Bowes; Steve W.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bowes; Steve W..The latest application filed is for "process for monitoring measuring device performance".

Company Profile

0.14.11

Bowes; Steve W. - Boise ID
Bowes; Steve W. - Manassas VA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Estimating overlay error and optical aberrations Grant 7,463,367 - Bowes December 9, 2	2008-12-09
Process for monitoring measuring device performance Grant 7,200,950 - Bowes April 10, 2	2007-04-10
Abberation mark and method for estimating overlay error and optical abberations Grant 7,180,189 - Bowes February 20, 2	2007-02-20
Reducing asymmetrically deposited film induced registration error Grant 7,127,319 - Byers , et al. October 24, 2	2006-10-24
Semiconductor processing method using photoresist and an antireflective coating Grant 7,064,080 - Gilton , et al. June 20, 2	2006-06-20
Process for monitoring measuring device performance App 20060080851 - Bowes; Steve W.	2006-04-20
Process for monitoring measuring device performance Grant 6,990,743 - Bowes January 31, 2	2006-01-31
Semiconductor processing method using photoresist and an antireflective coating Grant 6,861,367 - Gilton , et al. March 1, 2	2005-03-01
Reducing asymmetrically deposited film induced registration error Grant 6,852,456 - Byers , et al. February 8, 2	2005-02-08
Reducing asymmetrically deposited film induced registration error App 20050027388 - Byers, Erik ; et al.	2005-02-03
Reducing asymmetrically deposited film induced registration error Grant 6,795,747 - Byers , et al. September 21, 2	2004-09-21
Aberration mark and method for estimating overlay error and optical aberrations Grant 6,778,275 - Bowes August 17, 2	2004-08-17
Semiconductor processing method using photoresist and an antireflective coating App 20040102046 - Gilton, Terry L. ; et al.	2004-05-27
Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same Grant 6,730,444 - Bowes May 4, 2	2004-05-04
Process for monitoring measuring device performance App 20040040165 - Bowes, Steve W.	2004-03-04
Semiconductor processing method using photoresist and an antireflective coating App 20030153190 - Gilton, Terry L. ; et al.	2003-08-14
Method and device for improved lithographic critical dimension control Grant 6,545,829 - Boettiger , et al. April 8, 2	2003-04-08
Needle comb reticle pattern for critical dimension and registration measurements using a registration tool and methods for using same App 20020182516 - Bowes, Steve W.	2002-12-05
Reducing asymmetrically deposited film induced registration error Grant 6,486,956 - Byers , et al. November 26, 2	2002-11-26
Method for improved lithographic critical dimension control Grant 6,465,141 - Boettiger , et al. October 15, 2	2002-10-15
Reducing asymmetrically deposited film induced registration error App 20020137303 - Byers, Erik ; et al.	2002-09-26
Reducing Asymmetrically Deposited Film Induced Registration Error App 20020137237 - Byers, Erik ; et al.	2002-09-26
Reducing asymmetrically deposited film induced registration error App 20020137240 - Byers, Erik ; et al.	2002-09-26
Method and device for improved lithographic critical dimension control App 20020085297 - Boettiger, Ulrich C. ; et al.	2002-07-04
Method and device for improved lithographic critical dimension control App 20020041369 - Boettiger, Ulrich C. ; et al.	2002-04-11

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