Xinyu ; et al. | 2019-03-21 |
Low Temperature Deposition Of Iridium Containing Films
App 20190078203 - Liu; Feng Q. ; et al. | 2019-03-14 |
Substrate Processing Chamber Having Heated Showerhead Assembly
App 20190078210 - GUNGOR; FARUK ; et al. | 2019-03-14 |
Methods For Depositing Semiconductor Films
App 20190019684 - Xu; Yi ; et al. | 2019-01-17 |
Deposition Of Cobalt Films With High Deposition Rate
App 20180350826 - Wrench; Jacqueline S. ; et al. | 2018-12-06 |
Cobalt Oxide Film Deposition
App 20180340255 - Zhou; Jing ; et al. | 2018-11-29 |
Methods of depositing metal films using metal oxyhalide precursors
Grant 10,121,671 - Fu , et al. November 6, 2 | 2018-11-06 |
Multi-threshold voltage (Vt) workfunction metal by selective atomic layer deposition (ALD)
Grant 10,109,534 - Brand , et al. October 23, 2 | 2018-10-23 |
Methods and apparatus for chemical vapor deposition of a cobalt layer
Grant 10,094,023 - Yu , et al. October 9, 2 | 2018-10-09 |
Apparatus for Increasing Flux from an Ampoule
App 20180250695 - Choi; Kenric ; et al. | 2018-09-06 |
Water Assisted Highly Pure Ruthenium Thin Film Deposition
App 20180195167 - Liu; Feng Q. ; et al. | 2018-07-12 |
Alcohol Assisted ALD Film Deposition
App 20180187304 - Liu; Feng Q. ; et al. | 2018-07-05 |
Deposition Of Metal Films
App 20180158686 - Gelatos; Avgerinos V. ; et al. | 2018-06-07 |
Methods To Fill High Aspect Ratio Features On Semiconductor Substrates With Mocvd Cobalt Film
App 20180151424 - YAO; DAPING ; et al. | 2018-05-31 |
Electromigration Improvement Using Tungsten For Selective Cobalt Deposition On Copper Surfaces
App 20180144973 - Ye; Weifeng ; et al. | 2018-05-24 |
Methods To Selectively Deposit Corrosion-Free Metal Contacts
App 20180145034 - Xu; Yi ; et al. | 2018-05-24 |
Methods for forming low-resistance contacts through integrated process flow systems
Grant 9,947,578 - Lei , et al. April 17, 2 | 2018-04-17 |
In-Situ Pre-Clean For Selectivity Improvement For Selective Deposition
App 20180076020 - Wu; Kai ; et al. | 2018-03-15 |
Alcohol assisted ALD film deposition
Grant 9,914,995 - Liu , et al. March 13, 2 | 2018-03-13 |
High Temperature Process Chamber Lid
App 20180053667 - Durukan; Ilker ; et al. | 2018-02-22 |
Cvd Silicon Monolayer Formation Method And Gate Oxide Ald Formation On Semiconductor Materials
App 20180033610 - KUMMEL; Andrew C. ; et al. | 2018-02-01 |
Self-limiting And Saturating Chemical Vapor Deposition Of A Silicon Bilayer And Ald
App 20180019116 - KACHIAN; Jessica S. ; et al. | 2018-01-18 |
Apparatus For Depositing Metal Films With Plasma Treatment
App 20180012732 - YAO; DAPING ; et al. | 2018-01-11 |
Apparatus and method for self-regulating fluid chemical delivery
Grant 9,857,027 - Salinas , et al. January 2, 2 | 2018-01-02 |
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
App 20170362710 - Ge; Zhenbin ; et al. | 2017-12-21 |
High temperature process chamber lid
Grant 9,831,109 - Durukan , et al. November 28, 2 | 2017-11-28 |
CVD silicon monolayer formation method and gate oxide ALD formation on III-V materials
Grant 9,824,889 - Kummel , et al. November 21, 2 | 2017-11-21 |
Gas Feedthrough Assembly
App 20170306488 - YAO; Daping ; et al. | 2017-10-26 |
Apparatus And Methods To Remove Residual Precursor Inside Gas Lines Post-Deposition
App 20170275754 - Yao; Daping ; et al. | 2017-09-28 |
Self-limiting and saturating chemical vapor deposition of a silicon bilayer and ALD
Grant 9,773,663 - Kachian , et al. September 26, 2 | 2017-09-26 |
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 9,765,432 - Ge , et al. September 19, 2 | 2017-09-19 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
App 20170194156 - Fu; Xinyu ; et al. | 2017-07-06 |
Deposition of films comprising aluminum alloys with high aluminum content
Grant 9,683,287 - Thompson , et al. June 20, 2 | 2017-06-20 |
Methods For Forming Low-resistance Contacts Through Integrated Process Flow Systems
App 20170148670 - LEI; YU ; et al. | 2017-05-25 |
Directional SiO.sub.2 etch using plasma pre-treatment and high-temperature etchant deposition
Grant 9,653,318 - Or , et al. May 16, 2 | 2017-05-16 |
Methods For Pre-cleaning Conductive Materials On A Substrate
App 20170098540 - XIE; Xiangjin ; et al. | 2017-04-06 |
Methods for depositing fluorine/carbon-free conformal tungsten
Grant 9,601,339 - Fu , et al. March 21, 2 | 2017-03-21 |
Methods for etching via atomic layer deposition (ALD) cycles
Grant 9,595,466 - Fu , et al. March 14, 2 | 2017-03-14 |
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
App 20170062224 - Fu; Xinyu ; et al. | 2017-03-02 |
