Cha; Geun Young

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cha; Geun Young.The latest application filed is for "photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same".

Company Profile

0.12.9

Cha; Geun Young - Daejeon N/A KR
Cha; Geun-Young - Daejeon Metropolitan City KR
Cha; Geun Young - Seoul KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photosensitive resin composition and photosensitive material comprising the same Grant 9,733,563 - Ji , et al. August 15, 2	2017-08-15
Photosensitive resin composition and touch panel or display device including bezel pattern prepared by using same Grant 9,470,975 - Choi , et al. October 18, 2	2016-10-18
Photosensitive Resin Composition And Touch Panel Or Display Device Including Bezel Pattern Prepared By Using Same App 20150111009 - Choi; Dongchang ; et al.	2015-04-23
Colored dispersion, photoresist composition and black matrix Grant 8,822,132 - Choi , et al. September 2, 2	2014-09-02
Photosensitive resin composition for black matrix Grant 8,822,127 - Choi , et al. September 2, 2	2014-09-02
Method for manufacturing color filter and color filter manufactured by using the same Grant 8,597,861 - Kim , et al. December 3, 2	2013-12-03
Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same Grant 8,535,874 - Kim , et al. September 17, 2	2013-09-17
Photosensitive Resin Composition And Photosensitive Material Comprising The Same App 20120189961 - JI; Ho Chan ; et al.	2012-07-26
Black Matrix Composition With High Light-shielding And Improved Adhesion Properties App 20110151379 - Choi; Dong Chang ; et al.	2011-06-23
Photosensitive Resin Composition For Black Matrix App 20110101268 - Choi; Dong Chang ; et al.	2011-05-05
Fluorene-based Polymer Containing Urethane Groups, Preparation Method Thereof And Negative-type Photosensitive Resin Composition Comprising The Same App 20100201925 - Kim; Han Soo ; et al.	2010-08-12
Colored Dispersion, Photoresist Composition And Black Matrix App 20100104981 - Choi; Dong Chang ; et al.	2010-04-29
Photo-sensitive Resin Composition For Black Matrix, Black Matrix Produced By The Composition And Liquid Crystal Display Including The Black Matrix App 20100085518 - Choi; Kyung-Soo ; et al.	2010-04-08
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester Grant 7,556,910 - Kim , et al. July 7, 2	2009-07-07
Photosensitive composition comprising triazine-based photoactive compound containing oxime ester App 20070128548 - Kim; Sung Hyun ; et al.	2007-06-07
Patterning method using coatings containing ionic components App 20070048448 - Kim; Dae Hyun ; et al.	2007-03-01

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