Buchberger; Douglas A. JR.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Buchberger; Douglas A. JR..The latest application filed is for "plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material".

Company Profile

0.0.29

Buchberger; Douglas A. JR. - Livermore CA
Buchberger, Douglas A. JR. - Tracy CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material App 20070224826 - Delgadino; Gerardo A. ; et al.	2007-09-27
Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor App 20070097580 - Brillhart; Paul Lukas ; et al.	2007-05-03
Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control App 20070091540 - Brillhart; Paul Lukas ; et al.	2007-04-26
Plasma reactor with a multiple zone thermal control feed forward control apparatus App 20070089834 - Brillhart; Paul Lukas ; et al.	2007-04-26
Method for agile workpiece temperature control in a plasma reactor using a thermal model App 20070091537 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes App 20070091539 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method of processing a workpiece in a plasma reactor using feed forward thermal control App 20070091541 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops App 20070091538 - Buchberger; Douglas A. JR. ; et al.	2007-04-26
Method of operating a capacitively coupled plasma reactor with dual temperature control loops App 20070081296 - Brillhart; Paul Lukas ; et al.	2007-04-12
Capacitively coupled plasma reactor having very agile wafer temperature control App 20070081294 - Buchberger; Douglas A. JR. ; et al.	2007-04-12
Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution App 20070081295 - Brillhart; Paul Lukas ; et al.	2007-04-12
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck App 20060043065 - Buchberger; Douglas A. JR. ; et al.	2006-03-02
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression App 20050236377 - Hoffman, Daniel J. ; et al.	2005-10-27
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface App 20050178748 - Buchberger, Douglas A. JR. ; et al.	2005-08-18
Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction App 20050167051 - Hoffman, Daniel J. ; et al.	2005-08-04
Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression App 20040211759 - Hoffman, Daniel J. ; et al.	2004-10-28
Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor App 20040206309 - Bera, Kallol ; et al.	2004-10-21
Plasma reactor with overhead RF source power electrode having a resonance that is virtually pressure independent App 20040159287 - Hoffman, Daniel ; et al.	2004-08-19
Capacitively coupled plasma reactor with uniform radial distribution of plasma App 20040056602 - Yang, Jang Gyoo ; et al.	2004-03-25
Cathode pedestal for a plasma etch reactor App 20040040664 - Yang, Jang Gyoo ; et al.	2004-03-04
Gas Distribution Plate Electrode For A Plasma Reactor App 20030201723 - Katz, Dan ; et al.	2003-10-30
MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression App 20030136766 - Hoffman, Daniel J. ; et al.	2003-07-24
Gas Distribution Plate Electrode For A Plasma Reactor App 20030111961 - Katz, Dan ; et al.	2003-06-19
Plasma reactor with spoke antenna having a VHF mode with the spokes in phase App 20030111962 - Shannon, Steven ; et al.	2003-06-19
Inductive antenna for a plasma reactor producing reduced fluorine dissociation App 20030111181 - Wang, Shiang-Bau ; et al.	2003-06-19
Top gas feed lid for semiconductor processing chamber App 20030037879 - Askarinam, Farahmand E. ; et al.	2003-02-27
Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression App 20020108933 - Hoffman, Daniel J. ; et al.	2002-08-15
Plasma reactor having RF power applicator and a dual-purpose window App 20020096259 - Collins, Kenneth S. ; et al.	2002-07-25
Thermal Control Apparatus For Inductively Coupled Rf Plasma Reactor Having An Overhead Solenoidal Antenna App 20010054483 - COLLINS, KENNETH S. ; et al.	2001-12-27

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