Bukofsky; Scott J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bukofsky; Scott J..The latest application filed is for "topography compensated film application methods".

Company Profile

0.9.9

Bukofsky; Scott J. - Hopewell Junction NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Generating mask patterns for alternating phase-shift mask lithography Grant 7,475,380 - Liebmann , et al. January 6, 2	2009-01-06
Topography compensated film application methods Grant 7,354,779 - Brodsky , et al. April 8, 2	2008-04-08
Topography Compensated Film Application Methods App 20070249070 - Brodsky; Colin J. ; et al.	2007-10-25
Density-aware dynamic leveling in scanning exposure systems Grant 7,239,371 - Liegl , et al. July 3, 2	2007-07-03
Method to reduce photoresist pattern collapse by controlled surface microroughening Grant 7,229,936 - Brodsky , et al. June 12, 2	2007-06-12
Density-aware Dynamic Leveling In Scanning Exposure Systems App 20070085991 - Liegl; Bernhard R. ; et al.	2007-04-19
Layout impact reduction with angled phase shapes Grant 7,135,255 - Bukofsky , et al. November 14, 2	2006-11-14
Automated Sub-field Blading For Leveling Optimization In Lithography Exposure Tool App 20060160037 - Brodsky; Colin J. ; et al.	2006-07-20
Generating mask patterns for alternating phase-shift mask lithography App 20060107248 - Liebmann; Lars W. ; et al.	2006-05-18
Generating mask patterns for alternating phase-shift mask lithography Grant 6,993,741 - Liebmann , et al. January 31, 2	2006-01-31
Method To Reduce Photoresist Pattern Collapse By Controlled Surface Microroughening App 20050245094 - Brodsky, Colin J. ; et al.	2005-11-03
Generating Mask Patterns For Alternating Phase-shift Mask Lithography App 20050014074 - Liebmann, Lars W. ; et al.	2005-01-20
Self-aligned alternating phase shift mask patterning process Grant 6,824,932 - Bukofsky , et al. November 30, 2	2004-11-30
Layout Impact Reduction With Angled Phase Shapes App 20040191638 - Bukofsky, Scott J. ; et al.	2004-09-30
Method for evaluating the effects of multiple exposure processes in lithography Grant 6,777,147 - Fonseca , et al. August 17, 2	2004-08-17
Self-aligned alternating phase shift mask patterning process App 20030228526 - Bukofsky, Scott J. ; et al.	2003-12-11
Method to overcome image shortening by use of sub-resolution reticle features Grant 6,451,490 - Advocate , et al. September 17, 2	2002-09-17
Methods And Compositions For Imaging Acids In Chemically Amplified Photoresists Using Ph-dependent Fluorophores App 20010001698 - GROBER, ROBERT D. ; et al.	2001-05-24

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