Borovik; Alexander

Patent Applications and Registrations

Patent applications and USPTO patent grants for Borovik; Alexander.The latest application filed is for "copper (i) compounds useful as deposition precursors of copper thin films".

Company Profile

0.6.9

Borovik; Alexander - White Plains NY
Borovik; Alexander - Elmsford NY
Borovik; Alexander - West Hartford CT

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositions Grant 7,964,032 - Rajaraman , et al. June 21, 2	2011-06-21
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20100133689 - Xu; Chongying ; et al.	2010-06-03
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20080233276 - Xu; Chongying ; et al.	2008-09-25
Fluorine-free disiloxane surfactant compositions for use in coatings and printing ink compositions Grant 7,399,350 - Rajaraman , et al. July 15, 2	2008-07-15
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,371,880 - Xu , et al. May 13, 2	2008-05-13
Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositions App 20080090963 - Rajaraman; Suresh K. ; et al.	2008-04-17
Fluorine-free disiloxane surfactant compositions for use in coatings and printing ink compositions App 20080090964 - Rajaraman; Suresh K. ; et al.	2008-04-17
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,241,912 - Xu , et al. July 10, 2	2007-07-10
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20070116876 - Xu; Chongying ; et al.	2007-05-24
Copper (I) compounds useful as deposition precursors of copper thin films Grant 7,166,732 - Xu , et al. January 23, 2	2007-01-23
Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products App 20060065294 - Xu; Chongying ; et al.	2006-03-30
Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products Grant 7,011,716 - Xu , et al. March 14, 2	2006-03-14
Copper (i) Compounds Useful As Deposition Precursors Of Copper Thin Films App 20050281952 - Xu, Chongying ; et al.	2005-12-22
Copper (I) compounds useful as deposition precursors of copper thin films App 20050283012 - Xu, Chongying ; et al.	2005-12-22
Compositions And Methods For Drying Patterned Wafers During Manufacture Of Integrated Circuitry Products App 20040216772 - Xu, Chongying ; et al.	2004-11-04

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