C. Itoh Fine Chemical Co., Ltd.
Patent Applications and Registrations
Patent applications and USPTO patent grants for C. Itoh Fine Chemical Co., Ltd..The latest application filed is for "method for the surface treatment of a metal by atmospheric pressure plasma".
- C. Itoh Fine Chemical Co., Ltd. - Tokyo JP
- C. Itoh Fine Chemical Co., Ltd. - Chiyoda JP
| Patent | Date |
|---|---|
| Method for the surface treatment of a metal by atmospheric pressure plasma Grant 5,384,167 - Nishiwaki , et al. January 24, 1 | 1995-01-24 |
| Method for reforming surface Grant 5,346,728 - Yoshida September 13, 1 | 1994-09-13 |
| Thin film capacitor and apparatus for manufacturing same Grant 5,258,886 - Murayama , et al. November 2, 1 | 1993-11-02 |
| Atmospheric pressure plasma surface treatment process Grant 5,124,173 - Uchiyama , et al. June 23, 1 | 1992-06-23 |
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