Bourdon; Bernard
Patent Applications and Registrations
Patent applications and USPTO patent grants for Bourdon; Bernard.The latest application filed is for "apparatus for chemically activated deposition in a plasma".
- Bourdon; Bernard - Gometz le Chatel FR
- Bourdon; Bernard - Orsay FR
| Patent | Date |
|---|---|
| Apparatus for chemically activated deposition in a plasma Grant 4,422,407 - Bessot , et al. December 27, 1 | 1983-12-27 |
| Method for depositing thin layers of materials by decomposing a gas to yield a plasma Grant 4,173,661 - Bourdon November 6, 1 | 1979-11-06 |
| Method of manufacturing power semiconductors with pressed contacts Grant 4,155,155 - Bourdon , et al. May 22, 1 | 1979-05-22 |
| Method of attacking a thin film by decomposition of a gas in a plasma Grant 4,134,817 - Bourdon January 16, 1 | 1979-01-16 |
| Method Of Preparing A Pattern Of A Layer Of Refractory Metal By Masking Grant 3,847,776 - Bourdon , et al. November 12, 1 | 1974-11-12 |
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