Chamberlain; Jeffrey P.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Chamberlain; Jeffrey P..The latest application filed is for "silicon oxide polishing method utilizing colloidal silica".
- Chamberlain; Jeffrey P. - Aurora IL
| Patent | Date |
|---|---|
| Silicon oxide polishing method utilizing colloidal silica App 20080220610 - Bayer; Benjamin ; et al. | 2008-09-11 |
| Rate-enhanced CMP compositions for dielectric films App 20080020680 - Vacassy; Robert ; et al. | 2008-01-24 |
| Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Grant 7,306,637 - Cherian , et al. December 11, 2 | 2007-12-11 |
| CMP compositions for low-k dielectric materials Grant 6,974,777 - Moeggenborg , et al. December 13, 2 | 2005-12-13 |
| CMP method utilizing amphiphilic nonionic surfactants Grant 6,936,543 - Schroeder , et al. August 30, 2 | 2005-08-30 |
| System for the preferential removal of silicon oxide App 20050072524 - Mueller, Brian L. ; et al. | 2005-04-07 |
| Method for copper CMP using polymeric complexing agents Grant 6,821,897 - Schroeder , et al. November 23, 2 | 2004-11-23 |
| Anionic abrasive particles treated with positively charged polyelectrolytes for CMP App 20040229552 - Cherian, Isaac K. ; et al. | 2004-11-18 |
| Anionic abrasive particles treated with positively charged polyelectrolytes for CMP Grant 6,776,810 - Cherian , et al. August 17, 2 | 2004-08-17 |
| Preequilibrium polishing method and system Grant 6,726,534 - Bogush , et al. April 27, 2 | 2004-04-27 |
| CMP compositions for low-k dielectric materials App 20030228762 - Moeggenborg, Kevin J. ; et al. | 2003-12-11 |
| CMP method utilizing amphiphilic nonionic surfactants App 20030228763 - Schroeder, David J. ; et al. | 2003-12-11 |
| Alkali metal-containing polishing system and method Grant 6,612,911 - Carter , et al. September 2, 2 | 2003-09-02 |
| Method for copper CMP using polymeric complexing agents App 20030124959 - Schroeder, David J. ; et al. | 2003-07-03 |
| Alkali metal-containing polishing system and method App 20030082998 - Carter, Phillip ; et al. | 2003-05-01 |
| Integrated chemical-mechanical polishing App 20010037821 - Staley, Bradley J. ; et al. | 2001-11-08 |
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