| Patent | Date |
|---|
Apparatus For Post Exposure Bake Of Photoresist
App 20220269179 - BUCHBERGER, JR.; Douglas A. ; et al. | 2022-08-25 |
Apparatus For Post Exposure Bake Of Photoresist
App 20220269180 - BUCHBERGER, JR.; Douglas A. ; et al. | 2022-08-25 |
Apparatus For Post Exposure Bake Of Photoresist
App 20220260917 - BUCHBERGER, JR.; Douglas A. ; et al. | 2022-08-18 |
Symmetric Plasma Process Chamber
App 20220254606 - CARDUCCI; James D. ; et al. | 2022-08-11 |
Apparatus For Post Exposure Bake Of Photoresist
App 20220199414 - BUCHBERGER, JR.; Douglas A. ; et al. | 2022-06-23 |
Symmetric plasma process chamber
Grant 11,315,760 - Carducci , et al. April 26, 2 | 2022-04-26 |
In-situ Method And Apparatus For Measuring Fluid Resistivity
App 20220113177 - BUCHBERGER, Jr.; Douglas A. ; et al. | 2022-04-14 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20220004104 - BABAYAN; Viachslav ; et al. | 2022-01-06 |
Methods For Depositing Dielectric Material
App 20210384040 - CITLA; Bhargav S. ; et al. | 2021-12-09 |
Methods for depositing dielectric material
Grant 11,114,306 - Citla , et al. September 7, 2 | 2021-09-07 |
Method and apparatus for post exposure processing of photoresist wafers
Grant 11,112,697 - Babayan , et al. September 7, 2 | 2021-09-07 |
Electrostatic chuck having thermally isolated zones with minimal crosstalk
Grant 11,088,005 - Parkhe , et al. August 10, 2 | 2021-08-10 |
Feedforward temperature control for plasma processing apparatus
Grant 10,854,425 - Mahadeswaraswamy , et al. December 1, 2 | 2020-12-01 |
Substrate support with symmetrical feed structure
Grant 10,770,328 - Lin , et al. Sep | 2020-09-08 |
Symmetric Plasma Process Chamber
App 20200185192 - CARDUCCI; James D. ; et al. | 2020-06-11 |
Symmetric plasma process chamber
Grant 10,615,006 - Carducci , et al. | 2020-04-07 |
Methods For Depositing Dielectric Material
App 20200090946 - CITLA; Bhargav S. ; et al. | 2020-03-19 |
Symmetric plasma process chamber
Grant 10,580,620 - Carducci , et al. | 2020-03-03 |
Symmetric plasma process chamber
Grant 10,546,728 - Carducci , et al. Ja | 2020-01-28 |
Symmetric plasma process chamber
Grant 10,535,502 - Carducci , et al. Ja | 2020-01-14 |
Method and apparatus for post exposure processing of photoresist wafers
Grant 10,474,033 - Babayan , et al. Nov | 2019-11-12 |
Symmetric plasma process chamber
Grant 10,453,656 - Carducci , et al. Oc | 2019-10-22 |
Electrostatic Chuck Having Thermally Isolated Zones With Minimal Crosstalk
App 20190279893 - Parkhe; Vijay D. ; et al. | 2019-09-12 |
Apparatus for controlling temperature uniformity of a substrate
Grant 10,386,126 - Bera , et al. A | 2019-08-20 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20190187563 - BABAYAN; Viachslav ; et al. | 2019-06-20 |
Electrostatic chuck having thermally isolated zones with minimal crosstalk
Grant 10,304,715 - Parkhe , et al. | 2019-05-28 |
Hydrophobic Electrostatic Chuck
App 20190115241 - VELLORE; Kim ; et al. | 2019-04-18 |
Plasma Reactor Having Radial Struts for Substrate Support
App 20190085467 - Nguyen; Andrew ; et al. | 2019-03-21 |
Substrate Support With Symmetrical Feed Structure
App 20190051551 - LIN; XING ; et al. | 2019-02-14 |
Method and apparatus for post exposure processing of photoresist wafers
Grant 10,203,604 - Babayan , et al. Feb | 2019-02-12 |
Electrostatic Carrier For Die Bonding Applications
App 20180374736 - KUMAR; Niranjan ; et al. | 2018-12-27 |
Inductively coupled plasma source with top coil over a ceiling and an independent side coil and independent air flow
Grant 10,131,994 - Nguyen , et al. November 20, 2 | 2018-11-20 |
