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Patent applications and USPTO patent grants for Chalupka; Alfred.The latest application filed is for "particle-optical projection system".
Patent | Date |
---|---|
Particle-optical projection system Grant 7,388,217 - Buschbeck , et al. June 17, 2 | 2008-06-17 |
Particle-optical projection system App 20070125956 - Buschbeck; Herbert ;   et al. | 2007-06-07 |
Pattern-definition device for maskless particle-beam exposure apparatus Grant 7,084,411 - Lammer-Pachlinger , et al. August 1, 2 | 2006-08-01 |
Particle-optical projection system App 20050201246 - Buschbeck, Herbert ;   et al. | 2005-09-15 |
Pattern-definition device for maskless particle-beam exposure apparatus App 20050087701 - Lammer-Pachlinger, Wolfgang ;   et al. | 2005-04-28 |
Maskless particle-beam system for exposing a pattern on a substrate Grant 6,768,125 - Platzgummer , et al. July 27, 2 | 2004-07-27 |
Pattern lock system Grant 6,661,015 - Chalupka , et al. December 9, 2 | 2003-12-09 |
Maskless particle-beam system for exposing a pattern on a substrate App 20030155534 - Platzgummer, Elmar ;   et al. | 2003-08-21 |
Lithographic method for producing an exposure pattern on a substrate Grant 6,472,673 - Chalupka , et al. October 29, 2 | 2002-10-29 |
Thermal control of image pattern distortions App 20020148976 - Chalupka, Alfred ;   et al. | 2002-10-17 |
Pattern lock system App 20020033457 - Chalupka, Alfred ;   et al. | 2002-03-21 |
Particle-optical imaging system for lithography purposes Grant 6,326,632 - Buschbeck , et al. December 4, 2 | 2001-12-04 |
Lithographic imaging of a structure pattern onto one or more fields on a substrate App 20010036588 - Buschbeck, Herbert ;   et al. | 2001-11-01 |
Process for producing a structured mask Grant 5,876,880 - Vonach , et al. March 2, 1 | 1999-03-02 |
Ion-optical imaging system Grant 5,436,460 - Stengl , et al. July 25, 1 | 1995-07-25 |
Particle-beam imaging system Grant 5,378,917 - Chalupka , et al. January 3, 1 | 1995-01-03 |
Arrangement for stabilizing an irradiated mask Grant 4,916,322 - Glavish , et al. April 10, 1 | 1990-04-10 |
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