Low Temperature Ald On Semiconductor And Metallic Surfaces
App 20170040158 - KACHIAN; Jessica S. ; et al. | 2017-02-09 |
Self-limiting And Saturating Chemical Vapor Deposition Of A Silicon Bilayer And Ald
App 20170040159 - KACHIAN; Jessica S. ; et al. | 2017-02-09 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20170029941 - ALLEN; Adolph Miller ; et al. | 2017-02-02 |
In-situ corrosion resistant substrate support coating
Grant 9,551,070 - Chang , et al. January 24, 2 | 2017-01-24 |
Plasma cleaning apparatus and method
Grant 9,552,968 - Deehan , et al. January 24, 2 | 2017-01-24 |
Methods for pre-cleaning conductive interconnect structures
Grant 9,460,959 - Xie , et al. October 4, 2 | 2016-10-04 |
Dual-Direction Chemical Delivery System For ALD/CVD Chambers
App 20160273108 - Ge; Zhenbin ; et al. | 2016-09-22 |
Methods For Etching Via Atomic Layer Deposition (ald) Cycles
App 20160276214 - FU; Xinyu ; et al. | 2016-09-22 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods
Grant 9,441,298 - Ahmed , et al. September 13, 2 | 2016-09-13 |
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition
App 20160247689 - OR; David T. ; et al. | 2016-08-25 |
Method for tuning a deposition rate during an atomic layer deposition process
Grant 9,418,890 - Ma , et al. August 16, 2 | 2016-08-16 |
Methods of preventing plasma induced damage during substrate processing
Grant 9,399,812 - Bodke , et al. July 26, 2 | 2016-07-26 |
Dual-direction chemical delivery system for ALD/CVD chambers
Grant 9,353,440 - Ge , et al. May 31, 2 | 2016-05-31 |
Alcohol Assisted ALD Film Deposition
App 20160145738 - Liu; Feng Q. ; et al. | 2016-05-26 |
Methods For Depositing Fluorine/Carbon-Free Conformal Tungsten
App 20160104624 - Fu; Xinyu ; et al. | 2016-04-14 |
Methods for atomic layer etching
Grant 9,305,805 - Chang , et al. April 5, 2 | 2016-04-05 |
Devices Including Metal-Silicon Contacts Using Indium Arsenide Films And Apparatus And Methods
App 20160068962 - Ahmed; Khaled Z. ; et al. | 2016-03-10 |
Selective Deposition With Alcohol Selective Reduction And Protection
App 20160064275 - Liu; Feng Q. ; et al. | 2016-03-03 |
N-metal film deposition with initiation layer
Grant 9,269,584 - Ganguli , et al. February 23, 2 | 2016-02-23 |
Methods And Apparatus For Chemical Vapor Deposition Of A Cobalt Layer
App 20160035619 - YU; SANG HO ; et al. | 2016-02-04 |
High Through-put And Low Temperature Ald Copper Deposition And Integration
App 20160032455 - Liu; Feng Q. ; et al. | 2016-02-04 |
Deposition chambers with UV treatment and methods of use
Grant 9,252,024 - Lam , et al. February 2, 2 | 2016-02-02 |
Directional SiO.sub.2 etch using plasma pre-treatment and high-temperature etchant deposition
Grant 9,245,769 - Or , et al. January 26, 2 | 2016-01-26 |
Apparatus And Method For Self-regulating Fluid Chemical Delivery
App 20160004259 - SALINAS; MARTIN JEFF ; et al. | 2016-01-07 |
Methods for depositing fluorine/carbon-free conformal tungsten
Grant 9,230,815 - Fu , et al. January 5, 2 | 2016-01-05 |
In-situ Corrosion Resistant Substrate Support Coating
App 20150345017 - Chang; Mei ; et al. | 2015-12-03 |
Directional SiO.sub.2 etch using low-temperature etchant deposition and plasma post-treatment
Grant 9,202,745 - Or , et al. December 1, 2 | 2015-12-01 |
Devices including metal-silicon contacts using indium arsenide films and apparatus and methods
Grant 9,190,320 - Ahmed , et al. November 17, 2 | 2015-11-17 |
Directional SiO2 etch using plasma pre-treatment and high-temperature etchant deposition
Grant 9,177,780 - Or , et al. November 3, 2 | 2015-11-03 |
Cvd Silicon Monolayer Formation Method And Gate Oxide Ald Formation On Iii-v Materials
App 20150303058 - KUMMEL; Andrew C. ; et al. | 2015-10-22 |
Deposition of N-metal films comprising aluminum alloys
Grant 9,145,612 - Gandikota , et al. September 29, 2 | 2015-09-29 |
Contact clean by remote plasma and repair of silicide surface
Grant 9,147,578 - Lu , et al. September 29, 2 | 2015-09-29 |
MULTI-THRESHOLD VOLTAGE (Vt) WORKFUNCTION METAL BY SELECTIVE ATOMIC LAYER DEPOSITION (ALD)
App 20150262828 - BRAND; ADAM ; et al. | 2015-09-17 |
Methods for atomic layer etching
Grant 9,111,876 - Chang , et al. August 18, 2 | 2015-08-18 |
Apparatus and method for providing uniform flow of gas
Grant 9,109,754 - Yudovsky , et al. August 18, 2 | 2015-08-18 |
Al bond pad clean method
Grant 9,082,828 - Chang July 14, 2 | 2015-07-14 |
Methods for manganese nitride integration
Grant 9,076,661 - Ma , et al. July 7, 2 | 2015-07-07 |
Dual-Direction Chemical Delivery System for ALD/CVD Chambers
App 20150176126 - Ge; Zhenbin ; et al. | 2015-06-25 |
