Brock; Phillip Joe

Patent Applications and Registrations

Patent applications and USPTO patent grants for Brock; Phillip Joe.The latest application filed is for "photo-patternable dielectric materials and formulations and methods of use".

Company Profile

0.33.29

Brock; Phillip Joe - Sunnyvale CA US
Brock; Phillip Joe - San Jose CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Photoacid generating polymers containing a urethane linkage for lithography Grant 9,851,639 - Allen , et al. December 26, 2	2017-12-26
Photo-patternable dielectric materials and formulations and methods of use Grant 9,012,587 - Allen , et al. April 21, 2	2015-04-21
Self-topcoating resist for photolithography Grant 8,945,808 - David , et al. February 3, 2	2015-02-03
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20130292163 - Allen; Robert David ; et al.	2013-11-07
Photoacid Generating Polymers Containing A Urethane Linkage For Lithography App 20130260313 - Allen; Robert David ; et al.	2013-10-03
Methods of depolymerizing terephthalate polyesters Grant 8,541,477 - Alabdulrahman , et al. September 24, 2	2013-09-24
Photo-patternable dielectric materials and formulations and methods of use Grant 8,431,670 - Allen , et al. April 30, 2	2013-04-30
Photo-patternable dielectric materials curable to porous dielectric materials, formulations, precursors and methods of use thereof Grant 8,389,663 - Brock , et al. March 5, 2	2013-03-05
Methods Of Depolymerizing Terephthalate Polyesters App 20120223270 - Alabdulrahman; Abdullah M. ; et al.	2012-09-06
High contact angle topcoat material and use thereof in lithography process Grant 8,034,532 - Allen , et al. October 11, 2	2011-10-11
Photopatternable dielectric materials for BEOL applications and methods for use Grant 8,029,971 - Allen , et al. October 4, 2	2011-10-04
Photo-patternable Dielectric Materials Curable To Porous Dielectric Materials, Formulations, Precursors And Methods Of Use Thereof App 20110083887 - Brock; Phillip Joe ; et al.	2011-04-14
Photopatternable dielectric materials for BEOL applications and methods for use Grant 7,919,225 - Allen , et al. April 5, 2	2011-04-05
Photo-patternable Dielectric Materials And Formulations And Methods Of Use App 20110048787 - Allen; Robert David ; et al.	2011-03-03
Immersion topcoat materials with improved performance Grant 7,855,045 - Allen , et al. December 21, 2	2010-12-21
Method for patterning a low activation energy photoresist Grant 7,820,369 - Allen , et al. October 26, 2	2010-10-26
Low activation energy dissolution modification agents for photoresist applications Grant 7,759,044 - Allen , et al. July 20, 2	2010-07-20
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090291389 - Allen; Robert D. ; et al.	2009-11-26
Photopatternable Dielectric Materials For Beol Applications And Methods For Use App 20090233226 - Allen; Robert D. ; et al.	2009-09-17
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,563,558 - Allen , et al. July 21, 2	2009-07-21
Topcoat material and use thereof in immersion lithography processes Grant 7,521,172 - David , et al. April 21, 2	2009-04-21
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molecules App 20080233517 - Allen; Robert David ; et al.	2008-09-25
Negative resists based on acid-catalyzed elimination of polar molecules Grant 7,393,624 - Allen , et al. July 1, 2	2008-07-01
Low Activation Energy Dissolution Modification Agents For Photoresist Applications App 20080153034 - Allen; Robert David ; et al.	2008-06-26
Low activation energy dissolution modification agents for photoresist applications Grant 7,358,029 - Allen , et al. April 15, 2	2008-04-15
Immersion Topcoat Materials With Improved Performance App 20080026330 - Allen; Robert David ; et al.	2008-01-31
Stable encapsulant fluid capable of undergoing reversible Diels-Alder polymerization Grant 7,309,754 - Brock , et al. December 18, 2	2007-12-18
Negative resists based on a acid-catalyzed elimination of polar molecules Grant 7,300,739 - Allen , et al. November 27, 2	2007-11-27
Negative resists based on acid-catalyzed elimination of polar molecules App 20070259274 - Allen; Robert David ; et al.	2007-11-08
Topcoat Material And Use Thereof In Immersion Lithography Processes App 20070254237 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
High Contact Angle Topcoat Material And Use Thereof In Lithography Process App 20070254236 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Self-topcoating Resist For Photolithography App 20070254235 - ALLEN; ROBERT DAVID ; et al.	2007-11-01
Immersion topcoat materials with improved performance Grant 7,288,362 - Allen , et al. October 30, 2	2007-10-30
Low activation energy dissolution modification agents for photoresist applications App 20070231734 - Allen; Robert David ; et al.	2007-10-04
Water castable-water strippable top coats for 193 nm immersion lithography App 20070117040 - Brock; Phillip Joe ; et al.	2007-05-24
Low activation energy photoresists Grant 7,193,023 - Allen , et al. March 20, 2	2007-03-20
Negative Resists Based On A Acid-catalyzed Elimination Of Polar Molecules App 20070026339 - Allen; Robert David ; et al.	2007-02-01
Slider processing system utilizing polyvinyl alcohol release layer Grant 7,125,467 - Brock , et al. October 24, 2	2006-10-24
Immersion topcoat materials with improved performance App 20060188804 - Allen; Robert David ; et al.	2006-08-24
Low activation energy photoresists App 20050124774 - Allen, Robert David ; et al.	2005-06-09
Method for patterning a low activation energy photoresist App 20050123852 - Allen, Robert David ; et al.	2005-06-09
Stable encapsulant fluid capable of undergoing reversible diels-alder polymerization App 20050067373 - Brock, Phillip Joe ; et al.	2005-03-31
Slider processing system utilizing polyvinyl alcohol release layer App 20040266186 - Brock, Phillip Joe ; et al.	2004-12-30
Lithographic photoresist composition and process for its use Grant 6,730,452 - Brock , et al. May 4, 2	2004-05-04
High silicon content monomers and polymers suitable for 193 nm bilayer resists Grant 6,653,048 - Brock , et al. November 25, 2	2003-11-25
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions Grant 6,610,456 - Allen , et al. August 26, 2	2003-08-26
Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions Grant 6,548,219 - Ito , et al. April 15, 2	2003-04-15
Norbornene fluoroacrylate copolymers and process for the use thereof Grant 6,509,134 - Ito , et al. January 21, 2	2003-01-21
Fluorine-containing styrene acrylate copolymers and use thereof in lithographic photoresist compositions App 20020164538 - Allen, Robert David ; et al.	2002-11-07
Lithographic photoresist composition and process for its use App 20020146639 - Brock, Phillip Joe ; et al.	2002-10-10
Norbornene fluoroacrylate copolymers and process for use thereof App 20020146638 - Ito, Hiroshi ; et al.	2002-10-10
Copolymer photoresist with improved etch resistance App 20020132185 - Allen, Robert D. ; et al.	2002-09-19
High silicon content monomers and polymers suitable for 193 nm bilayer resists App 20020127490 - Brock, Phillip Joe ; et al.	2002-09-12
High silicon content monomers and polymers suitable for 193 nm bilayer resists Grant 6,444,408 - Brock , et al. September 3, 2	2002-09-03
Substituted norbornene fluoroacrylate copolymers and use thereof lithographic photoresist compositions App 20020102490 - Ito, Hiroshi ; et al.	2002-08-01
Process for synthesizing chemical compounds Grant 5,658,734 - Brock , et al. August 19, 1	1997-08-19

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