Brunner; Timothy Allan
Patent Applications and Registrations
Patent applications and USPTO patent grants for Brunner; Timothy Allan.The latest application filed is for "euv mask for monitoring focus in euv lithography".
- Brunner; Timothy Allan - Ridgefield CT
| Patent | Date |
|---|---|
| EUV mask for monitoring focus in EUV lithography Grant 10,012,898 - Brunner , et al. July 3, 2 | 2018-07-03 |
| Method for monitoring focus in EUV lithography Grant 9,921,466 - Brunner , et al. March 20, 2 | 2018-03-20 |
| Euv Mask For Monitoring Focus In Euv Lithography App 20180074395 - BRUNNER; TIMOTHY ALLAN ; et al. | 2018-03-15 |
| Method For Monitoring Focus In Euv Lithography App 20170192364 - BRUNNER; TIMOTHY ALLAN ; et al. | 2017-07-06 |
| Method for monitoring focus in EUV lithography Grant 9,588,440 - Brunner , et al. March 7, 2 | 2017-03-07 |
| Method For Monitoring Focus In Euv Lithography App 20160238939 - Brunner; Timothy Allan ; et al. | 2016-08-18 |
| Photolithography focus improvement by reduction of autofocus radiation transmission into substrate Grant 8,227,180 - Brunner , et al. July 24, 2 | 2012-07-24 |
| Critical dimension control of printed features using non-printing fill patterns Grant 7,074,525 - Wu , et al. July 11, 2 | 2006-07-11 |
| Critical dimension control of printed features using non-printing fill patterns App 20040219435 - Wu, Chung-Hsi J. ; et al. | 2004-11-04 |
| Asymmetrical resist sidewall Grant 6,114,096 - Mih , et al. September 5, 2 | 2000-09-05 |
| Method of optical metrology of unresolved pattern arrays Grant 5,805,290 - Ausschnitt , et al. September 8, 1 | 1998-09-08 |
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