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors
Grant 9,048,183 - Ganguli , et al. June 2, 2 | 2015-06-02 |
Methods For Atomic Layer Etching
App 20150132961 - Chang; Mei ; et al. | 2015-05-14 |
Process chamber lid design with built-in plasma source for short lifetime species
Grant 9,004,006 - Kao , et al. April 14, 2 | 2015-04-14 |
Directional SIO.sub.2 etch using low-temperature etchant deposition and plasma post-treatment
Grant 8,980,761 - Or , et al. March 17, 2 | 2015-03-17 |
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition
App 20150072508 - OR; David T. ; et al. | 2015-03-12 |
Apparatus and method for providing uniform flow of gas
Grant 8,955,547 - Gungor , et al. February 17, 2 | 2015-02-17 |
Deposition of metal films using alane-based precursors
Grant 8,927,059 - Lu , et al. January 6, 2 | 2015-01-06 |
Directional Sio2 Etch Using Low-temperature Etchant Deposition And Plasma Post-treatment
App 20140363979 - OR; David T. ; et al. | 2014-12-11 |
N-metal film deposition with initiation layer
Grant 8,895,443 - Ganguli , et al. November 25, 2 | 2014-11-25 |
Deposition Chambers With Uv Treatment And Methods Of Use
App 20140342555 - Lam; Hyman ; et al. | 2014-11-20 |
Method for removing oxides
Grant 8,846,163 - Kao , et al. September 30, 2 | 2014-09-30 |
Plasma Cleaning Apparatus And Method
App 20140283872 - DEEHAN; Martin ; et al. | 2014-09-25 |
High Temperature Process Chamber Lid
App 20140252015 - Durukan; Ilker ; et al. | 2014-09-11 |
Method For Tuning A Deposition Rate During An Atomic Layer Deposition Process
App 20140248772 - MA; Paul ; et al. | 2014-09-04 |
Process for forming cobalt-containing materials
Grant 8,815,724 - Ganguli , et al. August 26, 2 | 2014-08-26 |
Directional Sio2 Etch Using Plasma Pre-treatment And High-temperature Etchant Deposition
App 20140193979 - OR; David T. ; et al. | 2014-07-10 |
Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
App 20140174362 - Kao; Chien-Teh ; et al. | 2014-06-26 |
Apparatus For Providing Plasma To A Process Chamber
App 20140165911 - KAO; CHIEN-TEH ; et al. | 2014-06-19 |
Methods of end point detection for substrate fabrication processes
Grant 8,747,686 - Zheng , et al. June 10, 2 | 2014-06-10 |
Modular Chemical Delivery System
App 20140137961 - KAO; CHIEN-TEH ; et al. | 2014-05-22 |
Plasma cleaning apparatus and method
Grant 8,721,796 - Deehan , et al. May 13, 2 | 2014-05-13 |
Methods For Depositing Fluorine/carbon-free Conformal Tungsten
App 20140120723 - Fu; Xinyu ; et al. | 2014-05-01 |
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors
App 20140120712 - GANGULI; Seshadri ; et al. | 2014-05-01 |
Al Bond Pad Clean Method
App 20140113445 - CHANG; Mei | 2014-04-24 |
Deposition Of Films Comprising Aluminum Alloys With High Aluminum Content
App 20140112824 - Thompson; David ; et al. | 2014-04-24 |
Methods For Atomic Layer Etching
App 20140106565 - Chang; Mei ; et al. | 2014-04-17 |
Directional Sio2 Etch Using Low-temperature Etchant Deposition And Plasma Post-treatment
App 20140094036 - OR; David T. ; et al. | 2014-04-03 |
Multi Chamber Processing System
App 20140076234 - KAO; Chien-Teh ; et al. | 2014-03-20 |
NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors
Grant 8,642,468 - Ganguli , et al. February 4, 2 | 2014-02-04 |
Methods for contact clean
Grant 8,642,473 - Chang , et al. February 4, 2 | 2014-02-04 |
Methods for atomic layer etching
Grant 8,633,115 - Chang , et al. January 21, 2 | 2014-01-21 |
Deposition Of N-Metal Films Comprising Aluminum Alloys
App 20140017408 - Gandikota; Srinivas ; et al. | 2014-01-16 |
Doping aluminum in tantalum silicide
Grant 8,592,305 - Lu , et al. November 26, 2 | 2013-11-26 |
Methods For Manganese Nitride Integration
App 20130292806 - Ma; Paul F. ; et al. | 2013-11-07 |
Process for forming cobalt and cobalt silicide materials in tungsten contact applications
Grant 8,563,424 - Ganguli , et al. October 22, 2 | 2013-10-22 |
Apparatus and Method for Providing Uniform Flow of Gas
App 20130263944 - Gungor; Faruk ; et al. | 2013-10-10 |
Devices Including Metal-Silicon Contacts Using Indium Arsenide Films and Apparatus and Methods
App 20130200518 - Ahmed; Khaled Z. ; et al. | 2013-08-08 |
Methods Of End Point Detection For Substrate Fabrication Processes
App 20130193108 - Zheng; Bo ; et al. | 2013-08-01 |
In-situ chamber treatment and deposition process
Grant 8,491,967 - Ma , et al. July 23, 2 | 2013-07-23 |
Multi-Component Film Deposition
App 20130143415 - Yudovsky; Joseph ; et al. | 2013-06-06 |
Doped Tantalum Nitride for Copper Barrier Applications
