Calado; Victor Emanuel

Patent Applications and Registrations

Patent applications and USPTO patent grants for Calado; Victor Emanuel.The latest application filed is for "metrology using a plurality of metrology target measurement recipes".

Company Profile

9.7.8

Calado; Victor Emanuel - Veldhoven NL
Calado; Victor Emanuel - Rotterdam NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Determining an optimal operational parameter setting of a metrology system Grant 11,320,750 - Van Dijk , et al. May 3, 2	2022-05-03
Method to change an etch parameter Grant 11,300,887 - Van Haren , et al. April 12, 2	2022-04-12
Metrology using a plurality of metrology target measurement recipes Grant 11,187,995 - Calado , et al. November 30, 2	2021-11-30
Metrology Using A Plurality Of Metrology Target Measurement Recipes App 20210208512 - CALADO; Victor Emanuel ; et al.	2021-07-08
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20210018852 - VAN DIJK; Leon Paul ; et al.	2021-01-21
Determining an optimal operational parameter setting of a metrology system Grant 10,788,761 - Van Dijk , et al. September 29, 2	2020-09-29
A Device Manufacturing Method And A Computer Program Product App 20200159128 - CALADO; Victor Emanuel ; et al.	2020-05-21
Lithographic apparatus and device manufacturing method Grant 10,474,045 - Bijnen , et al. Nov	2019-11-12
Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method Grant 10,474,043 - Warnaar , et al. Nov	2019-11-12
Method Of Determining Pellicle Compensation Corrections For A Lithographic Process, Metrology Apparatus And Computer Program App 20190294059 - VAN DIJK; Leon Paul ; et al.	2019-09-26
A Method To Change An Etch Parameter App 20190285992 - VAN HAREN; Richard Johannes Franciscus ; et al.	2019-09-19
Determining An Optimal Operational Parameter Setting Of A Metrology System App 20190250523 - VAN DIJK; Leon Paul ; et al.	2019-08-15
Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method Grant 10,162,272 - Jak , et al. Dec	2018-12-25
Method of Measuring a Property of a Substrate, Inspection Apparatus, Lithographic System and Device Manufacturing Method App 20180173105 - Warnaar; Patrick ; et al.	2018-06-21
Metrology Method And Apparatus, Substrates For Use In Such Methods, Lithographic System And Device Manufacturing Method App 20170052454 - JAK; Martin Jacobus Johan ; et al.	2017-02-23

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