Brock; Phillip
Patent Applications and Registrations
Patent applications and USPTO patent grants for Brock; Phillip.The latest application filed is for "method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles".
- Brock; Phillip - Sunnyvale CA
| Patent | Date |
|---|---|
| Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles Grant 8,470,516 - Allen , et al. June 25, 2 | 2013-06-25 |
| Graded topcoat materials for immersion lithography Grant 8,440,387 - Allen , et al. May 14, 2 | 2013-05-14 |
| Self-topcoating photoresist for photolithography Grant 7,951,524 - Allen , et al. May 31, 2 | 2011-05-31 |
| Method of Forming a Relief Pattern by E-Beam Lithography Using Chemical Amplification, and Derived Articles App 20110045387 - Allen; Robert D. ; et al. | 2011-02-24 |
| Method of use for photopatternable dielectric materials for BEOL applications Grant 7,867,689 - Allen , et al. January 11, 2 | 2011-01-11 |
| Graded Topcoat Materials For Immersion Lithography App 20100168337 - Allen; Robert D. ; et al. | 2010-07-01 |
| Graded topcoat materials for immersion lithography Grant 7,678,537 - Allen , et al. March 16, 2 | 2010-03-16 |
| Graded Topcoat Materials For Immersion Lithography App 20080311506 - Allen; Robert D. ; et al. | 2008-12-18 |
| Graded Topcoat Materials For Immersion Lithography App 20080311530 - Allen; Robert D. ; et al. | 2008-12-18 |
| Method Of Use For Photopatternable Dielectric Materials For Beol Applications App 20080286467 - Allen; Robert D. ; et al. | 2008-11-20 |
| Self-topcoating Photoresist For Photolithography App 20080193879 - Allen; Robert ; et al. | 2008-08-14 |
| Photoresist composition Grant 7,135,595 - Allen , et al. November 14, 2 | 2006-11-14 |
| photoresist composition App 20060128914 - Allen; Robert David ; et al. | 2006-06-15 |
| Photoresist composition Grant 7,014,980 - Allen , et al. March 21, 2 | 2006-03-21 |
| Underlayer compositions for multilayer lithographic processes Grant 6,927,015 - Khojasteh , et al. August 9, 2 | 2005-08-09 |
| Photoresist composition App 20050019696 - Allen, Robert David ; et al. | 2005-01-27 |
| Underlayer compositions for multilayer lithographic processes App 20050019704 - Khojasteh, Mahmoud M. ; et al. | 2005-01-27 |
| Underlayer compositions for multilayer lithographic processes Grant 6,818,381 - Khojasteh , et al. November 16, 2 | 2004-11-16 |
| Photoresist composition Grant 6,806,026 - Allen , et al. October 19, 2 | 2004-10-19 |
| Low silicon-outgassing resist for bilayer lithography Grant 6,770,419 - Khojasteh , et al. August 3, 2 | 2004-08-03 |
| Antireflective SiO-containing compositions for hardmask layer Grant 6,730,454 - Pfeiffer , et al. May 4, 2 | 2004-05-04 |
| Low silicon-outgassing resist for bilayer lithography App 20040048187 - Khojasteh, Mahmoud M. ; et al. | 2004-03-11 |
| Photoresist composition App 20030224283 - Allen, Robert David ; et al. | 2003-12-04 |
| Antireflective SiO-containing compositions for hardmask layer App 20030198877 - Pfeiffer, Dirk ; et al. | 2003-10-23 |
| Underlayer compositions for multilayer lithographic processes App 20020058204 - Khojasteh, Mahmoud M. ; et al. | 2002-05-16 |
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