Broeke; Douglas Van Den

Patent Applications and Registrations

Patent applications and USPTO patent grants for Broeke; Douglas Van Den.The latest application filed is for "method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography".

Company Profile

0.5.13

Broeke; Douglas Van Den - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,774,736 - Broeke , et al. August 10, 2	2010-08-10
Method, Program Product And Apparatus For Model Based Scattering Bar Placement For Enhanced Depth Of Focus In Quarter-wavelength Lithography App 20100047699 - BROEKE; Douglas Van Den ; et al.	2010-02-25
Method of optical proximity correction design for contact hole mask Grant 7,594,199 - Socha , et al. September 22, 2	2009-09-22
Feature optimization using interference mapping lithography Grant 7,506,299 - Socha , et al. March 17, 2	2009-03-17
Optical proximity correction method utilizing phase-edges as sub-resolution assist features Grant 7,399,559 - Broeke , et al. July 15, 2	2008-07-15
CPL mask and a method and program product for generating the same App 20080067143 - Broeke; Douglas Van den ; et al.	2008-03-20
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography Grant 7,247,574 - Broeke , et al. July 24, 2	2007-07-24
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20070162889 - Broeke; Douglas Van Den ; et al.	2007-07-12
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography App 20060075377 - Broeke; Douglas Van Den ; et al.	2006-04-06
Optical proximity correction method utilizing phase-edges as sub-resolution assist features App 20050271953 - Broeke, Douglas Van Den ; et al.	2005-12-08
Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM App 20050186491 - Hsu, Michael ; et al.	2005-08-25
Eigen decomposition based OPC model App 20050149902 - Shi, Xuelong ; et al.	2005-07-07
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography App 20050142449 - Shi, Xuelong ; et al.	2005-06-30
Feature optimization using interference mapping lithography App 20050142470 - Socha, Robert John ; et al.	2005-06-30
Scattering bar OPC application method for sub-half wavelength lithography patterning App 20050074677 - Laidig, Thomas ; et al.	2005-04-07
Method of optical proximity correction design for contact hole mask App 20040229133 - Socha, Robert John ; et al.	2004-11-18
Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography App 20040209170 - Broeke, Douglas Van Den ; et al.	2004-10-21
Optical proximity correction method utilizing phase-edges as sub-resolution assist features App 20030064298 - Broeke, Douglas Van Den ; et al.	2003-04-03

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