| Patent | Date |
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Circuit for impedance matching between a generator and a load at multiple frequencies, assembly comprising such a circuit and related use
Grant 10,796,885 - Johnson , et al. October 6, 2 | 2020-10-06 |
Method and system for controlling ion flux in an RF plasma
Grant 10,319,565 - Bruneau , et al. | 2019-06-11 |
Method And System For Controlling Ion Flux In An Rf Plasma
App 20170084428 - Bruneau; Bastien ; et al. | 2017-03-23 |
Passive capacitively-coupled electrostatic (CCE) probe method for detecting plasma instabilities in a plasma processing chamber
Grant 9,153,421 - Booth , et al. October 6, 2 | 2015-10-06 |
Processing system for detecting in-situ arcing events during substrate processing
Grant 9,129,779 - Booth , et al. September 8, 2 | 2015-09-08 |
Electrical Circuit To Impedance Match A Source And A Load At Multiple Frequencies, Method To Design Such A Circuit
App 20150179406 - Johnson; Erik ; et al. | 2015-06-25 |
Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
Grant 8,968,838 - Booth , et al. March 3, 2 | 2015-03-03 |
Systems For Automatically Characterizing A Plasma
App 20140367042 - Keil; Douglas ; et al. | 2014-12-18 |
Plasma unconfinement sensor and methods thereof
Grant 8,894,804 - Booth , et al. November 25, 2 | 2014-11-25 |
Methods for automatically characterizing a plasma
Grant 8,849,585 - Keil , et al. September 30, 2 | 2014-09-30 |
Capacitively-coupled electrostatic (CCE) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof
Grant 8,780,522 - Booth , et al. July 15, 2 | 2014-07-15 |
Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber
Grant 8,547,085 - Booth , et al. October 1, 2 | 2013-10-01 |
Plasma Processing In A Capacitively-coupled Reactor With Trapezoidal-waveform Excitation
App 20130136872 - Booth; Jean-Paul ; et al. | 2013-05-30 |
Methods and apparatus for normalizing optical emission spectra
Grant 8,358,416 - Venugopal , et al. January 22, 2 | 2013-01-22 |
Passive Capacitively-coupled Electrostatic (cce) Probe Method For Detecting Plasma Instabilities In A Plasma Processing Chamber
App 20120316834 - Booth; Jean-Paul ; et al. | 2012-12-13 |
Processing System For Detecting In-situ Arcing Events During Substrate Processing
App 20120259562 - Booth; Jean-Paul ; et al. | 2012-10-11 |
Methods And Apparatus For Normalizing Optical Emission Spectra
App 20120170039 - Venugopal; Vijayakumar C. ; et al. | 2012-07-05 |
Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting plasma instabilities in a plasma processing chamber
Grant 8,179,152 - Booth , et al. May 15, 2 | 2012-05-15 |
Capacitively-coupled electrostatic (CCE) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
Grant 8,164,349 - Booth , et al. April 24, 2 | 2012-04-24 |
RF-biased capacitively-coupled electrostatic (RFB-CCE) probe arrangement for characterizing a film in a plasma processing chamber
Grant 8,164,353 - Booth , et al. April 24, 2 | 2012-04-24 |
Passive capacitively-coupled electrostatic (CCE) probe arrangement for detecting in-situ arcing events in a plasma processing chamber
Grant 8,159,233 - Booth , et al. April 17, 2 | 2012-04-17 |
Methods and apparatus for normalizing optical emission spectra
Grant 8,144,328 - Venugopal , et al. March 27, 2 | 2012-03-27 |
Plasma Unconfinement Sensor And Methods Thereof
App 20110128017 - Booth; Jean-Paul ; et al. | 2011-06-02 |
Passive Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting Plasma Instabilities In A Plasma Processing Chamber
App 20100033195 - Booth; Jean-Paul ; et al. | 2010-02-11 |
Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting Strike Step In A Plasma Processing Chamber And Methods Thereof
App 20100006417 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting Dechucking In A Plasma Processing Chamber And Methods Thereof
App 20100008015 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Plasma-facing Probe Arrangement Including Vacuum Gap For Use In A Plasma Processing Chamber
App 20100007337 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Passive Capacitively-coupled Electrostatic (cce) Probe Arrangement For Detecting In-situ Arcing Events In A Plasma Processing Chamber
App 20100007359 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Rf-biased Capacitively-coupled Electrostatic (rfb-cce) Probe Arrangement For Characterizing A Film In A Plasma Processing Chamber
App 20100007362 - Booth; Jean-Paul ; et al. | 2010-01-14 |
Methods For Automatically Characterizing A Plasma
App 20090322342 - Keil; Douglas ; et al. | 2009-12-31 |
Methods And Apparatus For Normalizing Optical Emission Spectra
App 20090251700 - Venugopal; Vijayakumar C. ; et al. | 2009-10-08 |
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