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Method and apparatus for updating control state variables of a process control model based on rework data Grant 6,970,757 - Hewett , et al. November 29, 2 | 2005-11-29 |
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Dispatch and/or disposition of material based upon an expected parameter result Grant 6,947,803 - Bode , et al. September 20, 2 | 2005-09-20 |
Method and apparatus for controlling process target values based on manufacturing metrics Grant 6,937,914 - Bode , et al. August 30, 2 | 2005-08-30 |
Prioritizing an application of correction in a multi-input control system Grant 6,912,436 - Jones , et al. June 28, 2 | 2005-06-28 |
Method and apparatus for distinguishing between sources of process variation Grant 6,901,340 - Pasadyn , et al. May 31, 2 | 2005-05-31 |
Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information Grant 6,897,075 - Bode , et al. May 24, 2 | 2005-05-24 |
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Method and apparatus for determining a sampling plan based on process and equipment state information Grant 6,821,792 - Sonderman , et al. November 23, 2 | 2004-11-23 |
Tuning of a process control based upon layer dependencies Grant 6,823,231 - Bode , et al. November 23, 2 | 2004-11-23 |
Method and apparatus for overlay control using multiple targets Grant 6,815,232 - Jones , et al. November 9, 2 | 2004-11-09 |
Correlating an inline parameter to a device operation parameter Grant 6,810,296 - Bode , et al. October 26, 2 | 2004-10-26 |
Method of using critical dimension measurements to control stepper process parameters Grant 6,808,946 - Stirton , et al. October 26, 2 | 2004-10-26 |
Method and apparatus for integrating multiple process controllers Grant 6,801,817 - Bode , et al. October 5, 2 | 2004-10-05 |
Method of using scatterometry measurements to control stepper process parameters Grant 6,790,570 - Stirton , et al. September 14, 2 | 2004-09-14 |
Method and apparatus using integrated metrology data for pre-process and post-process control Grant 6,788,988 - Pasadyn , et al. September 7, 2 | 2004-09-07 |
Method and apparatus for adaptively scheduling tool maintenance Grant 6,785,586 - Toprac , et al. August 31, 2 | 2004-08-31 |
Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information App 20040159397 - Bode, Christopher A. ;   et al. | 2004-08-19 |
Identifying a cause of a fault based on a process controller output Grant 6,778,873 - Wang , et al. August 17, 2 | 2004-08-17 |
Method and apparatus for cascade control using integrated metrology Grant 6,756,243 - Pasadyn , et al. June 29, 2 | 2004-06-29 |
Dynamic process state adjustment of a processing tool to reduce non-uniformity Grant 6,751,518 - Sonderman , et al. June 15, 2 | 2004-06-15 |
Dynamic lot allocation based upon wafer state characteristics, and system for accomplishing same Grant 6,746,308 - Bode , et al. June 8, 2 | 2004-06-08 |
Method and apparatus for determining control actions incorporating defectivity effects Grant 6,745,086 - Pasadyn , et al. June 1, 2 | 2004-06-01 |
Method and apparatus for overlay control using multiple targets App 20040101983 - Jones, Gary K. ;   et al. | 2004-05-27 |
Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information Grant 6,737,208 - Bode , et al. May 18, 2 | 2004-05-18 |
Method and apparatus for implementing dynamic qualification recipes Grant 6,732,007 - Pasadyn , et al. May 4, 2 | 2004-05-04 |
Correlating an inline parameter to a device operation parameter App 20040059456 - Bode, Christopher A. ;   et al. | 2004-03-25 |
Method and apparatus for utilizing integrated metrology data as feed-forward data Grant 6,708,075 - Sonderman , et al. March 16, 2 | 2004-03-16 |
Method for prioritizing production lots based on grade estimates and output requirements Grant 6,699,727 - Toprac , et al. March 2, 2 | 2004-03-02 |
Method and apparatus for predicting device electrical parameters during fabrication App 20040040001 - Miller, Michael L. ;   et al. | 2004-02-26 |
Method and apparatus for modeling of batch dynamics based upon integrated metrology Grant 6,698,009 - Pasadyn , et al. February 24, 2 | 2004-02-24 |
Method and apparatus for determining a sampling plan based on defectivity Grant 6,687,561 - Pasadyn , et al. February 3, 2 | 2004-02-03 |
Method and apparatus for controlling the flow of wafers through a process flow Grant 6,675,058 - Pasadyn , et al. January 6, 2 | 2004-01-06 |
Methods of characterizing device performance based upon the duration of an endpointed photoresist develop process, and system for accomplishing same Grant 6,664,013 - Hewett , et al. December 16, 2 | 2003-12-16 |
Method and apparatus for optimizing downstream uniformity Grant 6,665,623 - Pasadyn , et al. December 16, 2 | 2003-12-16 |
Method and apparatus for determining a sampling plan based on process and equipment fingerprinting Grant 6,650,955 - Sonderman , et al. November 18, 2 | 2003-11-18 |
Method and apparatus for run-to-run controlling of overlay registration Grant 6,622,061 - Toprac , et al. September 16, 2 | 2003-09-16 |
Method and apparatus for controlling a tool using a baseline control script Grant 6,615,098 - Bode , et al. September 2, 2 | 2003-09-02 |
Method and apparatus for correlating error model with defect data Grant 6,610,550 - Pasadyn , et al. August 26, 2 | 2003-08-26 |
Method and apparatus for performing run-to-run control in a batch manufacturing environment Grant 6,607,926 - Toprac , et al. August 19, 2 | 2003-08-19 |
Method of using damaged areas of a wafer for process qualifications and experiments, and system for accomplishing same Grant 6,605,479 - Pasadyn , et al. August 12, 2 | 2003-08-12 |
Method and apparatus for dynamic model building based on machine disturbances for run-to-run control of semiconductor devices Grant 6,577,914 - Bode June 10, 2 | 2003-06-10 |
Method and apparatus for utilizing integrated metrology data as feed-forward data App 20030097198 - Sonderman, Thomas J. ;   et al. | 2003-05-22 |
Method and apparatus for cascade control using integrated metrology App 20030082837 - Pasadyn, Alexander J. ;   et al. | 2003-05-01 |
Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller Grant 6,535,774 - Bode , et al. March 18, 2 | 2003-03-18 |
Method for identifying and controlling impact of ambient conditions on photolithography processes Grant 6,528,331 - Bode , et al. March 4, 2 | 2003-03-04 |
Method and apparatus for controlling feature critical dimensions based on scatterometry derived profile App 20020177245 - Sonderman, Thomas J. ;   et al. | 2002-11-28 |
Method of varying stepper exposure dose to compensate for across-wafer variations in photoresist thickness, and system for accomplishing same App 20020106821 - Bode, Christopher A. ;   et al. | 2002-08-08 |
Method and apparatus for modeling thickness profiles and controlling subsequent etch process Grant 6,410,351 - Bode , et al. June 25, 2 | 2002-06-25 |
Method and apparatus for run-to-run controlling of overlay registration Grant 6,405,096 - Toprac , et al. June 11, 2 | 2002-06-11 |
Method for identifying and controlling impact of ambient conditions on photolithography processes Grant 6,368,883 - Bode , et al. April 9, 2 | 2002-04-09 |