App 20130140698 - Lakshmanan; Annamalai ; et al. | 2013-06-06 |
Methods for Atomic Layer Etching
App 20130137267 - Chang; Mei ; et al. | 2013-05-30 |
Doping aluminum in tantalum silicide
App 20130122697 - Lu; Xinliang ; et al. | 2013-05-16 |
Deposition Of Metal Films Using Alane-based Precursors
App 20130115383 - Lu; Xinliang ; et al. | 2013-05-09 |
Apparatus and Method for Providing Uniform Flow of Gas
App 20130098477 - Yudovsky; Joseph ; et al. | 2013-04-25 |
Methods Of Preventing Plasma Induced Damage During Substrate Processing
App 20130087447 - BODKE; ASHISH SUBHASH ; et al. | 2013-04-11 |
N-Metal Film Deposition With Initiation Layer
App 20120322250 - Ganguli; Seshadri ; et al. | 2012-12-20 |
N-Metal Film Deposition With Initiation Layer
App 20120322262 - Ganguli; Seshadri ; et al. | 2012-12-20 |
Integration of ALD tantalum nitride for copper metallization
Grant 8,324,095 - Chung , et al. December 4, 2 | 2012-12-04 |
Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere
Grant 8,318,605 - Kao , et al. November 27, 2 | 2012-11-27 |
Support Assembly
App 20120267346 - Kao; Chien-Teh ; et al. | 2012-10-25 |
Process For Forming Cobalt-containing Materials
App 20120264291 - Ganguli; Seshadri ; et al. | 2012-10-18 |
Method For Removing Oxides
App 20120244704 - KAO; Chien-Teh ; et al. | 2012-09-27 |
Method and apparatus for trench and via profile modification
Grant 8,268,684 - Chang , et al. September 18, 2 | 2012-09-18 |
Apparatus And Process For Atomic Layer Deposition
App 20120225192 - Yudovsky; Joseph ; et al. | 2012-09-06 |
Methods For Contact Clean
App 20120225558 - CHANG; MEI ; et al. | 2012-09-06 |
Apparatus and Process for Atomic Layer Deposition
App 20120225191 - Yudovsky; Joseph ; et al. | 2012-09-06 |
Dry Chemical Cleaning For Semiconductor Processing
App 20120220116 - Noori; Atif ; et al. | 2012-08-30 |
Selective etching of silicon nitride
Grant 8,252,696 - Lu , et al. August 28, 2 | 2012-08-28 |
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications
App 20120214303 - GANGULI; SESHADRI ; et al. | 2012-08-23 |
Process for forming cobalt and cobalt silicide materials in tungsten contact applications
Grant 8,187,970 - Ganguli , et al. May 29, 2 | 2012-05-29 |
Process for forming cobalt-containing materials
Grant 8,110,489 - Ganguli , et al. February 7, 2 | 2012-02-07 |
Apparatus and method for hybrid chemical processing
Grant 8,070,879 - Chen , et al. December 6, 2 | 2011-12-06 |
Method And Apparatus For Trench And Via Profile Modification
App 20110294258 - CHANG; MEI ; et al. | 2011-12-01 |
Method and apparatus for generating a precursor for a semiconductor processing system
Grant 8,062,422 - Chen , et al. November 22, 2 | 2011-11-22 |
Process Chamber Lid Design With Built-in Plasma Source For Short Lifetime Species
App 20110265721 - Kao; Chien-Teh ; et al. | 2011-11-03 |
Nmos Metal Gate Materials, Manufacturing Methods, And Equipment Using Cvd And Ald Processes With Metal Based Precursors
App 20110263115 - Ganguli; Seshadri ; et al. | 2011-10-27 |
Integration sequences with top surface profile modification
Grant 8,043,933 - Kao , et al. October 25, 2 | 2011-10-25 |
Method For Removing Oxides
App 20110223755 - KAO; CHIEN-TEH ; et al. | 2011-09-15 |
Method and apparatus for trench and via profile modification
Grant 7,994,002 - Chang , et al. August 9, 2 | 2011-08-09 |
Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere
Grant 7,977,246 - Yang , et al. July 12, 2 | 2011-07-12 |
Methods Of Thin Film Process
App 20110151676 - Ingle; Nitin K. ; et al. | 2011-06-23 |
Process For Forming Cobalt-containing Materials
App 20110124192 - Ganguli; Seshadri ; et al. | 2011-05-26 |
Methods of thin film process
Grant 7,939,422 - Ingle , et al. May 10, 2 | 2011-05-10 |
Contact Clean By Remote Plasma And Repair Of Silicide Surface
App 20110104897 - LU; XINLIANG ; et al. | 2011-05-05 |
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications
App 20110086509 - GANGULI; SESHADRI ; et al. | 2011-04-14 |
Multi-station deposition apparatus and method
Grant 7,923,069 - Chang , et al. April 12, 2 | 2011-04-12 |
Ruthenium layer formation for copper film deposition
Grant 7,910,165 - Ganguli , et al. March 22, 2 | 2011-03-22 |
Direct real-time monitoring and feedback control of RF plasma output for wafer processing
Grant 7,910,853 - Or , et al. March 22, 2 | 2011-03-22 |
Methods and systems for forming at least one dielectric layer
Grant 7,871,926 - Xia , et al. January 18, 2 | 2011-01-18 |
Contact clean by remote plasma and repair of silicide surface
Grant 7,867,789 - Lu , et al. January 11, 2 | 2011-01-11 |
