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Composition for forming silicon-containing resist underlayer film and patterning process
Grant 11,385,544 - Ogihara , et al. July 12, 2 | 2022-07-12 |
Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film
App 20220163890 - KORI; Daisuke ; et al. | 2022-05-26 |
Resist Underlayer Film Material, Patterning Process, And Method For Forming Resist Underlayer Film
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Material For Forming Organic Film, Method For Forming Organic Film, Patterning Process, And Compound
App 20210286266 - NAKAHARA; Takayoshi ; et al. | 2021-09-16 |
Material For Forming Organic Film, Method For Forming Organic Film, Patterning Process, And Compound
App 20210198472 - KORI; Daisuke ; et al. | 2021-07-01 |
Material For Forming Organic Film, Method For Forming Organic Film, Patterning Process, And Compound
App 20210181637 - KORI; Daisuke ; et al. | 2021-06-17 |
Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process
Grant 11,018,015 - Ogihara , et al. May 25, 2 | 2021-05-25 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20210088908 - KAI; Yusuke ; et al. | 2021-03-25 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20210026246 - OGIHARA; Tsutomu ; et al. | 2021-01-28 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20200341377 - OGIHARA; Tsutomu ; et al. | 2020-10-29 |
Method For Measuring Distance Of Diffusion Of Curing Catalyst
App 20200340806 - OGIHARA; Tsutomu ; et al. | 2020-10-29 |
Composition For Forming Silicon-containing Resist Underlayer Film And Patterning Process
App 20200233303 - OGIHARA; Tsutomu ; et al. | 2020-07-23 |
Thermosetting Iodine- And Silicon-containing Material, Composition Containing The Material For Forming Resist Underlayer Film Fo
App 20200159120 - OGIHARA; Tsutomu ; et al. | 2020-05-21 |
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
Grant 10,620,537 - Watanabe , et al. | 2020-04-14 |
Method for manufacturing a resist composition
Grant 10,610,906 - Iwabuchi , et al. | 2020-04-07 |
Composition For Forming Organic Film, Substrate For Manufacturing Semiconductor Device, Method For Forming Organic Film, And Pat
App 20190198341 - OGIHARA; Tsutomu ; et al. | 2019-06-27 |
Thermal Crosslinking Accelerator, Polysiloxane-containing Resist Underlayer Film Forming Composition Containing Same, And Patterning Process Using Same
App 20180081272 - OGIHARA; Tsutomu ; et al. | 2018-03-22 |
Resist Underlayer Film Composition, Patterning Process, Method For Forming Resist Underlayer Film, And Compound For Resist Underlayer Film Composition
App 20180011405 - WATANABE; Takeru ; et al. | 2018-01-11 |
Composition for forming a silicon-containing resist under layer film and patterning process
Grant 9,312,144 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Method for producing semiconductor apparatus substrate
Grant 9,312,127 - Ogihara , et al. April 12, 2 | 2016-04-12 |
Method For Producing Semiconductor Apparatus Substrate
App 20160064220 - OGIHARA; Tsutomu ; et al. | 2016-03-03 |
Method for producing resist composition
Grant 9,207,535 - Ogihara , et al. December 8, 2 | 2015-12-08 |
Method for producing resist composition
Grant 9,201,301 - Ogihara , et al. December 1, 2 | 2015-12-01 |
Pattern forming process
Grant 9,052,603 - Hatakeyama , et al. June 9, 2 | 2015-06-09 |
Method For Manufacturing A Resist Composition
App 20150099216 - IWABUCHI; Motoaki ; et al. | 2015-04-09 |
Composition For Forming A Silicon-containing Resist Under Layer Film And Patterning Process
App 20150093901 - OGIHARA; Tsutomu ; et al. | 2015-04-02 |
Method For Producing Resist Composition
App 20150064625 - OGIHARA; Tsutomu ; et al. | 2015-03-05 |
Method For Producing Resist Composition
App 20140335453 - OGIHARA; Tsutomu ; et al. | 2014-11-13 |
Resist underlayer film composition and patterning process using the same
Grant 8,877,422 - Ogihara , et al. November 4, 2 | 2014-11-04 |
Resist underlayer film composition and patterning process using the same
Grant 8,853,031 - Ogihara , et al. October 7, 2 | 2014-10-07 |
Pattern Forming Process
App 20140234785 - Hatakeyama; Jun ; et al. | 2014-08-21 |
Thermal Crosslinking Accelerator, Polysiloxane-containing Resist Underlayer Film Forming Composition Containing Same, And Patterning Process Using Same
App 20140205951 - OGIHARA; Tsutomu ; et al. | 2014-07-24 |
Resist underlayer film composition and patterning process using the same
Grant 8,663,898 - Ogihara , et al. March 4, 2 | 2014-03-04 |
Resist underlayer film composition and patterning process using the same
Grant 8,592,956 - Ogihara , et al. November 26, 2 | 2013-11-26 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120184103 - OGIHARA; Tsutomu ; et al. | 2012-07-19 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120171868 - OGIHARA; Tsutomu ; et al. | 2012-07-05 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120142193 - OGIHARA; Tsutomu ; et al. | 2012-06-07 |
Resist Underlayer Film Composition And Patterning Process Using The Same
App 20120108071 - OGIHARA; Tsutomu ; et al. | 2012-05-03 |
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