Chae; Min-Chul

Patent Applications and Registrations

Patent applications and USPTO patent grants for Chae; Min-Chul.The latest application filed is for "ion implantation mask forming method".

Company Profile

0.7.8

Chae; Min-Chul - Gyeonggi-do N/A KR
Chae; Min-Chul - Suwon-si KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods of forming dual damascene structures Grant 8,372,198 - Seo , et al. February 12, 2	2013-02-12
Ion implantation mask forming method Grant 8,241,512 - Lee , et al. August 14, 2	2012-08-14
Methods of fabricating semiconductor device including fin-fet Grant 7,745,290 - Seo , et al. June 29, 2	2010-06-29
Thin layer structure and method of forming the same Grant 7,534,704 - Ha , et al. May 19, 2	2009-05-19
Method of fabricating semiconductor device having contact hole with high aspect-ratio Grant 7,531,450 - Kang , et al. May 12, 2	2009-05-12
Ion implantation mask forming method App 20090117744 - Lee; Yong-Woo ; et al.	2009-05-07
Semiconductor Device And Method Of Forming The Same App 20090020816 - CHO; Woo-Jin ; et al.	2009-01-22
Dual Damascene Structure App 20080152866 - Seo; Jun ; et al.	2008-06-26
Methods of Forming Dual Damascene Structures App 20080149021 - Seo; Jun ; et al.	2008-06-26
Methods Of Fabricating Semiconductor Device Including Fin-fet App 20080124871 - SEO; Jun ; et al.	2008-05-29
Dual damascene structure and methods of forming the same Grant 7,358,126 - Seo , et al. April 15, 2	2008-04-15
Method Of Fabricating Semiconductor Device Having Contact Hole With High Aspect-ratio App 20070287287 - KANG; Yun-Seung ; et al.	2007-12-13
Thin layer structure and method of forming the same App 20060286298 - Ha; Jae-Kyu ; et al.	2006-12-21
Dual damascene structure and methods of forming the same App 20060163738 - Seo; Jun ; et al.	2006-07-27

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