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name:-0.0096030235290527
name:-0.00069308280944824
Budri; Thanas Patent Filings

Budri; Thanas

Patent Applications and Registrations

Patent applications and USPTO patent grants for Budri; Thanas.The latest application filed is for "high performance sige:c hbt with phosphorous atomic layer doping".

Company Profile
0.11.2
  • Budri; Thanas - Portland ME US
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Manufacturing resistors with tightened resistivity distribution in semiconductor integrated circuits
Grant 8,679,936 - Budri , et al. March 25, 2
2014-03-25
System and method for monitoring chloride content and concentration induced by a metal etch process
Grant 8,481,142 - Budri , et al. July 9, 2
2013-07-09
High performance SiGe:C HBT with phosphorous atomic layer doping
Grant 8,115,196 - Ramdani , et al. February 14, 2
2012-02-14
Method for fabricating higher quality thicker gate oxide in a non-volatile memory cell and associated circuits
Grant 8,097,923 - Budri , et al. January 17, 2
2012-01-17
HIGH PERFORMANCE SiGe:C HBT WITH PHOSPHOROUS ATOMIC LAYER DOPING
App 20110180848 - Ramdani; Jamal ;   et al.
2011-07-28
High performance SiGe:C HBT with phosphorous atomic layer doping
Grant 7,892,915 - Ramdani , et al. February 22, 2
2011-02-22
Method for fabricating higher quality thicker gate oxide in a non-volatile memory cell and associated circuits
App 20100276740 - Budri; Thanas ;   et al.
2010-11-04
Method for fabricating higher quality thicker gate oxide in a non-volatile memory cell and associated circuits
Grant 7,781,289 - Budri , et al. August 24, 2
2010-08-24
System and method for measuring germanium concentration for manufacturing control of BiCMOS films
Grant 7,508,531 - Printy , et al. March 24, 2
2009-03-24
System and method for measuring germanium concentration for manufacturing control of BiCMOS films
Grant 7,319,530 - Printy , et al. January 15, 2
2008-01-15
System and method for using areas near photo global alignment marks or unpatterned areas of a semiconductor wafer to create structures for SIMS or E-Beam or XRD testing
Grant 7,038,222 - Budri , et al. May 2, 2
2006-05-02

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