Electrostatic Chuck Having Thermally Isolated Zones With Minimal Crosstalk
App 20180269098 - Parkhe; Vijay D. ; et al. | 2018-09-20 |
Electrostatic chuck having thermally isolated zones with minimal crosstalk
Grant 9,991,148 - Parkhe , et al. June 5, 2 | 2018-06-05 |
Stress Balanced Electrostatic Substrate Carrier With Contacts
App 20180122679 - Roy; Shambhu N. ; et al. | 2018-05-03 |
Fast response fluid control system
Grant 9,916,967 - Buchberger, Jr. March 13, 2 | 2018-03-13 |
Inductively coupled plasma source with multiple dielectric windows and window-supporting structure
Grant 9,896,769 - Nguyen , et al. February 20, 2 | 2018-02-20 |
Processed Wafer As Top Plate Of A Workpiece Carrier In Semiconductor And Mechanical Processing
App 20180025931 - Nemani; Srinivas D. ; et al. | 2018-01-25 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20170363960 - BABAYAN; Viachslav ; et al. | 2017-12-21 |
Symmetrical Inductively Coupled Plasma Source with Symmetrical Flow Chamber
App 20170350017 - Nguyen; Andrew ; et al. | 2017-12-07 |
Immersion field guided exposure and post-exposure bake process
Grant 9,829,790 - Buchberger, Jr. , et al. November 28, 2 | 2017-11-28 |
Symmetric Plasma Process Chamber
App 20170271129 - CARDUCCI; James D. ; et al. | 2017-09-21 |
Electrostatic Chuck Having Thermally Isolated Zones With Minimal Crosstalk
App 20170250100 - Parkhe; Vijay D. ; et al. | 2017-08-31 |
Symmetrical inductively coupled plasma source with symmetrical flow chamber
Grant 9,745,663 - Nguyen , et al. August 29, 2 | 2017-08-29 |
Symmetric plasma process chamber
Grant 9,741,546 - Carducci , et al. August 22, 2 | 2017-08-22 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers
App 20170154797 - Babayan; Viachslav ; et al. | 2017-06-01 |
Electrostatic chuck having thermally isolated zones with minimal crosstalk
Grant 9,666,466 - Parkhe , et al. May 30, 2 | 2017-05-30 |
Heated showerhead assembly
Grant 9,570,275 - Carducci , et al. February 14, 2 | 2017-02-14 |
Immersion Field Guided Exposure And Post-exposure Bake Process
App 20160357107 - BUCHBERGER, JR.; Douglas A. ; et al. | 2016-12-08 |
Symmetric Plasma Process Chamber
App 20160314940 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314937 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314942 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Symmetric Plasma Process Chamber
App 20160314936 - CARDUCCI; James D. ; et al. | 2016-10-27 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20160169593 - BERA; KALLOL ; et al. | 2016-06-16 |
Temperature management of aluminium nitride electrostatic chuck
Grant 9,358,702 - Banda , et al. June 7, 2 | 2016-06-07 |
Feedforward Temperature Control For Plasma Processing Apparatus
App 20160155612 - MAHADESWARASWAMY; Chetan ; et al. | 2016-06-02 |
Feedforward temperature control for plasma processing apparatus
Grant 9,338,871 - Mahadeswaraswamy , et al. May 10, 2 | 2016-05-10 |
Apparatus for controlling the temperature uniformity of a substrate
Grant 9,267,742 - Bera , et al. February 23, 2 | 2016-02-23 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
Grant 9,248,509 - Tavassoli , et al. February 2, 2 | 2016-02-02 |
Substrate Support With Symmetrical Feed Structure
App 20150371877 - LIN; XING ; et al. | 2015-12-24 |
Substrate support with symmetrical feed structure
Grant 9,123,762 - Lin , et al. September 1, 2 | 2015-09-01 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,980,044 - Brillhart , et al. March 17, 2 | 2015-03-17 |
Tunable Temperature Controlled Electrostatic Chuck Assembly
App 20150060013 - Buchberger, JR.; Douglas A. | 2015-03-05 |
Heated Showerhead Assembly
