loadpatents
name:-0.022188901901245
name:-0.022176027297974
name:-0.0018599033355713
Cebuhar; Wenceslao A. Patent Filings

Cebuhar; Wenceslao A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Cebuhar; Wenceslao A..The latest application filed is for "systems and methods for minimizing scattered light in multi-slm maskless lithography".

Company Profile
0.18.19
  • Cebuhar; Wenceslao A. - Norwalk CT
  • Cebuhar; Wenceslao A. - Wilton CT
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
Grant 8,259,285 - Troost , et al. September 4, 2
2012-09-04
Altering pattern data based on measured optical element characteristics
Grant 7,936,445 - Hintersteiner , et al. May 3, 2
2011-05-03
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
Grant 7,859,735 - Cebuhar , et al. December 28, 2
2010-12-28
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,773,199 - Bleeker , et al. August 10, 2
2010-08-10
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
Grant 7,688,423 - Bleeker , et al. March 30, 2
2010-03-30
Systems and Methods for Minimizing Scattered Light in Multi-SLM Maskless Lithography
App 20100002221 - CEBUHAR; Wenceslao A. ;   et al.
2010-01-07
Methods and systems to compensate for a stitching disturbance of a printed pattern
Grant 7,630,054 - Bleeker , et al. December 8, 2
2009-12-08
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
Grant 7,567,368 - Cebuhar , et al. July 28, 2
2009-07-28
System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
Grant 7,542,013 - Latypov , et al. June 2, 2
2009-06-02
Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography
Grant 7,463,402 - Cebuhar , et al. December 9, 2
2008-12-09
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
Grant 7,410,736 - Bleeker , et al. August 12, 2
2008-08-12
Maskless lithography systems and methods utilizing spatial light modulator arrays
Grant 7,403,266 - Bleeker , et al. July 22, 2
2008-07-22
Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data
App 20080143982 - Troost; Kars Zeger ;   et al.
2008-06-19
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094596 - Bleeker; Arno ;   et al.
2008-04-24
Methods and systems to compensate for a stitching disturbance of a printed pattern
App 20080094595 - Bleeker; Arno ;   et al.
2008-04-24
Altering pattern data based on measured optical element characteristics
App 20070291240 - Hintersteiner; Jason D. ;   et al.
2007-12-20
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20070146672 - Bleeker; Arno ;   et al.
2007-06-28
Efficiently illuminating a modulating device
Grant 7,158,307 - Coston , et al. January 2, 2
2007-01-02
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
Grant 7,133,121 - Bleeker , et al. November 7, 2
2006-11-07
System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode
App 20060170617 - Latypov; Azat M. ;   et al.
2006-08-03
Systems and methods for minimizing scattered light in multi-SLM maskless lithography
App 20060146308 - Cebuhar; Wenceslao A. ;   et al.
2006-07-06
Maskless lithography systems and methods utilizing spatial light modulator arrays
Grant 7,061,591 - Bleeker , et al. June 13, 2
2006-06-13
Efficiently illuminating a modulating device
App 20060119947 - Coston; Scott ;   et al.
2006-06-08
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
App 20060114546 - Cebuhar; Wenceslao A. ;   et al.
2006-06-01
Maskless lithography systems and methods utilizing spatial light modulator arrays
App 20060114438 - Bleeker; Arno ;   et al.
2006-06-01
Illumination system and method for efficiently illuminating a pattern generator
Grant 7,006,295 - Coston , et al. February 28, 2
2006-02-28
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
Grant 6,985,280 - Cebuhar , et al. January 10, 2
2006-01-10
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
App 20050170267 - Bleeker, Arno ;   et al.
2005-08-04
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
App 20050094245 - Cebuhar, Wenceslao A. ;   et al.
2005-05-05
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
Grant 6,876,440 - Bleeker , et al. April 5, 2
2005-04-05
Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones
App 20050068467 - Bleeker, Arno ;   et al.
2005-03-31
Methods And Systems To Compensate For A Stitching Disturbance Of A Printed Pattern In A Maskless Lithography System Utilizing Overlap Of Exposure Zones With Attenuation Of The Aerial Image In The Overlap Region
App 20050068514 - Bleeker, Arno ;   et al.
2005-03-31
Maskless lithography systems and methods utilizing spatial light modulator arrays
App 20050046819 - Bleeker, Arno ;   et al.
2005-03-03
Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
Grant 6,831,768 - Cebuhar , et al. December 14, 2
2004-12-14
System and method for producing gray scaling using multiple spatial light modulators in a maskless lithography system
App 20040239901 - Wasserman, Solomon ;   et al.
2004-12-02
Maskless lithography systems and methods utilizing spatial light modulator arrays
App 20040239908 - Bleeker, Arno ;   et al.
2004-12-02
Illumination system and method for efficiently illuminating a pattern generator
App 20040179270 - Coston, Scott ;   et al.
2004-09-16

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