Multi-station Deposition Apparatus And Method
App 20100316800 - Chang; Mei ; et al. | 2010-12-16 |
Methods for forming a titanium nitride layer
Grant 7,846,824 - Kashefizadeh , et al. December 7, 2 | 2010-12-07 |
Deposition and densification process for titanium nitride barrier layers
Grant 7,838,441 - Khandelwal , et al. November 23, 2 | 2010-11-23 |
High Pressure Rf-dc Sputtering And Methods To Improve Film Uniformity And Step-coverage Of This Process
App 20100252417 - Allen; Adolph Miller ; et al. | 2010-10-07 |
Multi-station deposition apparatus and method
Grant 7,794,789 - Chang , et al. September 14, 2 | 2010-09-14 |
Passivation layer formation by plasma clean process to reduce native oxide growth
Grant 7,780,793 - Yang , et al. August 24, 2 | 2010-08-24 |
Gas delivery apparatus for atomic layer deposition
Grant 7,780,785 - Chen , et al. August 24, 2 | 2010-08-24 |
Method for front end of line fabrication
Grant 7,767,024 - Kao , et al. August 3, 2 | 2010-08-03 |
Integration Sequences With Top Surface Profile Modification
App 20100129982 - Kao; Chien-Teh ; et al. | 2010-05-27 |
Method And Apparatus For Trench And Via Profile Modification
App 20100129958 - Chang; Mei ; et al. | 2010-05-27 |
Plasma Cleaning Apparatus And Method
App 20100101602 - Deehan; Martin ; et al. | 2010-04-29 |
Nf3/h2 Remote Plasma Process With High Etch Selectivity Of Psg/bpsg Over Thermal Oxide And Low Density Surface Defects
App 20100099263 - Kao; Chien-Teh ; et al. | 2010-04-22 |
Gas delivery apparatus for atomic layer deposition
Grant 7,699,023 - Chen , et al. April 20, 2 | 2010-04-20 |
Ruthenium or cobalt as an underlayer for tungsten film deposition
Grant 7,691,442 - Gandikota , et al. April 6, 2 | 2010-04-06 |
Integration Of Ald Tantalum Nitride For Copper Metallization
App 20100075494 - Chung; Hua ; et al. | 2010-03-25 |
In-situ Chamber Treatment And Deposition Process
App 20100062614 - Ma; Paul F. ; et al. | 2010-03-11 |
Method For Tuning A Deposition Rate During An Atomic Layer Deposition Process
App 20100062149 - Ma; Paul ; et al. | 2010-03-11 |
Noble metal layer formation for copper film deposition
Grant 7,658,970 - Chang , et al. February 9, 2 | 2010-02-09 |
Apparatus And Method For Hybrid Chemical Processing
App 20090308318 - Chen; Ling ; et al. | 2009-12-17 |
Contact Clean by Remote Plasma and Repair of Silicide Surface
App 20090305500 - Lu; Xinliang ; et al. | 2009-12-10 |
Deposition And Densification Process For Titanium Nitride Barrier Layers
App 20090280640 - KHANDELWAL; AMIT ; et al. | 2009-11-12 |
Thermal Annealing Method For Preventing Defects In Doped Silicon Oxide Surfaces During Exposure To Atmosphere
App 20090269930 - Yang; Haichun ; et al. | 2009-10-29 |
Plasma Treatment Method For Preventing Defects In Doped Silicon Oxide Surfaces During Exposure To Atmosphere
App 20090269934 - Kao; Chien-Teh ; et al. | 2009-10-29 |
Formation of composite tungsten films
Grant 7,605,083 - Lai , et al. October 20, 2 | 2009-10-20 |
Chemical precursor ampoule for vapor deposition processes
Grant 7,597,758 - Chen , et al. October 6, 2 | 2009-10-06 |
Methods For Forming A Titanium Nitride Layer
App 20090239378 - KASHEFIZADEH; KEYVAN ; et al. | 2009-09-24 |
Apparatus for hybrid chemical processing
Grant 7,591,907 - Chen , et al. September 22, 2 | 2009-09-22 |
Apparatus and method for generating a chemical precursor
Grant 7,588,736 - Chen , et al. September 15, 2 | 2009-09-15 |
Direct Real-time Monitoring And Feedback Control Of Rf Plasma Output For Wafer Processing
App 20090218324 - Or; David T. ; et al. | 2009-09-03 |
Multi-station Deposition Apparatus And Method
App 20090214786 - Chang; Mei ; et al. | 2009-08-27 |
Process With Saturation At Low Etch Amount For High Contact Bottom Cleaning Efficiency For Chemical Dry Clean Process
App 20090191703 - Lu; Xinliang ; et al. | 2009-07-30 |
Contact clean by remote plasma and repair of silicide surface
Grant 7,550,381 - Lu , et al. June 23, 2 | 2009-06-23 |
Method And Apparatus For Generating A Precursor For A Semiconductor Processing System
App 20090151633 - Chen; Ling ; et al. | 2009-06-18 |
Multi-station deposition apparatus and method
Grant 7,547,465 - Chang , et al. June 16, 2 | 2009-06-16 |
Ruthenium As An Underlayer For Tungsten Film Deposition
App 20090142474 - Gandikota; Srinivas ; et al. | 2009-06-04 |
Method For Removing Oxides
App 20090111280 - Kao; Chien-Teh ; et al. | 2009-04-30 |
Method and apparatus for generating a precursor for a semiconductor processing system
Grant 7,524,374 - Chen , et al. April 28, 2 | 2009-04-28 |
Methods and Systems for Forming at Least One Dielectric Layer