App 20150053794 - CARDUCCI; James D. ; et al. | 2015-02-26 |
Electrostatic chuck with advanced RF and temperature uniformity
Grant 8,937,800 - Lubomirsky , et al. January 20, 2 | 2015-01-20 |
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity
App 20140346743 - Tavassoli; Hamid ; et al. | 2014-11-27 |
Electrostatic Chuck Having Thermally Isolated Zones With Minimal Crosstalk
App 20140334060 - Parkhe; Vijay D. ; et al. | 2014-11-13 |
Fast Response Fluid Control System
App 20140262030 - Buchberger, JR.; Douglas A. | 2014-09-18 |
Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
Grant 8,822,876 - Tavassoli , et al. September 2, 2 | 2014-09-02 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,801,893 - Brillhart , et al. August 12, 2 | 2014-08-12 |
Temperature Management Of Aluminium Nitride Electrostatic Chuck
App 20140203526 - Banda; Sumanth ; et al. | 2014-07-24 |
Method of differential counter electrode tuning in an RF plasma reactor
Grant 8,734,664 - Yang , et al. May 27, 2 | 2014-05-27 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Ceiling Electrode
App 20140069584 - Yang; Yang ; et al. | 2014-03-13 |
Method Of Differential Counter Electrode Tuning In An Rf Plasma Reactor
App 20140034612 - Yang; Yang ; et al. | 2014-02-06 |
Differential Counter Electrode Tuning In A Plasma Reactor With An Rf-driven Workpiece Support Electrode
App 20140034239 - Yang; Yang ; et al. | 2014-02-06 |
Inductively Coupled Plasma Source With Multiple Dielectric Windows And Window-supporting Structure
App 20140020837 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Symmetrical Inductively Coupled Plasma Source With Symmetrical Flow Chamber
App 20140020835 - Nguyen; Andrew ; et al. | 2014-01-23 |
Inductively Coupled Plasma Source With Plural Top Coils Over A Ceiling And An Independent Side Coil
App 20140020836 - NGUYEN; ANDREW ; et al. | 2014-01-23 |
Methods and apparatus for controlling substrate temperature in a process chamber
Grant 8,633,423 - Lin , et al. January 21, 2 | 2014-01-21 |
Assembly for delivering RF power and DC voltage to a plasma processing chamber
Grant 8,629,370 - Tavassoli , et al. January 14, 2 | 2014-01-14 |
Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
Grant 8,617,351 - Hoffman , et al. December 31, 2 | 2013-12-31 |
Cathode with inner and outer electrodes at different heights
Grant 8,607,731 - Hoffman , et al. December 17, 2 | 2013-12-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,608,900 - Buchberger, Jr. , et al. December 17, 2 | 2013-12-17 |
Electrostatic Chuck With Advanced Rf And Temperature Uniformity
App 20130279066 - Lubomirsky; Dmitry ; et al. | 2013-10-24 |
Plasma Processing Using Rf Return Path Variable Impedance Controller With Two-dimensional Tuning Space
App 20130277333 - Misra; Nipun ; et al. | 2013-10-24 |
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control
Grant 8,546,267 - Brillhart , et al. October 1, 2 | 2013-10-01 |
Symmetric Plasma Process Chamber
App 20130087286 - Carducci; James D. ; et al. | 2013-04-11 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,337,660 - Buchberger, Jr. , et al. December 25, 2 | 2012-12-25 |
Method of processing a workpiece in a plasma reactor using feed forward thermal control
Grant 8,329,586 - Buchberger, Jr. , et al. December 11, 2 | 2012-12-11 |
Electrostatic chuck with reduced arcing
Grant 8,270,141 - Willwerth , et al. September 18, 2 | 2012-09-18 |
Plasma Immersion Chamber
App 20120199071 - COLLINS; KENNETH S. ; et al. | 2012-08-09 |
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops
Grant 8,221,580 - Buchberger, Jr. , et al. July 17, 2 | 2012-07-17 |
