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Patent applications and USPTO patent grants for BOULLART; Werner.The latest application filed is for "method for patterning a magnetic tunnel junction stack".
Patent | Date |
---|---|
Method For Patterning A Magnetic Tunnel Junction Stack App 20150021726 - Min; Tai ;   et al. | 2015-01-22 |
Use of F-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies Grant 8,319,295 - Collaert , et al. November 27, 2 | 2012-11-27 |
Plasma Probe And Method For Plasma Diagnostics App 20120283973 - SAMARA; VLADIMIR ;   et al. | 2012-11-08 |
Dual damascene patterning method Grant 7,611,986 - Olmen , et al. November 3, 2 | 2009-11-03 |
Use Of F-based Gate Etch To Passivate The High-k/metal Gate Stack For Deep Submicron Transistor Technologies App 20080164539 - Collaert; Nadine ;   et al. | 2008-07-10 |
Plasma for patterning advanced gate stacks App 20070099428 - Shamiryan; Denis ;   et al. | 2007-05-03 |
Dual damascene patterning method App 20060264033 - Olmen; Jan Van ;   et al. | 2006-11-23 |
Method for stripping ion implanted photoresist layer Grant 6,352,936 - Jehoul , et al. March 5, 2 | 2002-03-05 |
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