loadpatents
Patent applications and USPTO patent grants for Bottini; Philip A..The latest application filed is for "gas supply member with baffle".
Patent | Date |
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Gas supply member with baffle Grant 11,124,878 - Shah , et al. September 21, 2 | 2021-09-21 |
Gas Supply Member With Baffle App 20210262093 - SHAH; Kartik ;   et al. | 2021-08-26 |
Plasma treating a process chamber Grant 10,290,504 - Liu , et al. | 2019-05-14 |
Gas Supply Member With Baffle App 20190032216 - SHAH; Kartik ;   et al. | 2019-01-31 |
Plasma Treating A Process Chamber App 20180082847 - LIU; Wei ;   et al. | 2018-03-22 |
Plasma treating a process chamber Grant 9,831,091 - Liu , et al. November 28, 2 | 2017-11-28 |
Process Chamber App 20160358781 - LIU; Wei ;   et al. | 2016-12-08 |
Apparatus and method for controlling edge performance in an inductively coupled plasma chamber Grant 8,999,106 - Liu , et al. April 7, 2 | 2015-04-07 |
Dual Zone Gas Injection Nozzle App 20120164845 - Liu; Wei ;   et al. | 2012-06-28 |
Dual zone gas injection nozzle Grant 8,137,463 - Liu , et al. March 20, 2 | 2012-03-20 |
Method of correcting baseline skew by a novel motorized source coil assembly Grant 8,062,472 - Liu , et al. November 22, 2 | 2011-11-22 |
Method Of Correcting Baseline Skew By A Novel Motorized Source Coil Assembly App 20090159425 - Liu; Wei ;   et al. | 2009-06-25 |
Dual Zone Gas Injection Nozzle App 20090159424 - Liu; Wei ;   et al. | 2009-06-25 |
Apparatus And Method For Processing A Substrate Using Inductively Coupled Plasma Technology App 20090162570 - Swenberg; Johanes F. ;   et al. | 2009-06-25 |
Apparatus And Method For Controlling Edge Performance In An Inductively Coupled Plasma Chamber App 20090162952 - Liu; Wei ;   et al. | 2009-06-25 |
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