Substrate Support With Symmetrical Feed Structure
App 20120097332 - LIN; XING ; et al. | 2012-04-26 |
Methods And Apparatus For Controlling Substrate Temperature In A Process Chamber
App 20120091108 - LIN; XING ; et al. | 2012-04-19 |
Multi-zoned Plasma Processing Electrostatic Chuck With Improved Temperature Uniformity
App 20120091104 - Tavassoli; Hamid ; et al. | 2012-04-19 |
Capacitively coupled plasma reactor having very agile wafer temperature control
Grant 8,157,951 - Buchberger, Jr. , et al. April 17, 2 | 2012-04-17 |
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes
Grant 8,092,639 - Buchberger, Jr. , et al. January 10, 2 | 2012-01-10 |
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution
Grant 8,092,638 - Brillhart , et al. January 10, 2 | 2012-01-10 |
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
Grant 8,080,479 - Collins , et al. December 20, 2 | 2011-12-20 |
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
Grant 8,076,247 - Collins , et al. December 13, 2 | 2011-12-13 |
Assembly For Delivering Rf Power And Dc Voltage To A Plasma Processing Chamber
App 20110297650 - Tavassoli; Hamid ; et al. | 2011-12-08 |
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
Grant 8,034,180 - Brillhart , et al. October 11, 2 | 2011-10-11 |
Method for agile workpiece temperature control in a plasma reactor using a thermal model
Grant 8,021,521 - Buchberger, Jr. , et al. September 20, 2 | 2011-09-20 |
Plasma reactor with a multiple zone thermal control feed forward control apparatus
Grant 8,012,304 - Brillhart , et al. September 6, 2 | 2011-09-06 |
Feedforward Temperature Control For Plasma Processing Apparatus
App 20110186545 - MAHADESWARASWAMY; Chetan ; et al. | 2011-08-04 |
Method of operating a capacitively coupled plasma reactor with dual temperature control loops
Grant 7,988,872 - Brillhart , et al. August 2, 2 | 2011-08-02 |
Apparatus For Controlling Temperature Uniformity Of A Showerhead
App 20110180233 - BERA; KALLOL ; et al. | 2011-07-28 |
Apparatus For Controlling Temperature Uniformity Of A Substrate
App 20110180243 - BERA; KALLOL ; et al. | 2011-07-28 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,972,467 - Bera , et al. July 5, 2 | 2011-07-05 |
Electrostatic Chuck With Reduced Arcing
App 20110157760 - WILLWERTH; MICHAEL D. ; et al. | 2011-06-30 |
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
Grant 7,968,469 - Collins , et al. June 28, 2 | 2011-06-28 |
Method Of Processing A Workpiece In A Plasma Reactor Using Multiple Zone Feed Forward Thermal Control
App 20110068085 - Brillhart; Paul Lukas ; et al. | 2011-03-24 |
Method Of Processing A Workpiece In A Plasma Reactor Using Feed Forward Thermal Control
App 20110065279 - Buchberger, JR.; Douglas A. ; et al. | 2011-03-17 |
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
Grant 7,884,025 - Collins , et al. February 8, 2 | 2011-02-08 |
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
Grant 7,879,731 - Collins , et al. February 1, 2 | 2011-02-01 |
Capacitivley Coupled Plasma Reactor Having A Cooled/heated Wafer Support With Uniform Temperature Distribution
App 20100319852 - Brillhart; Paul Lukas ; et al. | 2010-12-23 |
Plasma Reactor With Feed Forward Thermal Control System Using A Thermal Model For Accommodating Rf Power Changes Or Wafer Temperature Changes
App 20100319851 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-23 |
Plasma Reactor With A Multiple Zone Thermal Control Feed Forward Control Apparatus
App 20100314046 - Brillhart; Paul Lukas ; et al. | 2010-12-16 |
Method Of Cooling A Wafer Support At A Uniform Temperature In A Capacitively Coupled Plasma Reactor
