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Patent applications and USPTO patent grants for Cha; Sang Hwan.The latest application filed is for "maskless exposure method".
Patent | Date |
---|---|
Method and apparatus to adjust misalignment of the maskless exposure apparatus Grant 8,363,209 - Shin , et al. January 29, 2 | 2013-01-29 |
Maskless exposure apparatus and method of manufacturing substrate for display using the same Grant 8,072,580 - Cha , et al. December 6, 2 | 2011-12-06 |
Exposing apparatus having substrate chuck of good flatness Grant 7,916,277 - Chung , et al. March 29, 2 | 2011-03-29 |
Maskless exposure method App 20100208229 - Shin; Young Hoon ;   et al. | 2010-08-19 |
Maskless Exposure Apparatus And Method Of Manufacturing Substrate For Display Using The Same App 20080084548 - Cha; Sang Hwan ;   et al. | 2008-04-10 |
Exposing apparatus having substrate chuck of good flatness App 20070008513 - Chung; Hee-Uk ;   et al. | 2007-01-11 |
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