| Patent | Date |
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Use Of Vacuum During Transfer Of Substrates
App 20220305601 - CHANDRASEKHARAN; Ramesh ; et al. | 2022-09-29 |
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 11,443,975 - Breiling , et al. September 13, 2 | 2022-09-13 |
Systems And Methods For Reducing Effluent Build-up In A Pumping Exhaust System
App 20220259725 - XAVIER; Antonio ; et al. | 2022-08-18 |
Temperature Control Of A Multi-zone Pedestal
App 20220243332 - CHANDRASEKHARAN; Ramesh ; et al. | 2022-08-04 |
Use Of Rotation To Correct For Azimuthal Non-uniformities In Semiconductor Substrate Processing
App 20220243323 - CHANDRASEKHARAN; Ramesh ; et al. | 2022-08-04 |
Independently Adjustable Flowpath Conductance In Multi-station Semiconductor Processing
App 20220228263 - Roberts; Michael Philip ; et al. | 2022-07-21 |
Rapid Tuning Of Critical Dimension Non-uniformity By Modulating Temperature Transients Of Multi-zone Substrate Supports
App 20220223440 - KUMAR; Ravi ; et al. | 2022-07-14 |
Trim And Deposition Profile Control With Multi-zone Heated Substrate Support For Multi-patterning Processes
App 20220205105 - CHANDRASEKHARAN; Ramesh ; et al. | 2022-06-30 |
Pedestals For Modulating Film Properties In Atomic Layer Deposition (ald) Substrate Processing Chambers
App 20220162749 - LAVOIE; Adrien ; et al. | 2022-05-26 |
Systems and methods for reducing effluent build-up in a pumping exhaust system
Grant 11,332,824 - Xavier , et al. May 17, 2 | 2022-05-17 |
Progressive Heating Of Components Of Substrate Processing Systems Using Tcr Element-based Heaters
App 20220037170 - CHANDRASEKHARAN; Ramesh ; et al. | 2022-02-03 |
Multi zone substrate support for ALD film property correction and tunability
Grant 11,236,422 - Roberts , et al. February 1, 2 | 2022-02-01 |
Multilayer Coatings Of Component Parts For A Work Piece Processing Chamber
App 20220028662 - KONKOLA; Paul ; et al. | 2022-01-27 |
Electrostatic chucking pedestal with substrate backside purging and thermal sinking
Grant 11,232,966 - Thomas , et al. January 25, 2 | 2022-01-25 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20210381106 - Xia; Chunguang ; et al. | 2021-12-09 |
Progressive heating of components of substrate processing systems using TCR element-based heaters
Grant 11,183,400 - Chandrasekharan , et al. November 23, 2 | 2021-11-23 |
Fill On Demand Ampoule Refill
App 20210324521 - Nguyen; Tuan ; et al. | 2021-10-21 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 11,111,581 - Xia , et al. September 7, 2 | 2021-09-07 |
Dynamic Temperature Control Of Substrate Support In Substrate Processing System
App 20210272828 - SUNDARAM; Sairam ; et al. | 2021-09-02 |
Fill on demand ampoule refill
Grant 11,072,860 - Nguyen , et al. July 27, 2 | 2021-07-27 |
Suppressing interfacial reactions by varying the wafer temperature throughout deposition
Grant 11,075,127 - Varadarajan , et al. July 27, 2 | 2021-07-27 |
Use of voltage and current measurements to control dual zone ceramic pedestals
Grant 11,028,482 - Durbin , et al. June 8, 2 | 2021-06-08 |
Electrostatic Chuck With Seal Surface
App 20210013080 - Breiling; Patrick G. ; et al. | 2021-01-14 |
Deposition apparatus including an isothermal processing zone
Grant 10,808,317 - Chandrasekharan , et al. October 20, 2 | 2020-10-20 |
Chemical deposition chamber having gas seal
Grant 10,781,516 - Chandrasekharan , et al. Sept | 2020-09-22 |
Use Of Voltage And Current Measurements To Control Dual Zone Ceramic Pedestals
App 20200255945 - DURBIN; Aaron ; et al. | 2020-08-13 |
Low volume showerhead with porous baffle
Grant 10,741,365 - Chandrasekharan , et al. A | 2020-08-11 |
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20200227304 - Breiling; Patrick ; et al. | 2020-07-16 |
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Pla
App 20200219757 - BREILING; Patrick ; et al. | 2020-07-09 |
Use of voltage and current measurements to control dual zone ceramic pedestals
Grant 10,633,742 - Durbin , et al. | 2020-04-28 |
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 10,622,243 - Breiling , et al. | 2020-04-14 |
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition
App 20200066607 - Varadarajan; Seshasayee ; et al. | 2020-02-27 |
Progressive Heating Of Components Of Substrate Processing Systems Using Tcr Element-based Heaters
App 20200051834 - CHANDRASEKHARAN; Ramesh ; et al. | 2020-02-13 |
