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Patent applications and USPTO patent grants for CHANG; Hong-Young.The latest application filed is for "plasma generating apparatus and substrate processing apparatus".
Patent | Date |
---|---|
Plasma Generating Apparatus And Substrate Processing Apparatus App 20200161096 - CHANG; Hong-Young ;   et al. | 2020-05-21 |
Plasma generating apparatus and substrate processing apparatus Grant 10,553,406 - Chang , et al. Fe | 2020-02-04 |
Plasma Processing System Using Electron Beam And Capacitively-coupled Plasma App 20170330773 - Chang; Hong-Young ;   et al. | 2017-11-16 |
Plasma apparatus and substrate-processing apparatus Grant 9,734,990 - Chang , et al. August 15, 2 | 2017-08-15 |
Plasma generation apparatus Grant 9,066,413 - Chang , et al. June 23, 2 | 2015-06-23 |
Ferroelectric fluoride compositions and methods of making and using same Grant 8,999,189 - Halasyamani , et al. April 7, 2 | 2015-04-07 |
Plasma Generating Apparatus And Substrate Treating Apparatus App 20140320016 - CHANG; Hong-Young ;   et al. | 2014-10-30 |
Plasma Apparatus And Substrate-processing Apparatus App 20140292193 - CHANG; Hong-Young ;   et al. | 2014-10-02 |
Plasma Generation Apparatus App 20140077700 - CHANG; Hong-Young ;   et al. | 2014-03-20 |
Plasma Generating Apparatus And Substrate Processing Apparatus App 20140007812 - Chang; Hong-Young ;   et al. | 2014-01-09 |
Plasma Generator App 20130255575 - CHANG; Hong-Young ;   et al. | 2013-10-03 |
Ferroelectric fluoride compositions and methods of making and using same App 20110220836 - HALASYAMANI; P. Shiv ;   et al. | 2011-09-15 |
Apparatus using hybrid coupled plasma Grant 7,442,273 - Kwon , et al. October 28, 2 | 2008-10-28 |
Apparatus using hybrid coupled plasma App 20050017201 - Kwon, Gi-Chung ;   et al. | 2005-01-27 |
Plasma generating apparatus and SiO2 thin film etching method using the same App 20030052087 - Kwon, Gi-Chung ;   et al. | 2003-03-20 |
Antenna device for generating inductively coupled plasma Grant 6,288,493 - Lee , et al. September 11, 2 | 2001-09-11 |
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