Bowden; Bradley F.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bowden; Bradley F..The latest application filed is for "method for fusion drawing ion-exchangeable glass".

Company Profile

0.5.11

Bowden; Bradley F. - Corning NY
Bowden; Bradley F. - Edison NJ
Bowden; Bradley F. - Alfred NY
Bowden, Bradley F. - Painted Post NY

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method For Fusion Drawing Ion-exchangeable Glass App 20130255314 - Allan; Douglas C. ; et al.	2013-10-03
EUV lithography glass structures formed by extrusion consolidation process Grant 6,997,015 - Bowden , et al. February 14, 2	2006-02-14
Method for making extreme ultraviolet lithography structures Grant 6,988,377 - Bernas , et al. January 24, 2	2006-01-24
High purity glass bodies formed by zero shrinkage casting Grant 6,832,493 - Bowden , et al. December 21, 2	2004-12-21
Fabrication of inclusion free homogeneous glasses Grant 6,829,908 - Bowden , et al. December 14, 2	2004-12-14
Solid freeform fabrication of lightweight lithography stage Grant 6,764,619 - Bernas , et al. July 20, 2	2004-07-20
Method of making silica-titania extreme ultraviolet elements App 20030226377 - Barrett, W. Tim ; et al.	2003-12-11
Method for making extreme ultraviolet lithography structures App 20030226375 - Bernas, James J. ; et al.	2003-12-11
EUV lithography glass structures formed by extrusion consolidation process App 20030221454 - Bowden, Bradley F. ; et al.	2003-12-04
High purity glass bodies formed by zero shrinkage casting App 20030159464 - Bowden, Bradley F. ; et al.	2003-08-28
Fabrication of inclusion free homogeneous glasses App 20030159465 - Bowden, Bradley F. ; et al.	2003-08-28
Dry pressing of spray dried soot to make EUV components App 20030159466 - Bowden, Bradley F. ; et al.	2003-08-28
Solid freeform fabrication of lightweight lithography stage App 20020154280 - Bernas, James J. ; et al.	2002-10-24
Eliminating springback in EUV lithography mirrors App 20020043081 - Bowden, Bradley F. ; et al.	2002-04-18
Silica-based light-weight EUV lithography stages App 20020044267 - Ackerman, Bradford G. ; et al.	2002-04-18

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.