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Patent applications and USPTO patent grants for Brain; Ruth Amy.The latest application filed is for "via contact patterning method to increase edge placement error margin".
Patent | Date |
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Via Contact Patterning Method To Increase Edge Placement Error Margin App 20220051975 - Haran; Mohit K. ;   et al. | 2022-02-17 |
Via contact patterning method to increase edge placement error margin Grant 11,211,324 - Haran , et al. December 28, 2 | 2021-12-28 |
Line Patterning In Integrated Circuit Devices App 20210183761 - Patel; Reken ;   et al. | 2021-06-17 |
Metal Space Centered Standard Cell Architecture To Enable Higher Cell Density App 20210167066 - VISHWANATH; Harshitha ;   et al. | 2021-06-03 |
Via Contact Patterning Method To Increase Edge Placement Error Margin App 20210082805 - Haran; Mohit K. ;   et al. | 2021-03-18 |
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