App 20090104764 - Xia; Li-Qun ; et al. | 2009-04-23 |
Selective Etching Of Silicon Nitride
App 20090104782 - LU; XINLAING ; et al. | 2009-04-23 |
Lid assembly for front end of line fabrication
Grant 7,520,957 - Kao , et al. April 21, 2 | 2009-04-21 |
Deposition and densification process for titanium nitride barrier layers
Grant 7,521,379 - Khandelwal , et al. April 21, 2 | 2009-04-21 |
Support Assembly
App 20090095621 - Kao; Chien-Teh ; et al. | 2009-04-16 |
Deposition processes for tungsten-containing barrier layers
Grant 7,507,660 - Chen , et al. March 24, 2 | 2009-03-24 |
Apparatus for integration of barrier layer and seed layer
Grant 7,494,908 - Chung , et al. February 24, 2 | 2009-02-24 |
Process For Forming Cobalt And Cobalt Silicide Materials In Tungsten Contact Applications
App 20090004850 - GANGULI; SESHADRI ; et al. | 2009-01-01 |
Apparatus And Method For Hybrid Chemical Processing
App 20080274299 - CHEN; LING ; et al. | 2008-11-06 |
Noble Metal Layer Formation For Copper Film Deposition
App 20080274279 - CHANG; MEI ; et al. | 2008-11-06 |
Method For Front End Of Line Fabrication
App 20080268645 - KAO; CHIEN-TEH ; et al. | 2008-10-30 |
Ruthenium as an underlayer for tungsten film deposition
Grant 7,429,402 - Gandikota , et al. September 30, 2 | 2008-09-30 |
Formation Of Composite Tungsten Films
App 20080227291 - LAI; KEN K. ; et al. | 2008-09-18 |
Chemical Precursor Ampoule For Vapor Deposition Processes
App 20080216743 - CHEN; LING ; et al. | 2008-09-11 |
Methods Of Thin Film Process
App 20080182382 - Ingle; Nitin K. ; et al. | 2008-07-31 |
Noble metal layer formation for copper film deposition
Grant 7,404,985 - Chang , et al. July 29, 2 | 2008-07-29 |
Apparatus and method for hybrid chemical processing
Grant 7,402,210 - Chen , et al. July 22, 2 | 2008-07-22 |
Method for front end of line fabrication
Grant 7,396,480 - Kao , et al. July 8, 2 | 2008-07-08 |
Passivation Layer Formation By Plasma Clean Process To Reduce Native Oxide Growth
App 20080160210 - Yang; Haichun ; et al. | 2008-07-03 |
Formation of composite tungsten films
Grant 7,384,867 - Lai , et al. June 10, 2 | 2008-06-10 |
Deposition And Densification Process For Titanium Nitride Barrier Layers
App 20080085611 - KHANDELWAL; AMIT ; et al. | 2008-04-10 |
Integration of barrier layer and seed layer
Grant 7,352,048 - Chung , et al. April 1, 2 | 2008-04-01 |
Gas Delivery Apparatus For Atomic Layer Deposition
App 20080041313 - CHEN; LING ; et al. | 2008-02-21 |
Deposition Processes For Tungsten-containing Barrier Layers
App 20080008823 - CHEN; LING ; et al. | 2008-01-10 |
Apparatus For Integration Of Barrier Layer And Seed Layer
App 20070283886 - CHUNG; HUA ; et al. | 2007-12-13 |
Method and apparatus of generating PDMAT precursor
Grant 7,270,709 - Chen , et al. September 18, 2 | 2007-09-18 |
Ruthenium layer formation for copper film deposition
Grant 7,264,846 - Chang , et al. September 4, 2 | 2007-09-04 |
Process For Forming Cobalt-containing Materials
App 20070202254 - GANGULI; SESHADRI ; et al. | 2007-08-30 |
Enhancement of copper line reliability using thin ALD tan film to cap the copper line
Grant 7,262,133 - Chen , et al. August 28, 2 | 2007-08-28 |
Apparatus And Method For Hybrid Chemical Processing
App 20070151514 - CHEN; LING ; et al. | 2007-07-05 |
Reliability Barrier Integration For Cu Application
App 20070151861 - XI; MING ; et al. | 2007-07-05 |
Apparatus and method for hybrid chemical processing
Grant 7,204,886 - Chen , et al. April 17, 2 | 2007-04-17 |
Method and apparatus for generating a precursor for a semiconductor processing system
App 20070067609 - Chen; Ling ; et al. | 2007-03-22 |
Contact clean by remote plasma and repair of silicide surface
App 20070015360 - Lu; Xinliang ; et al. | 2007-01-18 |
Apparatus And Method For Generating A Chemical Precursor
App 20060257295 - Chen; Ling ; et al. | 2006-11-16 |
Ruthenium layer formation for copper film deposition
App 20060153973 - Chang; Mei ; et al. | 2006-07-13 |
Integration of ALD tantalum nitride for copper metallization
App 20060148253 - Chung; Hua ; et al. | 2006-07-06 |
Apparatus for generating plasma by RF power
App 20060130971 - Chang; Yu ; et al. | 2006-06-22 |
Ruthenium as an underlayer for tungsten film deposition
App 20060128150 - Gandikota; Srinivas ; et al. | 2006-06-15 |
Integration of ALD tantalum nitride for copper metallization
Grant 7,049,226 - Chung , et al. May 23, 2 | 2006-05-23 |
Reliability barrier integration for Cu application
Grant 7,026,238 - Xi , et al. April 11, 2 | 2006-04-11 |
In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber
