| Patent | Date |
|---|
Electrostatic Carrier For Die Bonding Applications
App 20180374736 - KUMAR; Niranjan ; et al. | 2018-12-27 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,980,044 - Brillhart , et al. March 17, 2 | 2015-03-17 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,801,893 - Brillhart , et al. August 12, 2 | 2014-08-12 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2 | 2013-12-17 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
Grant 8,546,267 - Brillhart , et al. October 1, 2 | 2013-10-01 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems
App 20130017315 - LAI; CANFENG ; et al. | 2013-01-17 |
Methods And Apparatus For Controlling Power Distribution In Substrate Processing Systems
App 20130014894 - LAI; CANFENG ; et al. | 2013-01-17 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2 | 2012-12-25 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
Grant 8,329,586 - Buchberger, Jr. , et al. December 11, 2 | 2012-12-11 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2 | 2012-07-17 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2 | 2012-04-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2 | 2012-01-10 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
Grant 8,092,638 - Brillhart , et al. January 10, 2 | 2012-01-10 |
Methods to avoid unstable plasma states during a process transition
Grant 8,048,806 - Kutney , et al. November 1, 2 | 2011-11-01 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,034,180 - Brillhart , et al. October 11, 2 | 2011-10-11 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2 | 2011-09-20 |
Balanced purge slit valve
Grant 8,011,381 - Newman , et al. September 6, 2 | 2011-09-06 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,012,304 - Brillhart , et al. September 6, 2 | 2011-09-06 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
Grant 7,988,872 - Brillhart , et al. August 2, 2 | 2011-08-02 |
Method Of Processing A Workpiece In A Plasma Reactor Using Multiple Zone Feed Forward Thermal Control
App 20110068085 - Brillhart; Paul Lukas ; et al. | 2011-03-24 |
Method Of Processing A Workpiece In A Plasma Reactor Using Feed Forward Thermal Control
App 20110065279 - Buchberger, JR.; Douglas A. ; et al. | 2011-03-17 |
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes
App 20100319851 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-23 |
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution
App 20100319852 - Brillhart; Paul Lukas ; et al. | 2010-12-23 |
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus
App 20100314046 - Brillhart; Paul Lukas ; et al. | 2010-12-16 |
Method Of Cooling A Wafer Support At A Uniform Temperature In A Capacitively Coupled Plasma Reactor
App 20100300621 - Brillhart; Paul Lukas ; et al. | 2010-12-02 |
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control
App 20100303680 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-02 |
Balanced Purge Slit Valve
App 20100084398 - NEWMAN; JACOB ; et al. | 2010-04-08 |
Method of controlling plasma distribution uniformity by superposition of different constant solenoid fields
App 20090250335 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields
App 20090250432 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Method of feedback control of ESC voltage using wafer voltage measurement at the bias supply output
Grant 7,375,947 - Yang , et al. May 20, 2 | 2008-05-20 |
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
Grant 7,374,636 - Horioka , et al. May 20, 2 | 2008-05-20 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
Grant 7,359,177 - Yang , et al. April 15, 2 | 2008-04-15 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber
Grant 7,316,199 - Horioka , et al. January 8, 2 | 2008-01-08 |
Method Of Feedback Control Of Esc Voltage Using Wafer Voltage Measurement At The Bias Supply Output
App 20070127188 - Yang; Jang Gyoo ; et al. | 2007-06-07 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
App 20070097580 - Brillhart; Paul Lukas ; et al. | 2007-05-03 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
App 20070089834 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
App 20070091537 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
App 20070091540 - Brillhart; Paul Lukas ; et al. | 2007-04-26 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
App 20070091538 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
App 20070091539 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
App 20070091541 - Buchberger; Douglas A. JR. ; et al. | 2007-04-26 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
App 20070081296 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
App 20070081295 - Brillhart; Paul Lukas ; et al. | 2007-04-12 |
Capacitively coupled plasma reactor having very agile wafer temperature control
App 20070081294 - Buchberger; Douglas A. JR. ; et al. | 2007-04-12 |
Methods to avoid unstable plasma states during a process transition
App 20070066064 - Kutney; Michael C. ; et al. | 2007-03-22 |
Method to reduce plasma-induced charging damage
App 20070048882 - Kutney; Michael C. ; et al. | 2007-03-01 |
Dual bias frequency plasma reactor with feedback control of E.S.C. voltage using wafer voltage measurement at the bias supply output
App 20060256499 - Yang; Jang Gyoo ; et al. | 2006-11-16 |
Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber
App 20030085000 - Horioka, Keiji ; et al. | 2003-05-08 |
Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
App 20030006008 - Horioka, Keiji ; et al. | 2003-01-09 |
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