Use Of Voltage And Current Measurements To Control Dual Zone Ceramic Pedestals
App 20190338422 - DURBIN; Aaron ; et al. | 2019-11-07 |
Substrate Processing Systems Including Gas Delivery System With Reduced Dead Legs
App 20190323125 - Chandrasekharan; Ramesh ; et al. | 2019-10-24 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substra
App 20190271081 - XIA; Chunguang ; et al. | 2019-09-05 |
Low volume showerhead with faceplate holes for improved flow uniformity
Grant 10,378,107 - Chandrasekharan , et al. A | 2019-08-13 |
Electrostatic Chucking Pedestal With Substrate Backside Purging And Thermal Sinking
App 20190237353 - THOMAS; Timothy S. ; et al. | 2019-08-01 |
Suppressing interfacial reactions by varying the wafer temperature throughout deposition
Grant 10,347,547 - Varadarajan , et al. July 9, 2 | 2019-07-09 |
Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
Grant 10,323,323 - Chandrasekharan , et al. | 2019-06-18 |
Asymmetric pedestal/carrier ring arrangement for edge impedance modulation
Grant 10,301,718 - Blaquiere , et al. | 2019-05-28 |
Multi Zone Pedestal For Ald Film Property Correction And Tunability
App 20190153600 - Roberts; Michael Philip ; et al. | 2019-05-23 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 10,287,683 - Xia , et al. | 2019-05-14 |
Purge And Pumping Structures Arranged Beneath Substrate Plane To Reduce Defects
App 20190122871 - CHANDRASEKHARAN; Ramesh ; et al. | 2019-04-25 |
Purge and pumping structures arranged beneath substrate plane to reduce defects
Grant 10,157,755 - Chandrasekharan , et al. Dec | 2018-12-18 |
Wafer Edge Contact Hardware and Methods to Eliminate Deposition at Wafer Backside Edge and Notch
App 20180334746 - Breiling; Patrick ; et al. | 2018-11-22 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 10,128,160 - Sakiyama , et al. November 13, 2 | 2018-11-13 |
Integrated direct dielectric and metal deposition
Grant 10,128,116 - Lee , et al. November 13, 2 | 2018-11-13 |
Method for depositing ALD films using halide-based precursors
Grant 10,020,188 - Sims , et al. July 10, 2 | 2018-07-10 |
Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability
Grant 9,997,422 - Karim , et al. June 12, 2 | 2018-06-12 |
Systems and methods for vapor delivery in a substrate processing system
Grant 9,970,108 - Qian , et al. May 15, 2 | 2018-05-15 |
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20180122685 - Breiling; Patrick ; et al. | 2018-05-03 |
Integrated Direct Dielectric And Metal Deposition
App 20180108529 - Lee; William T. ; et al. | 2018-04-19 |
Method For Depositing Ald Films Using Halide-based Precursors
App 20180102245 - Sims; James S. ; et al. | 2018-04-12 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20180076100 - Sakiyama; Yukinori ; et al. | 2018-03-15 |
Systems And Methods For Reducing Effluent Build-up In A Pumping Exhaust System
App 20180073137 - Xavier; Antonio ; et al. | 2018-03-15 |
Suppressing Interfacial Reactions By Varying The Wafer Temperature Throughout Deposition
App 20180047645 - Varadarajan; Seshasayee ; et al. | 2018-02-15 |
Variable temperature hardware and methods for reduction of wafer backside deposition
Grant 9,870,917 - Kang , et al. January 16, 2 | 2018-01-16 |
Method for depositing metals free ald silicon nitride films using halide-based precursors
Grant 9,824,884 - Sims , et al. November 21, 2 | 2017-11-21 |
Systems and methods for detection of plasma instability by electrical measurement
Grant 9,824,941 - Sakiyama , et al. November 21, 2 | 2017-11-21 |
Asymmetric Pedestal/carrier Ring Arrangement For Edge Impedance Modulation
App 20170275756 - Blaquiere; Ryan ; et al. | 2017-09-28 |
Plasma Suppression Behind A Showerhead Through The Use Of Increased Pressure
App 20170260627 - Breiling; Patrick Girard ; et al. | 2017-09-14 |
Plasma suppression behind a showerhead through the use of increased pressure
Grant 9,758,868 - Breiling , et al. September 12, 2 | 2017-09-12 |
Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edge
Grant 9,698,042 - Baldasseroni , et al. July 4, 2 | 2017-07-04 |
Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170175269 - Chandrasekharan; Ramesh ; et al. | 2017-06-22 |
Variable Temperature Hardware And Methods For Reduction Of Wafer Backside Deposition
App 20170178898 - Kang; Hu ; et al. | 2017-06-22 |
Multi-plenum, dual-temperature showerhead
Grant 9,677,176 - Chandrasekharan , et al. June 13, 2 | 2017-06-13 |
