loadpatents
name:-0.027734041213989
name:-0.032238960266113
name:-0.0005948543548584
Bjorkman; Claes Patent Filings

Bjorkman; Claes

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bjorkman; Claes.The latest application filed is for "stacking and dispensing module".

Company Profile
0.22.17
  • Bjorkman; Claes - Stockholm SE
  • Bjorkman; Claes - Los Altos CA
  • BJORKMAN; Claes - Mountain View CA
  • Bjorkman; Claes - Los Altos Hills CA
  • Bjorkman; Claes - Essingeringen SE
  • Bjorkman; Claes - 114 55 Stockholm SW
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Stacking and dispensing module
Grant 10,109,138 - Lundblad , et al. October 23, 2
2018-10-23
Stacking And Dispensing Module
App 20180005480 - Lundblad; Leif J.I. ;   et al.
2018-01-04
Method for a banknote detector device, and a banknote detector device
Grant 8,942,461 - Lundblad , et al. January 27, 2
2015-01-27
Method For A Banknote Detector Device, And A Banknote Detector Device
App 20120045112 - Lundblad; Leif J.I. ;   et al.
2012-02-23
Patterning 3D features in a substrate
Grant 7,985,689 - Perozziello , et al. July 26, 2
2011-07-26
Patterning 3d Features In A Substrate
App 20070293044 - Perozziello; Eric ;   et al.
2007-12-20
Optical ready substrates
App 20070080414 - Bjorkman; Claes ;   et al.
2007-04-12
Plasma Chamber Insert Ring
App 20060283553 - MA; Shawming ;   et al.
2006-12-21
Optical ready substrates
Grant 7,110,629 - Bjorkman , et al. September 19, 2
2006-09-19
Optical ready substrates
Grant 7,072,534 - Bjorkman , et al. July 4, 2
2006-07-04
Optical ready wafers
Grant 7,043,106 - West , et al. May 9, 2
2006-05-09
Optical-ready wafers
App 20050072979 - West, Lawrence C. ;   et al.
2005-04-07
Dielectric etch chamber with expanded process window
App 20050003675 - Carducci, James D. ;   et al.
2005-01-06
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
Grant 6,825,618 - Pu , et al. November 30, 2
2004-11-30
Dielectric etch chamber with expanded process window
Grant 6,797,639 - Carducci , et al. September 28, 2
2004-09-28
Optical ready substrates
App 20040114853 - Bjorkman, Claes ;   et al.
2004-06-17
Dielectric etch chamber with expanded process window
Grant 6,716,302 - Carducci , et al. April 6, 2
2004-04-06
Device for handling sheet-like material
App 20040010999 - Bjorkman, Claes ;   et al.
2004-01-22
Optical ready wafers
App 20040012041 - West, Lawrence C. ;   et al.
2004-01-22
Optical ready substrates
App 20040013338 - Bjorkman, Claes ;   et al.
2004-01-22
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
App 20030192644 - Pu, Bryan Y. ;   et al.
2003-10-16
Machine for receiving and enclosing bank notes, where information is printed on the inside of a transparent film
Grant 6,598,726 - Lundblad , et al. July 29, 2
2003-07-29
Plasma chamber insert ring
App 20030106646 - Ma, Shawming ;   et al.
2003-06-12
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
Grant 6,568,346 - Pu , et al. May 27, 2
2003-05-27
Dielectric etch chamber with expanded process window
App 20030038111 - Carducci, James D. ;   et al.
2003-02-27
Dielectric etch chamber with expanded process window
App 20030037880 - Carducci, James D. ;   et al.
2003-02-27
Etch method using a dielectric etch chamber with expanded process window
Grant 6,403,491 - Liu , et al. June 11, 2
2002-06-11
High selectivity etch using an external plasma discharge
Grant 6,387,288 - Bjorkman , et al. May 14, 2
2002-05-14
Distributed inductively-coupled plasma source and circuit for coupling induction coils to RF power supply
App 20010054383 - Pu, Bryan Y. ;   et al.
2001-12-27
Distributed inductively-coupled plasma source
Grant 6,273,022 - Pu , et al. August 14, 2
2001-08-14
Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system
App 20010009139 - Shan, Hongqing ;   et al.
2001-07-26
Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing system
Grant 6,232,236 - Shan , et al. May 15, 2
2001-05-15
Magnetically-enhanced plasma chamber with non-uniform magnetic field
Grant 6,113,731 - Shan , et al. September 5, 2
2000-09-05
High selectivity etch using an external plasma discharge
Grant 6,074,514 - Bjorkman , et al. June 13, 2
2000-06-13
System for the safe transmission of messages
Grant 5,420,922 - Lundblad , et al. May 30, 1
1995-05-30
Arrangement for enveloping objects in enveloping material taken from two storage reels
Grant 5,199,247 - Bjorkman , et al. April 6, 1
1993-04-06
Message receiving arrangement
Grant 5,031,379 - Lundblad , et al. July 16, 1
1991-07-16
Apparatus for leading off air in connection with the measuring of the flow of a liquid
Grant 3,938,539 - Strouth , et al. February 17, 1
1976-02-17

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