App 20100300621 - Brillhart; Paul Lukas ; et al. | 2010-12-02 |
Capacitively Coupled Plasma Reactor Having Very Agile Wafer Temperature Control
App 20100303680 - Buchberger, JR.; Douglas A. ; et al. | 2010-12-02 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma
Grant 7,754,997 - Bera , et al. July 13, 2 | 2010-07-13 |
Workpiece Support For A Plasma Reactor With Controlled Apportionment Of Rf Power To A Process Kit Ring
App 20100018648 - COLLINS; KENNETH S. ; et al. | 2010-01-28 |
Electrostatic chuck assembly
Grant 7,649,729 - Buchberger, Jr. , et al. January 19, 2 | 2010-01-19 |
Cathode With Inner And Outer Electrodes At Different Heights
App 20090314433 - Hoffman; Daniel J. ; et al. | 2009-12-24 |
Plasma Reactor Electrostatic Chuck Having A Coaxial Rf Feed And Multizone Ac Heater Power Transmission Through The Coaxial Feed
App 20090274590 - WILLWERTH; MICHAEL D. ; et al. | 2009-11-05 |
Method And Apparatus Of A Substrate Etching System And Process
App 20090272717 - Pamarthy; Sharma V. ; et al. | 2009-11-05 |
Method of controlling plasma distribution uniformity by time-weighted superposition of different solenoid fields
App 20090250432 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Method of controlling plasma distribution uniformity by superposition of different constant solenoid fields
App 20090250335 - Hoffman; Daniel J. ; et al. | 2009-10-08 |
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
Grant 7,585,384 - Bera , et al. September 8, 2 | 2009-09-08 |
Method And Apparatus For Controlling Temperature Of A Substrate
App 20090159566 - Brillhart; Paul L. ; et al. | 2009-06-25 |
Electrostatic Chuck Assembly
App 20090097184 - BUCHBERGER, JR.; DOUGLAS A. ; et al. | 2009-04-16 |
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck
Grant 7,479,456 - Buchberger, Jr. , et al. January 20, 2 | 2009-01-20 |
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor
App 20080314522 - Bera; Kallol ; et al. | 2008-12-25 |
Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
Grant 7,432,209 - Delgadino , et al. October 7, 2 | 2008-10-07 |
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
Grant 7,196,283 - Buchberger, Jr. , et al. March 27, 2 | 2007-03-27 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,186,943 - Hoffman , et al. March 6, 2 | 2007-03-06 |
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent
Grant 7,141,757 - Hoffman , et al. November 28, 2 | 2006-11-28 |
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,132,618 - Hoffman , et al. November 7, 2 | 2006-11-07 |
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 7,030,335 - Hoffman , et al. April 18, 2 | 2006-04-18 |
Capacitively coupled plasma reactor with uniform radial distribution of plasma
Grant 6,900,596 - Yang , et al. May 31, 2 | 2005-05-31 |
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression
Grant 6,894,245 - Hoffman , et al. May 17, 2 | 2005-05-17 |
Plasma reactor having RF power applicator and a dual-purpose window
Grant 6,790,311 - Collins , et al. September 14, 2 | 2004-09-14 |
Gas distribution plate electrode for a plasma receptor
Grant 6,677,712 - Katz , et al. January 13, 2 | 2004-01-13 |
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase
Grant 6,667,577 - Shannon , et al. December 23, 2 | 2003-12-23 |
Inductive antenna for a plasma reactor producing reduced fluorine dissociation
Grant 6,652,712 - Wang , et al. November 25, 2 | 2003-11-25 |
Gas distribution plate electrode for a plasma reactor
Grant 6,586,886 - Katz , et al. July 1, 2 | 2003-07-01 |
Plasma reactor having a dual mode RF power application
Grant 6,365,063 - Collins , et al. April 2, 2 | 2002-04-02 |
| 