| Patent | Date |
|---|
Method and apparatus for compensating defects of a mask blank
Grant 11,385,539 - Welte July 12, 2 | 2022-07-12 |
Method and apparatus for performing an aerial image simulation of a photolithographic mask
Grant 11,366,382 - Dmitriev , et al. June 21, 2 | 2022-06-21 |
Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
Grant 11,366,383 - Dmitriev , et al. June 21, 2 | 2022-06-21 |
Optical system and method for correcting mask defects using the system
Grant 11,249,294 - Seesselberg , et al. February 15, 2 | 2022-02-15 |
Method And Apparatus For Performing An Aerial Image Simulation Of A Photolithographic Mask
App 20210263406 - Dmitriev; Vladimir ; et al. | 2021-08-26 |
Method And Apparatus For Determining An Effect Of One Or More Pixels To Be Introduced Into A Substrate Of A Photolithographic Mask
App 20210124259 - Welte; Joachim ; et al. | 2021-04-29 |
Method And Apparatus For Compensating Defects Of A Mask Blank
App 20200159111 - Welte; Joachim | 2020-05-21 |
Method And Apparatus For Determining Positions Of A Plurality Of Pixels To Be Introduced In A Substrate Of A Photolithographic M
App 20200124959 - Dmitriev; Vladimir ; et al. | 2020-04-23 |
Method for correcting the critical dimension uniformity of a photomask for semiconductor lithography
Grant 10,578,975 - Thaler , et al. | 2020-03-03 |
Method and apparatus for generating a predetermined three-dimensional contour of an optical component and/or a wafer
Grant 10,353,295 - Dmitriev , et al. July 16, 2 | 2019-07-16 |
Optical System And Method For Correcting Mask Defects Using The System
App 20190170991 - Seesselberg; Markus ; et al. | 2019-06-06 |
Method for Correcting the Critical Dimension Uniformity of a Photomask for Semiconductor Lithography
App 20190107783 - Thaler; Thomas ; et al. | 2019-04-11 |
Method and apparatus for determining a critical dimension variation of a photolithographic mask
Grant 10,157,804 - Pforr Dec | 2018-12-18 |
Apparatus and method for imparting direction-selective light attenuation
Grant 10,114,294 - Dmitriev October 30, 2 | 2018-10-30 |
Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
Grant 10,061,192 - Beyer , et al. August 28, 2 | 2018-08-28 |
Method and apparatus for compensating at least one defect of an optical system
Grant 9,798,249 - Dmitriev , et al. October 24, 2 | 2017-10-24 |
Method and apparatus for the determination of laser correcting tool parameters
Grant 9,753,366 - Dmitriev September 5, 2 | 2017-09-05 |
Surface defect repair by irradiation
Grant 9,690,191 - Oshemkov , et al. June 27, 2 | 2017-06-27 |
Apparatus And Method For Imparting Direction-selective Light Attenuation
App 20170176866 - Dmitriev; Vladimir | 2017-06-22 |
Correction of errors of a photolithographic mask using a joint optimization process
Grant 9,658,527 - Dmitriev May 23, 2 | 2017-05-23 |
Method and apparatus for locally deforming an optical element for photolithography
Grant 9,606,444 - Dmitriev , et al. March 28, 2 | 2017-03-28 |
Method And Apparatus For Generating A Predetermined Three-dimensional Contour Of An Optical Component And/or A Wafer
App 20170010540 - Dmitriev; Vladimir ; et al. | 2017-01-12 |
Method And Apparatus For Correcting Errors On A Wafer Processed By A Photolithographic Mask
App 20160342080 - Beyer; Dirk ; et al. | 2016-11-24 |
Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
Grant 9,436,080 - Beyer , et al. September 6, 2 | 2016-09-06 |
Surface Defect Repair By Irradiation
App 20160004151 - Oshemkov; Sergey | 2016-01-07 |
Analyses of measurement data
Grant 9,207,530 - Dmitriev , et al. December 8, 2 | 2015-12-08 |
Critical dimension uniformity correction by scanner signature control
Grant 9,134,112 - Sharoni , et al. September 15, 2 | 2015-09-15 |
Controllable transmission and phase compensation of transparent material
Grant 9,034,539 - Oshemkov , et al. May 19, 2 | 2015-05-19 |
Method And Apparatus For Compensating At Least One Defect Of An Optical System
App 20140347646 - Dmitriev; Vladimir ; et al. | 2014-11-27 |
Lithographic targets for uniformity control
Grant 8,871,409 - Pforr , et al. October 28, 2 | 2014-10-28 |
Global landmark method for critical dimension uniformity reconstruction
Grant 8,869,076 - Dmitriev , et al. October 21, 2 | 2014-10-21 |
Method and apparatus for modifying a substrate surface of a photolithographic mask
Grant 8,735,030 - Oshemkov , et al. May 27, 2 | 2014-05-27 |
Method And Apparatus For Correcting Errors On A Wafer Processed By A Photolithographic Mask
App 20140036243 - Beyer; Dirk ; et al. | 2014-02-06 |
Method and apparatus for DUV transmission mapping
Grant 8,592,770 - Ben-Zvi , et al. November 26, 2 | 2013-11-26 |
Global Landmark Method For Critical Dimension Uniformity Reconstruction
App 20130263061 - Dmitriev; Vladimir ; et al. | 2013-10-03 |
Method and apparatus for minimizing overlay errors in lithography
Grant 8,539,394 - Pforr September 17, 2 | 2013-09-17 |
Method and apparatus for mapping of line-width size distributions on photomasks
Grant 8,421,026 - Ben-Zvi , et al. April 16, 2 | 2013-04-16 |
Apparatus and method for inducing controllable jets in liquids
Grant 8,101,921 - Oshemkov , et al. January 24, 2 | 2012-01-24 |
Method And Apparatus For Correcting Errors Of A Photolithographic Mask
App 20120009511 - Dmitriev; Vladimir | 2012-01-12 |
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