loadpatents
name:-0.045549869537354
name:-0.69313907623291
name:-0.017114162445068
Carter; Phillip W. Patent Filings

Carter; Phillip W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Carter; Phillip W..The latest application filed is for "systems, devices, and methods for analyte sensor insertion".

Company Profile
2.24.31
  • Carter; Phillip W. - Oakland CA
  • Carter; Phillip W. - Round Lake IL
  • Carter; Phillip W. - Naperville IL
  • Carter; Phillip W. - Aurora IL
  • Carter; Phillip W - Naperville IL
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Systems, Devices, And Methods For Analyte Sensor Insertion
App 20220167919 - Rao; Vivek S. ;   et al.
2022-06-02
Systems, Devices, And Methods For Analyte Sensor Applicators
App 20220125480 - Rao; Vivek S. ;   et al.
2022-04-28
Systems, Devices, And Methods For Analyte Sensor Insertion
App 20200196919 - Rao; Vivek S. ;   et al.
2020-06-25
Corrosion inhibitors and related compositions and methods
Grant 10,124,464 - Cavanaugh , et al. November 13, 2
2018-11-13
Alternative Oxidizing Agents For Cobalt Cmp
App 20180016469 - KRAFT; Steven ;   et al.
2018-01-18
Cobalt polishing accelerators
Grant 9,850,403 - Kraft , et al. December 26, 2
2017-12-26
Cobalt dishing control agents
Grant 9,834,704 - Kraft , et al. December 5, 2
2017-12-05
Cobalt Polishing Accelerators
App 20170260421 - KRAFT; Steven ;   et al.
2017-09-14
Method Of Polishing A Low-k Substrate
App 20170194160 - PALLIKKARA KUTTIATOOR; Sudeep ;   et al.
2017-07-06
Cobalt polishing accelerators
Grant 9,688,885 - Kraft , et al. June 27, 2
2017-06-27
Cobalt inhibitor combination for improved dishing
Grant 9,528,030 - Kraft , et al. December 27, 2
2016-12-27
Cobalt Polishing Accelerators
App 20160115353 - Kraft; Steven ;   et al.
2016-04-28
Cobalt Dishing Control Agents
App 20160108285 - Kraft; Steven ;   et al.
2016-04-21
Corrosion Inhibitors And Related Compositions And Methods
App 20160107289 - Cavanaugh; Mary ;   et al.
2016-04-21
Metal cations for initiating polishing
Grant 8,637,404 - Carter , et al. January 28, 2
2014-01-28
Iodate-containing chemical-mechanical polishing compositions and methods
Grant 8,551,202 - Li , et al. October 8, 2
2013-10-08
Oxidation-stabilized CMP compositions and methods
Grant 8,497,209 - Grumbine , et al. July 30, 2
2013-07-30
Method of polishing a silicon-containing dielectric
Grant 8,486,169 - Carter , et al. July 16, 2
2013-07-16
Methods for processing substrates having an antimicrobial coating
Grant 8,178,120 - Vandesteeg , et al. May 15, 2
2012-05-15
Metal ion-containing CMP composition and method for using the same
Grant 8,038,752 - Carter October 18, 2
2011-10-18
Metal Cations For Initiating Polishing
App 20110065364 - CARTER; Phillip W. ;   et al.
2011-03-17
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
Grant 7,846,842 - Carter , et al. December 7, 2
2010-12-07
Methods For Processing Substrates Having An Antimicrobial Coating
App 20100227052 - Carter; Phillip W. ;   et al.
2010-09-09
Oxidation-stabilized Cmp Compositions And Methods
App 20100200802 - GRUMBINE; Steven K. ;   et al.
2010-08-12
Oxidation-stabilized CMP compositions and methods
Grant 7,732,393 - Grumbine , et al. June 8, 2
2010-06-08
Methods For Processing Substrates Having An Antimicrobial Coating
App 20090317435 - VANDESTEEG; Nathan A. ;   et al.
2009-12-24
CMP method for improved oxide removal rate
App 20090191710 - CARTER; Phillip W. ;   et al.
2009-07-30
Polishing Composition And Method For High Silicon Nitride To Silicon Oxide Removal Rate Ratios
App 20090137124 - Carter; Phillip W. ;   et al.
2009-05-28
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
Grant 7,504,044 - Carter , et al. March 17, 2
2009-03-17
Tribo-chronoamperometry as a tool for CMP application
Grant 7,497,938 - Zhang , et al. March 3, 2
2009-03-03
Method Of Polishing A Silicon-containing Dielectric
App 20090029633 - Carter; Phillip W. ;   et al.
2009-01-29
Method of polishing a silicon-containing dielectric
Grant 7,442,645 - Carter , et al. October 28, 2
2008-10-28
Compositions and methods for tantalum CMP
Grant 7,316,603 - Carter , et al. January 8, 2
2008-01-08
CMP method for copper-containing substrates
App 20070249167 - Zhang; Jian ;   et al.
2007-10-25
Iodate-containing chemical-mechanical polishing compositions and methods
App 20070224919 - Li; Shoutian ;   et al.
2007-09-27
Oxidation-stabilized CMP compositions and methods
App 20070219104 - Grumbine; Steven K. ;   et al.
2007-09-20
Composition and method to polish silicon nitride
App 20070209287 - Chen; Zhan ;   et al.
2007-09-13
Friction reducing aid for CMP
App 20070117497 - Moeggenborg; Kevin J. ;   et al.
2007-05-24
Metal cations for initiating polishing
App 20070068087 - Carter; Phillip W. ;   et al.
2007-03-29
Tribo-chronoamperometry as a tool for CMP application
App 20060213781 - Zhang; Jian ;   et al.
2006-09-28
Readily deinkable toners
App 20060196848 - Carter; Phillip W. ;   et al.
2006-09-07
Method of polishing a silicon-containing dielectric
App 20060144824 - Carter; Phillip W. ;   et al.
2006-07-06
Method of polishing a silicon-containing dielectric
Grant 7,071,105 - Carter , et al. July 4, 2
2006-07-04
Polishing composition and method for high silicon nitride to silicon oxide removal rate ratios
App 20060099814 - Carter; Phillip W. ;   et al.
2006-05-11
Metal ion-containing CMP composition and method for using the same
App 20060086055 - Carter; Phillip W.
2006-04-27
Compositions and methods for tantalum CMP
App 20060030158 - Carter; Phillip W. ;   et al.
2006-02-09
CMP composition for improved oxide removal rate
App 20050279733 - Carter, Phillip W. ;   et al.
2005-12-22
Method of polishing a silicon-containing dielectric
App 20040152309 - Carter, Phillip W. ;   et al.
2004-08-05
High molecular weight zwitterionic polymers
Grant 6,590,051 - Carter , et al. July 8, 2
2003-07-08
Structurally rigid nonionic and anionic polymers as retention and drainage aids in papermaking
Grant 6,444,091 - Ward , et al. September 3, 2
2002-09-03
Method Of Inhibiting Scale Formation Using Water-soluble Polymers Having Pendant Derivatized Amide Functionalities
App 20020065358 - CARTER, PHILLIP W. ;   et al.
2002-05-30

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.

© 2024 USPTO.report | Privacy Policy | Resources | RSS Feed of Trademarks | Trademark Filings Twitter Feed