Buchberger; Douglas A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Buchberger; Douglas A..The latest application filed is for "inductively coupled plasma source with multiple dielectric windows and window supporting structure".

Company Profile

0.9.19

Buchberger; Douglas A. - Livermore CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Pulsed plasma for film deposition Grant 10,096,466 - Xue , et al. October 9, 2	2018-10-09
Substrate support with symmetrical feed structure Grant 10,096,494 - Lin , et al. October 9, 2	2018-10-09
Inductively Coupled Plasma Source with Multiple Dielectric Windows and Window Supporting Structure App 20170350018 - Nguyen; Andrew ; et al.	2017-12-07
Pulsed Plasma For Film Deposition App 20160276150 - Xue; Jun ; et al.	2016-09-22
Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow Grant 9,214,315 - Silveira , et al. December 15, 2	2015-12-15
Temperature Control In Plasma Processing Apparatus Using Pulsed Heat Transfer Fluid Flow App 20150316941 - SILVEIRA; Fernando M. ; et al.	2015-11-05
Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow Grant 8,916,793 - Silveira , et al. December 23, 2	2014-12-23
Heated showerhead assembly Grant 8,876,024 - Carducci , et al. November 4, 2	2014-11-04
Fast Response Fluid Temperature Control System App 20130240144 - Buchberger; Douglas A. ; et al.	2013-09-19
Temperature Control In Plasma Processing Apparatus Using Pulsed Heat Transfer Fluid Flow App 20120132397 - Silveira; Fernando M. ; et al.	2012-05-31
Apparatus to confine plasma and to enhance flow conductance Grant 7,674,353 - Bera , et al. March 9, 2	2010-03-09
Method and apparatus to confine plasma and to enhance flow conductance Grant 7,618,516 - Bera , et al. November 17, 2	2009-11-17
Heated Showerhead Assembly App 20090179085 - CARDUCCI; JAMES D. ; et al.	2009-07-16
Plasma Process Uniformity Across A Wafer By Apportioning Ground Return Path Impedances Among Plural Vhf Sources App 20080182417 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Reactor With Ion Distribution Uniformity Controller Employing Plural Vhf Sources App 20080178803 - COLLINS; KENNETH S. ; et al.	2008-07-31
Method Of Processing A Workpiece In A Plasma Reactor With Variable Height Ground Return Path To Control Plasma Ion Density Uniformity App 20080179181 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Reactor With Wide Process Window Employing Plural Vhf Sources App 20080179011 - COLLINS; KENNETH S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Apportioning Power Among Plural Vhf Sources App 20080182416 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling A Variable Frequency Coupled To A Harmonic Resonator App 20080182418 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Process Uniformity Across A Wafer By Controlling Rf Phase Between Opposing Electrodes App 20080180028 - Collins; Kenneth S. ; et al.	2008-07-31
Plasma Immersion Chamber App 20080173237 - Collins; Kenneth S. ; et al.	2008-07-24
Apparatus And Method To Confine Plasma And Reduce Flow Resistance In A Plasma Reactor App 20080105660 - Bera; Kallol ; et al.	2008-05-08
Apparatus To Confine Plasma And To Enhance Flow Conductance App 20070023145 - Bera; Kallol ; et al.	2007-02-01
Method And Apparatus To Confine Plasma And To Enhance Flow Conductance App 20060193102 - Bera; Kallol ; et al.	2006-08-31
Method and apparatus to confine plasma and to enhance flow conductance App 20060172542 - Bera; Kallol ; et al.	2006-08-03

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