Burns; Sean David

Patent Applications and Registrations

Patent applications and USPTO patent grants for Burns; Sean David.The latest application filed is for "chemical trim of photoresist lines by means of a tuned overcoat".

Company Profile

0.4.4

Burns; Sean David - Hopewell Junction NY
Burns; Sean David - Armonk NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photolithography focus improvement by reduction of autofocus radiation transmission into substrate Grant 8,227,180 - Brunner , et al. July 24, 2	2012-07-24
Chemical trim of photoresist lines by means of a tuned overcoat Grant 8,137,893 - Burns , et al. March 20, 2	2012-03-20
Chemical Trim of Photoresist Lines by Means of A Tuned Overcoat App 20110129652 - Burns; Sean David ; et al.	2011-06-02
Chemical trim of photoresist lines by means of a tuned overcoat material Grant 7,862,982 - Burns , et al. January 4, 2	2011-01-04
Chemical Trim Of Photoresist Lines By Means Of A Tuned Overcoat Material App 20090311490 - Burns; Sean David ; et al.	2009-12-17
Topcoat material and use thereof in immersion lithography processes Grant 7,521,172 - David , et al. April 21, 2	2009-04-21
Method Of Forming A Dual-damascene Structure Using An Underlayer App 20090093114 - Burns; Sean David ; et al.	2009-04-09
Topcoat Material And Use Thereof In Immersion Lithography Processes App 20070254237 - ALLEN; ROBERT DAVID ; et al.	2007-11-01

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