App 20060051966 - Or; David T. ; et al. | 2006-03-09 |
Formation of composite tungsten films
App 20050287807 - Lai, Ken K. ; et al. | 2005-12-29 |
Multi-station deposition apparatus and method
App 20050271814 - Chang, Mei ; et al. | 2005-12-08 |
In-situ dry clean chamber for front end of line fabrication
App 20050230350 - Kao, Chien-Teh ; et al. | 2005-10-20 |
Noble metal layer formation for copper film deposition
App 20050220998 - Chang, Mei ; et al. | 2005-10-06 |
Lid assembly for front end of line fabrication
App 20050218507 - Kao, Chien-Teh ; et al. | 2005-10-06 |
Substrate support for in-situ dry clean chamber for front end of line fabrication
App 20050221552 - Kao, Chien-Teh ; et al. | 2005-10-06 |
Method for front end of line fabrication
App 20050205110 - Kao, Chien-Teh ; et al. | 2005-09-22 |
Formation of composite tungsten films
Grant 6,939,804 - Lai , et al. September 6, 2 | 2005-09-06 |
Method and apparatus of generating PDMAT precursor
App 20050189072 - Chen, Ling ; et al. | 2005-09-01 |
Integration of barrier layer and seed layer
Grant 6,936,906 - Chung , et al. August 30, 2 | 2005-08-30 |
Multi-station deposition apparatus and method
Grant 6,932,871 - Chang , et al. August 23, 2 | 2005-08-23 |
Method of TiSiN deposition using a chemical vapor deposition (CVD) process
Grant 6,933,021 - Chou , et al. August 23, 2 | 2005-08-23 |
Integration of barrier layer and seed layer
App 20050139948 - Chung, Hua ; et al. | 2005-06-30 |
Method and apparatus for cleaning substrates
Grant 6,908,865 - Kranz , et al. June 21, 2 | 2005-06-21 |
Method and apparatus of generating PDMAT precursor
Grant 6,905,541 - Chen , et al. June 14, 2 | 2005-06-14 |
Integration of ALD tantalum nitride for copper metallization
App 20050106865 - Chung, Hua ; et al. | 2005-05-19 |
System and method to form a composite film stack utilizing sequential deposition techniques
Grant 6,849,545 - Mak , et al. February 1, 2 | 2005-02-01 |
Ruthenium layer formation for copper film deposition
App 20040241321 - Ganguli, Seshadri ; et al. | 2004-12-02 |
Atomic layer deposition of copper using a reducing gas and non-fluorinated copper precursors
Grant 6,821,891 - Chen , et al. November 23, 2 | 2004-11-23 |
Reliability barrier integration for Cu application
App 20040209460 - Xi, Ming ; et al. | 2004-10-21 |
Enhancement of Cu line reliability using thin ALD TaN film to cap the Cu line
App 20040187304 - Chen, Ling ; et al. | 2004-09-30 |
Apparatus and method for hybrid chemical processing
App 20040144311 - Chen, Ling ; et al. | 2004-07-29 |
Ruthenium layer formation for copper film deposition
App 20040105934 - Chang, Mei ; et al. | 2004-06-03 |
Chamber for constructing a film on a semiconductor wafer
App 20040099215 - Danek, Michal ; et al. | 2004-05-27 |
RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
Grant 6,705,246 - Sharan , et al. March 16, 2 | 2004-03-16 |
Method for constructing a film on a semiconductor wafer
Grant 6,699,530 - Danek , et al. March 2, 2 | 2004-03-02 |
Method and apparatus of generating PDMAT precursor
App 20040014320 - Chen, Ling ; et al. | 2004-01-22 |
Formation of composite tungsten films
App 20040014315 - Lai, Ken K. ; et al. | 2004-01-22 |
Deposition of copper films
App 20040009665 - Chen, Ling ; et al. | 2004-01-15 |
Method and apparatus for forming a thin polymer layer on an integrated circuit structure
Grant 6,663,713 - Robles , et al. December 16, 2 | 2003-12-16 |
Multi-station deposition apparatus and method
App 20030194493 - Chang, Mei ; et al. | 2003-10-16 |
Copper interconnect barrier layer structure and formation method
Grant 6,607,976 - Chen , et al. August 19, 2 | 2003-08-19 |
Atomic layer deposition of copper using a reducing gas and non-fluorinated copper precursors
App 20030129308 - Chen, Ling ; et al. | 2003-07-10 |
Gas delivery apparatus for atomic layer deposition
App 20030121608 - Chen, Ling ; et al. | 2003-07-03 |
Plasma treatment of a titanium nitride film formed by chemical vapor deposition
Grant 6,555,183 - Wang , et al. April 29, 2 | 2003-04-29 |
Method and apparatus for cleaning substrates
App 20030062333 - Kranz, Martin ; et al. | 2003-04-03 |
Copper interconnect barrier layer structure and formation method
App 20030059980 - Chen, Ling ; et al. | 2003-03-27 |
Method for in-situ, post deposition surface passivation of a chemical vapor deposited film
Grant 6,432,479 - Chang , et al. August 13, 2 | 2002-08-13 |
Method for unreacted precursor conversion and effluent removal
Grant 6,402,806 - Schmitt , et al. June 11, 2 | 2002-06-11 |
Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature
