loadpatents
Patent applications and USPTO patent grants for Braly; Linda.The latest application filed is for "profile and cd uniformity control by plasma oxidation treatment".
Patent | Date |
---|---|
Plasma etch method to reduce micro-loading Grant 8,901,004 - Kamp , et al. December 2, 2 | 2014-12-02 |
Profile and CD uniformity control by plasma oxidation treatment Grant 8,671,878 - Zhong , et al. March 18, 2 | 2014-03-18 |
Profile And Cd Uniformity Control By Plasma Oxidation Treatment App 20130025785 - Zhong; Qinghua ;   et al. | 2013-01-31 |
Profile and CD uniformity control by plasma oxidation treatment Grant 8,298,949 - Zhong , et al. October 30, 2 | 2012-10-30 |
Plasma Etch Method To Reduce Micro-loading App 20110021029 - Kamp; Tom ;   et al. | 2011-01-27 |
Profile And Cd Uniformity Control By Plasma Oxidation Treatment App 20100173496 - Zhong; Qinghua ;   et al. | 2010-07-08 |
Multi-step method for etching strain gate recesses Grant 7,303,999 - Sriraman , et al. December 4, 2 | 2007-12-04 |
Method for planarization etch with in-situ monitoring by interferometry prior to recess etch Grant 7,204,934 - Braly , et al. April 17, 2 | 2007-04-17 |
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