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Dipoles In Semiconductor Devices
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Method For Forming Epitaxial Source/drain Features Using A Self-aligned Mask And Semiconductor Devices Fabricated Thereof
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Semiconductor device including a Fin-FET and method of manufacturing the same
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Semiconductor Device Including A Fin-fet And Method Of Manufacturing The Same
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Semiconductor device including a Fin-FET and method of manufacturing the same
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Multi-threshold gate structure with doped gate dielectric layer
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Multi-threshold gate structure with doped gate dielectric layer
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Semiconductor Device Structure
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Semiconductor Device And Forming Method Thereof
App 20210288166 - HUANG; Yao-Sheng ; et al. | 2021-09-16 |
Semiconductor Device Structure Having Gate Dielectric Layer
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Semiconductor Structure
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Semiconductor Device Including Interface Layer And Method Of Fabricating Thereof
App 20210249308 - CHENG; Chung-Liang ; et al. | 2021-08-12 |
Semiconductor device structure and method for forming the same
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Semiconductor structure and method of forming the same
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Semiconductor device
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Method for forming semiconductor device structure having oxide layer
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Method for forming semiconductor device structure
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Semiconductor arrangement and method of manufacture
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Semiconductor device including interface layer and method of fabricating thereof
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Multi-threshold Gate Structure With Doped Gate Dielectric Layer
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Method For Forming Semiconductor Device Structure
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Semiconductor Device Including Interface Layer And Method Of Fabricating Thereof
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Semiconductor Device
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Semiconductor Device Including A Fin-fet And Method Of Manufacturing The Same
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Semiconductor Device Including A Fin-fet And Method Of Manufacturing The Same
App 20200303259 - OKUNO; Yasutoshi ; et al. | 2020-09-24 |
Semiconductor device and manufacturing method thereof
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Semiconductor device including a Fin-FET and method of manufacturing the same
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Semiconductor Arrangement And Method Of Manufacture
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Semiconductor Structure And Method Of Forming The Same
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Semiconductor Device Structure And Method For Forming The Same
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Semiconductor Device And Manufacturing Method Thereof
App 20200035811 - HUANG; Yao-Sheng ; et al. | 2020-01-30 |
Method For Forming Semiconductor Device Structure Having Oxide Layer
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Semiconductor Device And Method Of Manufacturing The Same
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Curved wafer processing method and apparatus
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Structure and method for integrated devices on different substartes with interfacial engineering
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FinFET device with gate oxide layer
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Finfet Device With Gate Oxide Layer
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Curved Wafer Processing Method and Apparatus
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Curved wafer processing on method and apparatus
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Structure And Method For Integrated Devices On Different Substartes With Interfacial Engineering
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Curved Wafer Processing on Method and Apparatus
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2-transistor Nonvolatile Memory Cell
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Flash memory cell having multi-program channels
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Flash memory cell having multi-program channels
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