Callan; Neal P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Callan; Neal P..The latest application filed is for "maskless vortex phase shift optical direct write lithography".

Company Profile

0.7.8

Callan; Neal P. - Lake Oswego OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Maskless vortex phase shift optical direct write lithography Grant 9,188,848 - Eib , et al. November 17, 2	2015-11-17
Maskless Vortex Phase Shift Optical Direct Write Lithography App 20130107240 - Eib; Nicholas K. ; et al.	2013-05-02
Maskless vortex phase shift optical direct write lithography Grant 8,377,633 - Eib , et al. February 19, 2	2013-02-19
Maskless Vortex Phase Shift Optical Direct Write Lithography App 20120038896 - Eib; Nicholas K. ; et al.	2012-02-16
Maskless vortex phase shift optical direct write lithography Grant 8,057,963 - Eib , et al. November 15, 2	2011-11-15
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography Grant 7,372,547 - Eib , et al. May 13, 2	2008-05-13
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process Grant 7,189,498 - Eib , et al. March 13, 2	2007-03-13
Chromeless phase shift mask Grant 7,005,217 - Bailey , et al. February 28, 2	2006-02-28
Maskless vortex phase shift optical direct write lithography App 20050275814 - Eib, Nicholas K. ; et al.	2005-12-15
Process and apparatus for achieving single exposure pattern transfer using maskless optical direct write lithography App 20050237508 - Eib, Nicholas K. ; et al.	2005-10-27
Process and apparatus for applying apodization to maskless optical direct write lithography processes App 20050151949 - Eib, Nicholas K. ; et al.	2005-07-14
Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process App 20050153246 - Eib, Nicholas K. ; et al.	2005-07-14
Chromeless phase shift mask App 20040197674 - Bailey, George E. ; et al.	2004-10-07

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