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Patent applications and USPTO patent grants for Botelho; Heraldo L..The latest application filed is for "methods for the reduction and elimination of particulate contamination with cvd of amorphous carbon".
Patent | Date |
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Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20070286965 - Seamons; Martin Jay ;   et al. | 2007-12-13 |
Methods For The Reduction And Elimination Of Particulate Contamination With Cvd Of Amorphous Carbon App 20060222771 - Seamons; Martin Jay ;   et al. | 2006-10-05 |
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon Grant 7,094,442 - Seamons , et al. August 22, 2 | 2006-08-22 |
Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon App 20060014397 - Seamons; Martin Jay ;   et al. | 2006-01-19 |
Method of depositing an amorphous carbon film for metal etch hardmask application App 20050199585 - Wang, Yuxiang May ;   et al. | 2005-09-15 |
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