Patent | Date |
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Separating apparatus for polysilicon Grant 11,154,908 - Buschhardt , et al. October 26, 2 | 2021-10-26 |
Screen plate for screening plants for mechanical classification of polysilicon Grant 11,059,072 - Bergmann , et al. July 13, 2 | 2021-07-13 |
Separating Apparatus For Polysilicon App 20200086348 - BUSCHHARDT; Thomas ;   et al. | 2020-03-19 |
Screen Plate For Screening Plants For Mechanical Classification Of Polysilicon App 20180185882 - BERGMANN; Andreas ;   et al. | 2018-07-05 |
Process for cleaning, drying and hydrophilizing a semiconductor wafer Grant 9,230,794 - Schwab , et al. January 5, 2 | 2016-01-05 |
Method for the double-side polishing of a semiconductor wafer Grant 8,721,390 - Schwandner , et al. May 13, 2 | 2014-05-13 |
Method for producing a semiconductor wafer Grant 8,685,270 - Schwandner , et al. April 1, 2 | 2014-04-01 |
Method for polishing a semiconductor wafer Grant 8,647,173 - Schwandner , et al. February 11, 2 | 2014-02-11 |
Method for polishing a substrate composed of semiconductor material Grant 8,647,985 - Schwandner , et al. February 11, 2 | 2014-02-11 |
Method for the treatment of a semiconductor wafer Grant 8,580,046 - Schwab , et al. November 12, 2 | 2013-11-12 |
Method For Polishing A Semiconductor Wafer App 20130189904 - Schwandner; Juergen ;   et al. | 2013-07-25 |
Method For The Treatment Of A Semiconductor Wafer App 20130068262 - Schwab; Guenter ;   et al. | 2013-03-21 |
Method for the treatment of a semiconductor wafer Grant 8,372,213 - Schwab , et al. February 12, 2 | 2013-02-12 |
Process Module for the Inline-Treatment of Substrates App 20120248068 - Schienle; Frank ;   et al. | 2012-10-04 |
Method for producing a wafer comprising a silicon single crystal substrate having a front and a back side and a layer of SiGe deposited on the front side Grant 8,093,143 - Storck , et al. January 10, 2 | 2012-01-10 |
Method for the wet-chemical treatment of a semiconductor wafer Grant 8,070,882 - Schwab , et al. December 6, 2 | 2011-12-06 |
Method For The Double-side Polishing Of A Semiconductor Wafer App 20110244762 - Schwandner; Juergen ;   et al. | 2011-10-06 |
Process for cleaning a semiconductor wafer using a cleaning solution Grant 7,938,911 - Zapilko , et al. May 10, 2 | 2011-05-10 |
Method For Polishing A Semiconductor Wafer App 20110097974 - SCHWANDNER; Juergen ;   et al. | 2011-04-28 |
Method For Producing A Semiconductor Wafer App 20110097975 - SCHWANDNER; Juergen ;   et al. | 2011-04-28 |
Method For Producing A Wafer Comprising A Silicon Single Crystal Substrate Having A Front And A Back Side And A Layer of SiGe Deposited On The Front Side App 20100291761 - Storck; Peter ;   et al. | 2010-11-18 |
Method For The Treatment Of A Semiconductor Wafer App 20100139706 - Schwab; Guenter ;   et al. | 2010-06-10 |
Method For The Wet-Chemical Treatment Of A Semiconductor Wafer App 20090145457 - Schwab; Guenter ;   et al. | 2009-06-11 |
Method for machining a semiconductor wafer on both sides in a carrier, carrier, and a semiconductor wafer produced by the method Grant 7,541,287 - Schmolke , et al. June 2, 2 | 2009-06-02 |
Method for producing a layer structure Grant 7,538,008 - Feijoo , et al. May 26, 2 | 2009-05-26 |
Process For Cleaning A Semiconductor Wafer App 20090071507 - Buschhardt; Thomas ;   et al. | 2009-03-19 |
Method For Polishing A Substrate Composed Of Semiconductor Material App 20090029552 - Schwandner; Juergen ;   et al. | 2009-01-29 |
Process For Cleaning A Semiconductor Wafer Using A Cleaning Solution App 20090007940 - Zapilko; Clemens ;   et al. | 2009-01-08 |
Process For Cleaning, Drying and Hydrophilizing A Semiconductor Wafer App 20080308122 - Schwab; Guenter ;   et al. | 2008-12-18 |
Methods for the single-sided polishing of semiconductor wafers and semiconductor wafer having a relaxed Si1-x GEx Layer App 20080265375 - Pietsch; Georg ;   et al. | 2008-10-30 |
Method For Producing A Layer Structure App 20070259530 - Feijoo; Diego ;   et al. | 2007-11-08 |
Method for machining a semiconductor wafer on both sides in a carrier, carrier, and a semiconductor wafer produced by the method App 20070021042 - Schmolke; Ruediger ;   et al. | 2007-01-25 |
Process For Treating A Polished Semiconductor Water Immediately After The Semiconductor Wafer Has Been Polished App 20020187639 - HENNHOFER, HEINRICH ;   et al. | 2002-12-12 |
Process for the surface polishing of silicon wafers App 20020077039 - Wenski, Guido ;   et al. | 2002-06-20 |
Process and device for polishing semiconductor wafers Grant 6,095,898 - Hennhofer , et al. August 1, 2 | 2000-08-01 |