Systems and Methods for Frequency Modulation of Radiofrequency Power Supply for Controlling Plasma Instability
App 20170141002 - Karim; Ishtak ; et al. | 2017-05-18 |
Systems and Methods for Detection of Plasma Instability by Electrical Measurement
App 20170141000 - Sakiyama; Yukinori ; et al. | 2017-05-18 |
Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
Grant 9,631,276 - Chandrasekharan , et al. April 25, 2 | 2017-04-25 |
Chemical Deposition Chamber Having Gas Seal
App 20170101710 - Chandrasekharan; Ramesh ; et al. | 2017-04-13 |
Purge And Pumping Structures Arranged Beneath Substrate Plane To Reduce Defects
App 20170098556 - Chandrasekharan; Ramesh ; et al. | 2017-04-06 |
Multi-Station Chamber Having Symmetric Grounding Plate
App 20170053781 - Lavoie; Adrien ; et al. | 2017-02-23 |
Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170016115 - Chandrasekharan; Ramesh ; et al. | 2017-01-19 |
Chemical Deposition Apparatus Having Conductance Control
App 20170009348 - Chandrasekharan; Ramesh ; et al. | 2017-01-12 |
Low Volume Showerhead With Faceplate Holes For Improved Flow Uniformity
App 20160340782 - Chandrasekharan; Ramesh ; et al. | 2016-11-24 |
Chemical deposition apparatus having conductance control
Grant 9,490,149 - Chandrasekharan , et al. November 8, 2 | 2016-11-08 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20160289832 - Xia; Chunguang ; et al. | 2016-10-06 |
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
Grant 9,388,494 - Xia , et al. July 12, 2 | 2016-07-12 |
Multi-tray ballast vapor draw systems
Grant 9,334,566 - Chandrasekharan , et al. May 10, 2 | 2016-05-10 |
Methods And Apparatuses For Stable Deposition Rate Control In Low Temperature Ald Systems By Showerhead Active Heating And/or Pedestal Cooling
App 20160056032 - Baldasseroni; Chloe ; et al. | 2016-02-25 |
Fill On Demand Ampoule Refill
App 20160052655 - Nguyen; Tuan ; et al. | 2016-02-25 |
Systems And Methods For Vapor Delivery
App 20160032453 - Qian; Jun ; et al. | 2016-02-04 |
Sequential precursor dosing in an ALD multi-station/batch reactor
Grant 9,236,244 - Chandrasekharan , et al. January 12, 2 | 2016-01-12 |
Plasma activated conformal film deposition
Grant 9,230,800 - LaVoie , et al. January 5, 2 | 2016-01-05 |
Low Volume Showerhead With Porous Baffle
App 20150315706 - Chandrasekharan; Ramesh ; et al. | 2015-11-05 |
Multi-tray Ballast Vapor Draw Systems
App 20150145154 - Chandrasekharan; Ramesh ; et al. | 2015-05-28 |
Sequential Precursor Dosing In An Ald Multi-station/batch Reactor
App 20150099372 - Chandrasekharan; Ramesh ; et al. | 2015-04-09 |
Point of use valve manifold for semiconductor fabrication equipment
Grant 8,985,152 - Chandrasekharan , et al. March 24, 2 | 2015-03-24 |
Sequential precursor dosing in an ALD multi-station/batch reactor
Grant 8,940,646 - Chandrasekharan , et al. January 27, 2 | 2015-01-27 |
Sequential Precursor Dosing In An Ald Multi-station/batch Reactor
App 20150017812 - Chandrasekharan; Ramesh ; et al. | 2015-01-15 |
Multi-plenum, Dual-temperature Showerhead
App 20150007770 - Chandrasekharan; Ramesh ; et al. | 2015-01-08 |
Chemical Deposition Apparatus Having Conductance Control
App 20150011095 - Chandrasekharan; Ramesh ; et al. | 2015-01-08 |
Deposition Apparatus Including An Isothermal Processing Zone
App 20150011096 - Chandrasekharan; Ramesh ; et al. | 2015-01-08 |
Chemical Deposition Chamber Having Gas Seal
App 20150004798 - Chandrasekharan; Ramesh ; et al. | 2015-01-01 |
Plasma Activated Conformal Film Deposition
App 20140209562 - LaVoie; Adrien ; et al. | 2014-07-31 |
Plasma activated conformal film deposition
Grant 8,728,956 - LaVoie , et al. May 20, 2 | 2014-05-20 |
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region
App 20130344245 - XIA; CHUNGUANG ; et al. | 2013-12-26 |
Point Of Use Valve Manifold For Semiconductor Fabrication Equipment
App 20130333768 - Chandrasekharan; Ramesh ; et al. | 2013-12-19 |
Rf-powered, Temperature-controlled Gas Diffuser
App 20130316094 - Leeser; Karl F. ; et al. | 2013-11-28 |
Split Pumping Method, Apparatus, And System
App 20130237063 - VARADARAJAN; SESHASAYEE ; et al. | 2013-09-12 |
Gas And Liquid Injection Methods And Apparatus
App 20110256724 - Chandrasekharan; Ramesh ; et al. | 2011-10-20 |
Plasma Activated Conformal Film Deposition
App 20110256726 - LaVoie; Adrien ; et al. | 2011-10-20 |
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