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name:-0.0076849460601807
name:-0.0078179836273193
CHANG; Hsiao-Lun Patent Filings

CHANG; Hsiao-Lun

Patent Applications and Registrations

Patent applications and USPTO patent grants for CHANG; Hsiao-Lun.The latest application filed is for "method of lithography process using reticle container with discharging device".

Company Profile
7.6.10
  • CHANG; Hsiao-Lun - Tainan City TW
  • Chang; Hsiao-Lun - Tainan TW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Method Of Lithography Process Using Reticle Container With Discharging Device
App 20220260901 - CHANG; Hsiao-Lun ;   et al.
2022-08-18
Reticle with conductive material structure
Grant 11,320,733 - Chang , et al. May 3, 2
2022-05-03
Droplet generator assembly and method for using the same and radiation source apparatus
Grant 11,134,558 - Tu , et al. September 28, 2
2021-09-28
Replacement Method For Droplet Generator
App 20210298161 - TU; Shih-Yu ;   et al.
2021-09-23
Droplet Catcher, Droplet Catcher System Of Euv Lithography Apparatus, And Maintenance Method Of The Euv Lithography Apparatus
App 20210286273 - Tu; Shih-Yu ;   et al.
2021-09-16
Euv Light Source And Apparatus For Euv Lithography
App 20210227676 - CHENG; Wei-Shin ;   et al.
2021-07-22
Droplet catcher system of EUV lithography apparatus and EUV lithography apparatus maintenance method
Grant 11,067,906 - Tu , et al. July 20, 2
2021-07-20
Refill and replacement method for droplet generator
Grant 11,032,897 - Tu , et al. June 8, 2
2021-06-08
Refill And Replacement Method For Droplet Generator
App 20210059036 - TU; Shih-Yu ;   et al.
2021-02-25
Droplet Catcher System of EUV Lithography Apparatus and EUV Lithography Apparatus Maintenance Method
App 20210033986 - Tu; Shih-Yu ;   et al.
2021-02-04
Reticle With Conductive Material Structure
App 20210026236 - CHANG; Hsiao-Lun ;   et al.
2021-01-28
EUV light source and apparatus for EUV lithography
Grant 10,880,980 - Cheng , et al. December 29, 2
2020-12-29
Method for discharging static charges on reticle
Grant 10,802,394 - Chang , et al. October 13, 2
2020-10-13
Euv Light Source And Apparatus For Euv Lithography
App 20200107426 - CHENG; Wei-Shin ;   et al.
2020-04-02
Droplet Generator Assembly And Method For Using The Same And Radiation Source Apparatus
App 20200107427 - TU; Shih-Yu ;   et al.
2020-04-02
Method For Discharging Static Charges On Reticle
App 20190155139 - CHANG; Hsiao-Lun ;   et al.
2019-05-23

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