Grant 6,365,495 - Wang , et al. April 2, 2 | 2002-04-02 |
Method of titanium/titanium nitride integration
Grant 6,326,690 - Wang , et al. December 4, 2 | 2001-12-04 |
Deposition of tungsten nitride by plasma enhanced chemical vapor deposition
Grant 6,309,713 - Mak , et al. October 30, 2 | 2001-10-30 |
CVD process for DCS-based tungsten silicide
Grant 6,297,152 - Itoh , et al. October 2, 2 | 2001-10-02 |
Chemical vapor deposition hardware and process
Grant 6,296,712 - Guo , et al. October 2, 2 | 2001-10-02 |
HDP-CVD apparatus and process for depositing titanium films for semiconductor devices
Grant 6,294,466 - Chang September 25, 2 | 2001-09-25 |
Plasma annealing of substrates to improve adhesion
Grant 6,291,343 - Tseng , et al. September 18, 2 | 2001-09-18 |
Etch chamber
Grant 6,270,621 - Tam , et al. August 7, 2 | 2001-08-07 |
Plasma treatment of titanium nitride formed by chemical vapor deposition
Grant 6,270,859 - Zhao , et al. August 7, 2 | 2001-08-07 |
Method for cleaning a process chamber
Grant 6,242,347 - Vasudev , et al. June 5, 2 | 2001-06-05 |
RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition
Grant 6,235,646 - Sharan , et al. May 22, 2 | 2001-05-22 |
Method of titanium/titanium nitride integration
Grant 6,214,714 - Wang , et al. April 10, 2 | 2001-04-10 |
Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography
Grant 6,184,150 - Yang , et al. February 6, 2 | 2001-02-06 |
Deposition of copper with increased adhesion
Grant 6,171,661 - Zheng , et al. January 9, 2 | 2001-01-09 |
Apparatus for substrate processing with improved throughput and yield
Grant 6,129,044 - Zhao , et al. October 10, 2 | 2000-10-10 |
Reactor useful for chemical vapor deposition of titanium nitride
Grant 6,106,625 - Koai , et al. August 22, 2 | 2000-08-22 |
Chemical vapor deposition chamber
Grant 6,103,014 - Lei , et al. August 15, 2 | 2000-08-15 |
Chemical vapor deposition hot-trap for unreacted precursor conversion and effluent removal
Grant 6,099,649 - Schmitt , et al. August 8, 2 | 2000-08-08 |
Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein
Grant 6,090,706 - Telford , et al. July 18, 2 | 2000-07-18 |
Reactor optimized for chemical vapor deposition of titanium
Grant 6,079,356 - Umotoy , et al. June 27, 2 | 2000-06-27 |
High temperature resistive heater for a process chamber
Grant 6,066,836 - Chen , et al. May 23, 2 | 2000-05-23 |
Processing chamber and method for confining plasma
Grant 6,063,441 - Koai , et al. May 16, 2 | 2000-05-16 |
PECVD of compounds of silicon from silane and nitrogen
Grant 6,040,022 - Chang , et al. March 21, 2 | 2000-03-21 |
Center gas feed apparatus for a high density plasma reactor
Grant 6,027,606 - Mohn , et al. February 22, 2 | 2000-02-22 |
Bomine and iodine etch process for silicon and silicides
Grant 6,020,270 - Wong , et al. February 1, 2 | 2000-02-01 |
Construction of a tantalum nitride film on a semiconductor wafer
Grant 5,989,999 - Levine , et al. November 23, 1 | 1999-11-23 |
Methods and apparatus for a cleaning process in a high temperature, corrosive, plasma environment
Grant 5,983,906 - Zhao , et al. November 16, 1 | 1999-11-16 |
Removable pumping channel liners within a chemical vapor deposition chamber
Grant 5,964,947 - Zhao , et al. October 12, 1 | 1999-10-12 |
Chemical vapor deposition chamber
Grant 5,935,338 - Lei , et al. August 10, 1 | 1999-08-10 |
Chemical vapor deposition chamber
Grant 5,882,419 - Sinha , et al. March 16, 1 | 1999-03-16 |
Bromine and iodine etch process for silicon and silicides
Grant 5,874,362 - Wong , et al. February 23, 1 | 1999-02-23 |
Substrate support shield in wafer processing reactors
Grant 5,855,687 - DuBois , et al. January 5, 1 | 1999-01-05 |
Chemical vapor deposition of a thin film onto a substrate
Grant 5,856,240 - Sinha , et al. January 5, 1 | 1999-01-05 |
Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions
Grant 5,851,299 - Cheng , et al. December 22, 1 | 1998-12-22 |
Thermally floating pedestal collar in a chemical vapor deposition chamber
Grant 5,846,332 - Zhao , et al. December 8, 1 | 1998-12-08 |
Wafer surface temperature control for deposition of thin films
Grant 5,834,068 - Chern , et al. November 10, 1 | 1998-11-10 |
Utilization of SiH.sub.4 soak and purge in deposition processes
Grant 5,817,576 - Tseng , et al. October 6, 1 | 1998-10-06 |
Purge in silicide deposition processes dichlorosilane
Grant 5,780,360 - Tseng , et al. July 14, 1 | 1998-07-14 |
Chemical vapor deposition chamber
Grant 5,695,568 - Sinha , et al. December 9, 1 | 1997-12-09 |
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