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Low-dispersion Component In An Electronic Chip
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Low-dispersion component in an electronic chip
Grant 11,244,893 - Tailliet , et al. February 8, 2 | 2022-02-08 |
Method for forming at least one electrical discontinuity in an integrated circuit, and corresponding integrated circuit
Grant 10,861,802 - Rivero , et al. December 8, 2 | 2020-12-08 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses
Grant 10,770,547 - Bouton , et al. Sep | 2020-09-08 |
MOS transistor with reduced hump effect
Grant 10,714,583 - Rivero , et al. | 2020-07-14 |
Integrated Circuit Comprising Components, For Example Nmos Transistors, Having Active Regions With Relaxed Compressive Stresses
App 20200052073 - BOUTON; Guilhem ; et al. | 2020-02-13 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses
Grant 10,490,632 - Bouton , et al. Nov | 2019-11-26 |
Method for making a photolithography mask intended for the formation of contacts, mask and integrated circuit corresponding thereto
Grant 10,418,322 - Bouton , et al. Sept | 2019-09-17 |
Integrated Circuit Comprising Components, For Example Nmos Transistors, Having Active Regions With Relaxed Compressive Stresses
App 20190165105 - BOUTON; Guilhem ; et al. | 2019-05-30 |
Method For Forming At Least One Electrical Discontinuity In An Integrated Circuit, And Corresponding Integrated Circuit
App 20190103369 - RIVERO; Christian ; et al. | 2019-04-04 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses
Grant 10,211,291 - Bouton , et al. Feb | 2019-02-19 |
Mos Transistor With Reduced Hump Effect
App 20190027565 - RIVERO; Christian ; et al. | 2019-01-24 |
Method for forming at least one electrical discontinuity in an integrated circuit, and corresponding integrated circuit
Grant 10,177,101 - Rivero , et al. J | 2019-01-08 |
Low-dispersion Component In An Electronic Chip
App 20180323141 - TAILLIET; Francois ; et al. | 2018-11-08 |
Method for making a photolithography mask intended for the formation of contacts, mask and integrated circuit corresponding thereto
Grant 10,115,666 - Bouton , et al. October 30, 2 | 2018-10-30 |
Method for forming at least one electrical discontinuity in an interconnection part of an integrated circuit, and corresponding integrated circuit
Grant 10,049,991 - Rivero , et al. August 14, 2 | 2018-08-14 |
Method for forming at least one electrical discontinuity in an interconnection part of an integrated circuit without addition of additional material, and corresponding integrated circuit
Grant 10,049,982 - Rivero , et al. August 14, 2 | 2018-08-14 |
Low-dispersion component in an electronic chip
Grant 10,043,741 - Tailliet , et al. August 7, 2 | 2018-08-07 |
Method For Forming At Least One Electrical Discontinuity In An Integrated Circuit, And Corresponding Integrated Circuit
App 20180145040 - Rivero; Christian ; et al. | 2018-05-24 |
Method For Forming At Least One Electrical Discontinuity In An Interconnection Part Of An Integrated Circuit Without Addition Of Additional Material, And Corresponding Integrated Circuit
App 20180145027 - Rivero; Christian ; et al. | 2018-05-24 |
Method For Forming At Least One Electrical Discontinuity In An Interconnection Part Of An Integrated Circuit, And Corresponding Integrated Circuit
App 20180145039 - Rivero; Christian ; et al. | 2018-05-24 |
Integrated Circuit Comprising Components, For Example Nmos Transistors, Having Active Regions With Relaxed Compressive Stresses
App 20180130881 - Bouton; Guilhem ; et al. | 2018-05-10 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses
Grant 9,899,476 - Bouton , et al. February 20, 2 | 2018-02-20 |
Low-dispersion Component In An Electronic Chip
App 20170373001 - Tailliet; Francois ; et al. | 2017-12-28 |
Method for fabrication of an integrated circuit rendering a reverse engineering of the integrated circuit more difficult and corresponding integrated circuit
Grant 9,780,045 - Fornara , et al. October 3, 2 | 2017-10-03 |
Method For Fabrication Of An Integrated Circuit Rendering A Reverse Engineering Of The Integrated Circuit More Difficult And Corresponding Integrated Circuit
App 20170194267 - Fornara; Pascal ; et al. | 2017-07-06 |
Integrated Circuit Comprising Components, For Example Nmos Transistors, Having Active Regions With Relaxed Compressive Stresses
App 20160093696 - Bouton; Guilhem ; et al. | 2016-03-31 |
Method For Making A Photolithography Mask Intended For The Formation Of Contacts, Mask And Integrated Circuit Corresponding Thereto
App 20160086883 - BOUTON; GUILHEM ; et al. | 2016-03-24 |
Method For Fabrication Of An Integrated Circuit Rendering A Reverse Engineering Of The Integrated Circuit More Difficult And Corresponding Integrated Circuit
App 20160064339 - Fornara; Pascal ; et al. | 2016-03-03 |
Integrated circuit comprising components, for example NMOS transistors, having active regions with relaxed compressive stresses
Grant 9,269,771 - Rivero , et al. February 23, 2 | 2016-02-23 |
Component, for example NMOS transistor, with active region with relaxed compression stresses, and fabrication method
Grant 9,263,518 - Rivero , et al. February 16, 2 | 2016-02-16 |
Component, For Example Nmos Transistor, With An Active Region Under Relaxed Compressive Stress, And Associated Decoupling Capacitor
App 20150340426 - Wuidart; Sylvie ; et al. | 2015-11-26 |
Component, For Example Nmos Transistor, With Active Region With Relaxed Compression Stresses, And Fabrication Method
App 20150255540 - Bouton; Guilhem ; et al. | 2015-09-10 |
Integrated Circuit Comprising Components, For Example Nmos Transistors, Having Active Regions With Relaxed Compressive Stresses
App 20150249132 - Rivero; Christian ; et al. | 2015-09-03 |
Process for fabricating an integrated circuit comprising an analog block and a digital block, and corresponding integrated circuit
Grant 8,914,756 - Bouton December 16, 2 | 2014-12-16 |
Method for fabrication of an integrated circuit in a technology reduced with respect to a native technology, and corresponding integrated circuit
Grant 8,881,090 - Bouton , et al. November 4, 2 | 2014-11-04 |
Method For Making A Photolithography Mask Intended For The Formation Of Contacts, Mask And Integrated Circuit Corresponding Thereto
App 20140291858 - BOUTON; Guilhem ; et al. | 2014-10-02 |
Method For Fabrication Of An Integrated Circuit In A Technology Reduced With Respect To A Native Technology, And Corresponding Integrated Circuit
App 20130181294 - BOUTON; Guilhem ; et al. | 2013-07-18 |
Process For Fabricating An Integrated Circuit Comprising An Analog Block And A Digital Block, And Corresponding Integrated Circuit
App 20120104632 - BOUTON; Guilhem | 2012-05-03 |
Chip differentiation at the level of a reticle
Grant 6,780,716 - Wuidart , et al. August 24, 2 | 2004-08-24 |
Chip differentiation at the level of a reticle
App 20030181025 - Wuidart, Luc ; et al. | 2003-09-25 |
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