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Patent applications and USPTO patent grants for Borodovsky; Yan A..The latest application filed is for "ebeam universal cutter".
Patent | Date |
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Cross scan proximity correction with ebeam universal cutter Grant 10,747,115 - Borodovsky A | 2020-08-18 |
Ebeam universal cutter Grant 10,578,970 - Borodovsky , et al. | 2020-03-03 |
Ebeam staggered beam aperture array Grant 10,386,722 - Borodovsky , et al. A | 2019-08-20 |
Underlying absorbing or conducting layer for Ebeam direct write (EBDW) lithography Grant 10,338,474 - Tandon , et al. | 2019-07-02 |
Ebeam Universal Cutter App 20190155160 - BORODOVSKY; Yan A. ;   et al. | 2019-05-23 |
Ebeam align on the fly Grant 10,290,528 - Borodovsky , et al. | 2019-05-14 |
Cross Scan Proximity Correction With Ebeam Universal Cutter App 20190121236 - BORODOVSKY; YAN A. | 2019-04-25 |
Fine alignment system for electron beam exposure system Grant 10,236,161 - Borodovsky | 2019-03-19 |
Ebeam universal cutter Grant 10,216,087 - Borodovsky , et al. Feb | 2019-02-26 |
Cross scan proximity correction with ebeam universal cutter Grant 10,191,376 - Borodovsky Ja | 2019-01-29 |
Ebeam three beam aperture array Grant 10,067,416 - Borodovsky , et al. September 4, 2 | 2018-09-04 |
Unidirectional metal on layer with ebeam Grant 10,014,256 - Nelson , et al. July 3, 2 | 2018-07-03 |
Ebeam Three Beam Aperture Array App 20180143526 - BORODOVSKY; Yan A. ;   et al. | 2018-05-24 |
Ebeam non-universal cutter Grant 9,952,511 - Borodovsky , et al. April 24, 2 | 2018-04-24 |
Ebeam three beam aperture array Grant 9,897,908 - Borodovsky , et al. February 20, 2 | 2018-02-20 |
Corner rounding correction for electron beam (Ebeam) direct write system Grant 9,899,182 - Borodovsky February 20, 2 | 2018-02-20 |
Fine Alignment System For Electron Beam Exposure System App 20180033593 - BORODOVSKY; Yan A. | 2018-02-01 |
Underlying Absorbing or Conducting Layer for Ebeam Direct Write (EBDW) Lithography App 20170338105 - TANDON; Shakul ;   et al. | 2017-11-23 |
Cross Scan Proximity Correction With Ebeam Universal Cutter App 20170269481 - BORODOVSKY; YAN A. | 2017-09-21 |
Corner Rounding Correction For Electron Beam (ebeam) Direct Write System App 20170271117 - BORODOVSKY; YAN A. | 2017-09-21 |
Ebeam Universal Cutter App 20170102615 - Borodovsky; Yan A. ;   et al. | 2017-04-13 |
Ebeam Three Beam Aperture Array App 20170076905 - BORODOVSKY; Yan A. ;   et al. | 2017-03-16 |
Unidirectional Metal On Layer With Ebeam App 20170077029 - NELSON; Donald W. ;   et al. | 2017-03-16 |
Ebeam Align On The Fly App 20170076967 - BORODOVSKY; Yan A. ;   et al. | 2017-03-16 |
Ebeam Staggered Beam Aperture Array App 20170076906 - BORODOVSKY; Yan A. ;   et al. | 2017-03-16 |
Data Compression For Ebeam Throughput App 20170069509 - NELSON; Donald W. ;   et al. | 2017-03-09 |
Ebeam Non-universal Cutter App 20170069461 - BORODOVSKY; Yan A. ;   et al. | 2017-03-09 |
Method of creating a maskless air gap in back end interconnections with double self-aligned vias Grant 9,324,652 - Chandhok , et al. April 26, 2 | 2016-04-26 |
Method Of Creating A Maskless Air Gap In Back End Interconnections With Double Self-aligned Vias App 20150171012 - CHANDHOK; Manish ;   et al. | 2015-06-18 |
Method of creating a maskless air gap in back end interconnects with double self-aligned vias Grant 8,975,138 - Chandhok , et al. March 10, 2 | 2015-03-10 |
Method Of Creating A Maskless Air Gap In Back End Interconnects With Double Self-aligned Vias App 20150001724 - CHANDHOK; Manish ;   et al. | 2015-01-01 |
Method of producing semiconductor device layer layout Grant 5,498,579 - Borodovsky , et al. March 12, 1 | 1996-03-12 |
Lithographic emhancement method and apparatus for randomly spaced structures Grant 5,424,154 - Borodovsky June 13, 1 | 1995-06-13 |
Method for making integrated circuit devices using a layer of indium arsenide as an antireflective coating Grant 4,529,685 - Borodovsky July 16, 1 | 1985-07-16 |
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